JPH06139824A - Anisotropic conducting film - Google Patents
Anisotropic conducting filmInfo
- Publication number
- JPH06139824A JPH06139824A JP28844192A JP28844192A JPH06139824A JP H06139824 A JPH06139824 A JP H06139824A JP 28844192 A JP28844192 A JP 28844192A JP 28844192 A JP28844192 A JP 28844192A JP H06139824 A JPH06139824 A JP H06139824A
- Authority
- JP
- Japan
- Prior art keywords
- anisotropic conductive
- resin layer
- connection
- substrate
- thermosetting resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、素子を基板に実装する
導電フィルムに係り、特に、ICチップ部品を実装する
異方導電フィルムの構造に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive film for mounting an element on a substrate, and more particularly to a structure of an anisotropic conductive film for mounting an IC chip component.
【0002】[0002]
【従来の技術】従来、異方導電樹脂を用いた素子の接続
については、「月刊 Semiconductor W
orld 増刊号、サーフェイスマウント テクノロジ
ー 90年秋号 株式会社プレスジャーナル 平成2年
9月1日発行 P.259〜262」等に開示されるも
のがある。2. Description of the Related Art Conventionally, regarding the connection of elements using an anisotropic conductive resin, "Monthly Semiconductor W
Orld special edition, Surface Mount Technology Autumn 90 issue Press Journal, Inc., issued September 1, 1990 P. 259-262 "and the like.
【0003】図3はかかる従来の異方導電接着剤を用い
た基板とICチップの接続工程断面図である。以下、従
来の異方導電接着剤を用いた基板とICチップの接続方
法について説明する。まず、図3(a)に示すように、
基板電極2が形成された基板1上の所定の位置に異方導
電樹脂3を薄く均一に供給する。FIG. 3 is a sectional view of a step of connecting a substrate and an IC chip using such a conventional anisotropic conductive adhesive. Hereinafter, a conventional method for connecting a substrate and an IC chip using an anisotropic conductive adhesive will be described. First, as shown in FIG.
An anisotropic conductive resin 3 is thinly and uniformly supplied to a predetermined position on the substrate 1 on which the substrate electrode 2 is formed.
【0004】次に、図3(b)に示すように、ICチッ
プ4の電極5と基板電極2をアライメントする。この状
態からICチップ4を基板1に押しつけ、荷重を加えた
まま、樹脂を適当な方法(熱硬化、熱可塑あるいは紫外
線硬化等)で硬化させ接続を行う。Next, as shown in FIG. 3B, the electrodes 5 of the IC chip 4 and the substrate electrodes 2 are aligned. From this state, the IC chip 4 is pressed against the substrate 1, and the resin is cured by an appropriate method (thermosetting, thermoplastic or ultraviolet curing, etc.) while applying a load, and connection is performed.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、上記し
た従来の基板とICチップの接続方法では、次に述べる
ような問題点があった。導電フィラーが混入している樹
脂は、一般に熱硬化性あるいは熱可塑性の樹脂が用いら
れることが多い。However, the above-described conventional method for connecting a substrate and an IC chip has the following problems. Generally, thermosetting or thermoplastic resin is often used as the resin in which the conductive filler is mixed.
【0006】熱硬化性樹脂を用いた場合は、基板−IC
チップ接続時の加熱により、樹脂の粘度が急激に低下
し、導電フィラーが流れて、電極上から流出し、基板−
ICチップ間にオープンを生じる原因となっていた。一
方、熱可塑性樹脂を用いた場合は、温度により樹脂の硬
度が変化するので、基板上にICチップを接続後、高温
になると熱可塑性樹脂が軟化して、導電フィラーが流
れ、接続の信頼性に欠けるという欠点があった。When a thermosetting resin is used, the substrate-IC
Due to the heating at the time of chip connection, the viscosity of the resin decreases sharply, the conductive filler flows, and it flows out from the electrode,
This has been a cause of opening between the IC chips. On the other hand, when a thermoplastic resin is used, the hardness of the resin changes depending on the temperature. Therefore, after the IC chip is connected to the substrate, the thermoplastic resin softens at high temperature and the conductive filler flows to improve the reliability of the connection. There was a drawback that it lacked.
