JPH07278261A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH07278261A
JPH07278261A JP6634894A JP6634894A JPH07278261A JP H07278261 A JPH07278261 A JP H07278261A JP 6634894 A JP6634894 A JP 6634894A JP 6634894 A JP6634894 A JP 6634894A JP H07278261 A JPH07278261 A JP H07278261A
Authority
JP
Japan
Prior art keywords
phenol
epoxy resin
formula
resin
addition reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6634894A
Other languages
Japanese (ja)
Other versions
JP3192315B2 (en
Inventor
Masatoyo Tomokuni
勝豊 友国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP6634894A priority Critical patent/JP3192315B2/en
Publication of JPH07278261A publication Critical patent/JPH07278261A/en
Application granted granted Critical
Publication of JP3192315B2 publication Critical patent/JP3192315B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To obtain an epoxy resin compsn. which has improved moldability and curability, an excellent crack resistance in a sharp change in temp., and a good moisture resistance by compounding a specific epoxy resin, a melt mixture comprising a flexible phenol resin and a specific cure accelerator, and an inorg. filter. CONSTITUTION:An epoxy resin compsn. contains, as the essential components, an epoxy resin contg. 50-100wt.% epoxy resin of formula I (R1 to R8 are each H, halogen, or alkyl), a melt mixture obtd. by thermally melt mixing a phenol resin of formula II (R is a p-xylene group; and n is 1-5) and/or a phenol resin of formula III (R is a residue formed by removing two phenol parts from dicyclopentadienediphenol obtd. by the addition reaction of dicyclopentadiene with phenol or from a terpenediphenol obtd. by the addition reaction of a terpene with phenol; and n is 1-5) with tritolylphosphine as the accelerator for those phenol resins, and an inorg. filler. The compsn. is excellent in resistance to soldering stress and in curability and useful for semiconductor sealing.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体デバイスの表面実
装化における耐半田ストレス性、硬化性に優れた半導体
封止用エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in solder stress resistance and curability in surface mounting of semiconductor devices.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラック型エポキシ樹脂をノボラック型フェノール
樹脂で硬化させたエポキシ樹脂組成物が用いられてい
る。ところが近年、集積回路の高集積化に伴いチップが
だんだん大型化し、かつパッケージは従来のDIPタイ
プから表面実装化された小型、薄型のフラットパッケー
ジ、SOP、SOJ、PLCCに変わってきている。即
ち大型チップを小型で薄いパッケージに封入することに
なり、応力によりクラック発生、これらのクラックによ
る耐湿性の低下等の問題が大きくクローズアップされて
きている。特に半田付けの工程において急激に200℃
以上の高温にさらされることによりパッケージの割れや
樹脂とチップの剥離により耐湿性が劣化してしまうとい
った問題点がでてきている。従ってこれらの大型のチッ
プを封止するのに適した、信頼性の高い封止用樹脂組成
物の開発が望まれてきている。
2. Description of the Related Art Conventionally, electronic parts such as diodes, transistors and integrated circuits have been sealed with a thermosetting resin. Especially in integrated circuits, orthocresol novolac type epoxy resin excellent in heat resistance and moisture resistance