【0007】本発明は、上記問題点を除去するため、導
電フィラーを良好に配列して、基板とICチップ間の接
続の信頼性を向上できる異方導電フィルムを提供するこ
とを目的とするものである。In order to eliminate the above problems, it is an object of the present invention to provide an anisotropic conductive film in which conductive fillers are well arranged to improve the reliability of the connection between the substrate and the IC chip. Is.
【0008】[0008]
【課題を解決するための手段】本発明は、上記目的を達
成するために、素子の実装に用いられる異方導電フィル
ムにおいて、導電フィラーを含む熱可塑性樹脂からなる
異方導電樹脂層と、この異方導電樹脂層の両面を覆う熱
硬化性樹脂層とを設けるようにしたものである。In order to achieve the above-mentioned object, the present invention provides an anisotropic conductive film used for mounting an element in an anisotropic conductive resin layer comprising a thermoplastic resin containing a conductive filler, A thermosetting resin layer covering both surfaces of the anisotropic conductive resin layer is provided.
【0009】また、前記熱硬化性樹脂層の表面はカバー
フィルムで覆うようにしたものである。The surface of the thermosetting resin layer is covered with a cover film.
【0010】[0010]
【作用】本発明によれば、図1に示すように、素子の実
装に用いられる異方導電フィルムにおいて、導電フィラ
ーを分布させた熱可塑性樹脂からなる異方導電樹脂層1
3の両面は、熱硬化性樹脂層14,16が覆う構造にし
たので、導電フィラーは熱可塑性樹脂中に存在すること
になり、加熱状態でも流出することはなく、微小な電極
上にも良好に配置できる。更に、その異方導電樹脂層1
3の両面は熱硬化性樹脂14,16で覆われるので、素
子接続部の補強となり、素子の基板への接続において常
に安定した接続が得られる。According to the present invention, as shown in FIG. 1, in an anisotropic conductive film used for mounting an element, an anisotropic conductive resin layer 1 made of a thermoplastic resin in which a conductive filler is distributed.
Since both surfaces of 3 are structured to be covered with the thermosetting resin layers 14 and 16, the conductive filler is present in the thermoplastic resin, does not flow out even in a heated state, and is good even on a minute electrode. Can be placed in Further, the anisotropic conductive resin layer 1
Since both sides of 3 are covered with the thermosetting resins 14 and 16, they serve as a reinforcement for the element connecting portion, and a stable connection can always be obtained when connecting the element to the substrate.
【0011】[0011]
【実施例】以下、本発明の実施例について図面を参照し
ながら詳細に説明する。図1は本発明の実施例を示す異
方導電フィルムの製造工程断面図である。以下、本発明
にかかる異方導電フィルムの製造方法について説明す
る。まず、図1(a)に示すように、周囲に枠の付いた
平らなステージ11上にこのステージの面積と同じ大き
さのカバーフィルム12を置く。Embodiments of the present invention will now be described in detail with reference to the drawings. FIG. 1 is a cross-sectional view of an anisotropic conductive film manufacturing process showing an embodiment of the present invention. The method for producing the anisotropic conductive film according to the present invention will be described below. First, as shown in FIG. 1A, a cover film 12 having the same size as the area of this stage is placed on a flat stage 11 having a frame around it.
【0012】次いで、図1(b)に示すように、そのカ
バーフィルム12上に異方導電樹脂を気泡が混ざらない
ようにステージ11の全面に供給して、異方導電樹脂層
13を形成する。この異方導電樹脂13は、熱可塑性樹
脂中に導電フィラーを均一に混ぜたものを用いる。次い
で、図1(c)に示すように、その異方導電樹脂層13
上に、熱硬化性樹脂を供給し、熱によって熱硬化性樹脂
を半硬化させ、熱硬化性樹脂層14を形成する。そし
て、この上からカバーフィルム15を被せる。Next, as shown in FIG. 1B, an anisotropic conductive resin is supplied on the cover film 12 so as not to mix bubbles with the entire surface of the stage 11 to form an anisotropic conductive resin layer 13. . As this anisotropic conductive resin 13, a thermoplastic resin in which a conductive filler is uniformly mixed is used. Then, as shown in FIG. 1C, the anisotropic conductive resin layer 13 is formed.
Then, a thermosetting resin is supplied and the thermosetting resin is semi-cured by heat to form the thermosetting resin layer 14. Then, the cover film 15 is covered over this.
【0013】次いで、図1(d)に示すように、ここま
でに形成されたものを上下を逆にした後、最初に付けた
カバーフィルム12を取り除く。続いて、この上から更
に熱硬化性樹脂を供給し、同様に熱によって樹脂を半硬
化させ、熱硬化性樹脂層16を形成する。次に、図1
(e)に示すように、熱硬化性樹脂層16上にカバーフ
ィルム17を被せる。Next, as shown in FIG. 1 (d), the one formed up to this point is turned upside down, and then the cover film 12 attached first is removed. Subsequently, a thermosetting resin is further supplied from above, and the resin is similarly semi-cured by heat to form the thermosetting resin layer 16. Next, FIG.
As shown in (e), the thermosetting resin layer 16 is covered with the cover film 17.
【0014】最後に、図1(f)に示すように、ステー
ジ11からフィルムを取り出して、本発明にかかる異方
導電フィルムの製造が完了する。なお、上記した異方導
電フィルムの製造方法は、本構造のフィルムを得る一つ
の方法であり、上記の製造方法に限定されるものではな
い。図2は本発明にかかる異方導電フィルムを素子接続
に用いる例を示す工程断面図である。Finally, as shown in FIG. 1F, the film is taken out of the stage 11 to complete the production of the anisotropic conductive film according to the present invention. The above-mentioned method for producing an anisotropic conductive film is one method for obtaining a film having the present structure, and is not limited to the above-mentioned production method. 2A to 2D are process sectional views showing an example in which the anisotropic conductive film according to the present invention is used for element connection.
【0015】以下、本発明にかかる異方導電フィルムを
素子接続に用いる場合の例を図2を用いて説明する。ま
ず、図2(a)に示すように、下側のカバーフィルム1
5を剥す。次いで、図2(b)に示すように、下側のカ
バーフィルム15を剥がした異方導電フィルムを、電極
22を有する基板あるいはICチップ21に添付する。An example of using the anisotropic conductive film according to the present invention for device connection will be described below with reference to FIG. First, as shown in FIG. 2A, the lower cover film 1
Peel off 5. Next, as shown in FIG. 2B, the anisotropic conductive film from which the lower cover film 15 has been peeled off is attached to the substrate having the electrodes 22 or the IC chip 21.
【0016】次いで、図2(c)に示すように、反対側
(上側)のカバーフィルム17を剥す。次に、図2
(d)に示すように、この異方導電フィルムと、電極2
4を有する基板あるいはICチップ23との接続を行
う。次に、図2(e)に示すように、その上から適当な
熱、及び荷重を加えて素子の接続が完了する。なお、こ
こで、25は熱硬化性樹脂層、26は導電フィラーを含
む熱可塑性樹脂である。Next, as shown in FIG. 2C, the cover film 17 on the opposite side (upper side) is peeled off. Next, FIG.
As shown in (d), this anisotropic conductive film and the electrode 2
4 is connected to the substrate or the IC chip 23. Next, as shown in FIG. 2E, appropriate heat and load are applied from above to complete the connection of the elements. Here, 25 is a thermosetting resin layer, and 26 is a thermoplastic resin containing a conductive filler.
【0017】この接続では導電フィラーの流出はなく、
温度変化に対しても良好な接続ができる。更に、接続の
最後に基板やICチップの周りから樹脂等を供給して接
続の補強をしても良い。このようにして素子が接続され
るので、接続時の加熱により、熱硬化性樹脂層により覆
われている熱可塑性樹脂中の導電フィラーの流出は防止
されるとともに、接続後の温度変化に対しても、熱硬化
性樹脂層が保護層の機能を果たすことにより、良好な接
続を保持することができる。There is no outflow of conductive filler in this connection,
Good connection is possible even with temperature changes. Furthermore, at the end of the connection, resin or the like may be supplied from around the substrate or the IC chip to reinforce the connection. Since the elements are connected in this way, the heating at the time of connection prevents outflow of the conductive filler in the thermoplastic resin covered by the thermosetting resin layer, and prevents the temperature change after connection. Also, since the thermosetting resin layer functions as a protective layer, good connection can be maintained.
【0018】なお、本発明は上記実施例に限定されるも
のではなく、本発明の趣旨に基づいて種々の変形が可能
であり、これらを本発明の範囲から排除するものではな
い。The present invention is not limited to the above embodiments, and various modifications can be made based on the spirit of the present invention, and these modifications are not excluded from the scope of the present invention.
【0019】[0019]
【発明の効果】以上、詳細に説明したように、本発明に
よれば、素子の実装に用いられる異方導電フィルムにお
いて、導電フィラーを含む熱可塑性樹脂からなる異方導
電樹脂層と、この異方導電樹脂層の両面を覆う熱硬化性
樹脂層とを設けるようにしたので、熱硬化性樹脂層によ
り覆われている熱可塑性樹脂中の導電フィラーの流出は
防止される。As described above in detail, according to the present invention, in an anisotropic conductive film used for mounting an element, an anisotropic conductive resin layer made of a thermoplastic resin containing a conductive filler, and an anisotropic conductive resin layer Since the thermosetting resin layer covering both sides of the one-side conductive resin layer is provided, the outflow of the conductive filler in the thermoplastic resin covered by the thermosetting resin layer is prevented.
【0020】したがって、微小な電極上にも導電フィラ
ーを良好に配置できる。また、接続後の温度変化に対し
ても、熱硬化性樹脂層が保護層の機能を果たすことによ
り、良好な接続を保持することができ、接続の信頼性を
高めることができる。更に、その異方導電樹脂の両面は
熱硬化性樹脂で覆うようにしたので、素子接続部の補強
となり、素子の基板への接続において常に安定した接続
が得られる。Therefore, the conductive filler can be satisfactorily arranged even on the minute electrodes. Further, the thermosetting resin layer functions as a protective layer even when the temperature changes after the connection, so that a good connection can be maintained and the reliability of the connection can be improved. Further, since both sides of the anisotropic conductive resin are covered with the thermosetting resin, it serves as a reinforcement of the element connecting portion, and a stable connection can always be obtained when connecting the element to the substrate.
【図1】本発明の実施例を示す異方導電フィルムの製造
工程断面図である。FIG. 1 is a cross-sectional view of a process of manufacturing an anisotropic conductive film showing an example of the present invention.
【図2】本発明にかかる異方導電フィルムを素子接続に
用いる例を示す工程断面図である。FIG. 2 is a process sectional view showing an example in which the anisotropic conductive film according to the present invention is used for element connection.
【図3】従来の異方導電接着剤を用いた基板とICチッ
プの接続工程断面図である。FIG. 3 is a sectional view of a step of connecting a substrate and an IC chip using a conventional anisotropic conductive adhesive.
11 ステージ 12,15,17 カバーフィルム 13 異方導電樹脂層 14,16,25 熱硬化性樹脂層 21,23 基板あるいはICチップ 22,24 電極 11 stage 12, 15, 17 cover film 13 anisotropic conductive resin layer 14, 16, 25 thermosetting resin layer 21, 23 substrate or IC chip 22, 24 electrode
───────────────────────────────────────────────────── フロントページの続き (72)発明者 池端 昌夫 東京都港区虎ノ門1丁目7番12号 沖電気 工業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masao Ikebata 1-7-12 Toranomon, Minato-ku, Tokyo Oki Electric Industry Co., Ltd.
Claims (2)
ムにおいて、(a)導電フィラを含む熱可塑性樹脂から
なる異方導電樹脂層と、(b)該異方導電樹脂層の両面
を覆う熱硬化性樹脂層とを有することを特徴とする異方
導電フィルム。1. An anisotropic conductive film used for mounting an element, comprising: (a) an anisotropic conductive resin layer made of a thermoplastic resin containing a conductive filler; and (b) heat covering both surfaces of the anisotropic conductive resin layer. An anisotropic conductive film having a curable resin layer.
フィルムを有する請求項1記載の異方導電フィルム。2. The anisotropic conductive film according to claim 1, further comprising a cover film that covers the surface of the thermosetting resin layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28844192A JPH06139824A (en) | 1992-10-27 | 1992-10-27 | Anisotropic conducting film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28844192A JPH06139824A (en) | 1992-10-27 | 1992-10-27 | Anisotropic conducting film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06139824A true JPH06139824A (en) | 1994-05-20 |
Family
ID=17730258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28844192A Withdrawn JPH06139824A (en) | 1992-10-27 | 1992-10-27 | Anisotropic conducting film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06139824A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100713333B1 (en) * | 2006-01-04 | 2007-05-04 | 엘에스전선 주식회사 | Multi-layered anisotropic conductive film |
KR100737586B1 (en) * | 2006-01-03 | 2007-07-10 | 엘에스전선 주식회사 | Multi-layered anisotropic conductive film |
KR100791171B1 (en) * | 2006-02-13 | 2008-01-02 | 엘에스전선 주식회사 | Anisotropic conductive film with selective optical transmittance and Method for manufacturing the same |
JP2013041895A (en) * | 2011-08-11 | 2013-02-28 | Furukawa Electric Co Ltd:The | Connection sheet |
JPWO2011125230A1 (en) * | 2010-04-09 | 2013-07-08 | 富士通株式会社 | Semiconductor device, test method and test program for semiconductor device |
KR101479658B1 (en) * | 2011-11-18 | 2015-01-06 | 제일모직 주식회사 | Anisotropic conductive film with easy pre-bonding process |
-
1992
- 1992-10-27 JP JP28844192A patent/JPH06139824A/en not_active Withdrawn
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100737586B1 (en) * | 2006-01-03 | 2007-07-10 | 엘에스전선 주식회사 | Multi-layered anisotropic conductive film |
KR100713333B1 (en) * | 2006-01-04 | 2007-05-04 | 엘에스전선 주식회사 | Multi-layered anisotropic conductive film |
KR100791171B1 (en) * | 2006-02-13 | 2008-01-02 | 엘에스전선 주식회사 | Anisotropic conductive film with selective optical transmittance and Method for manufacturing the same |
JPWO2011125230A1 (en) * | 2010-04-09 | 2013-07-08 | 富士通株式会社 | Semiconductor device, test method and test program for semiconductor device |
JP5314190B2 (en) * | 2010-04-09 | 2013-10-16 | 富士通株式会社 | Semiconductor device, test method and test program for semiconductor device |
JP2013041895A (en) * | 2011-08-11 | 2013-02-28 | Furukawa Electric Co Ltd:The | Connection sheet |
KR101479658B1 (en) * | 2011-11-18 | 2015-01-06 | 제일모직 주식회사 | Anisotropic conductive film with easy pre-bonding process |
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Legal Events
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A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20000104 |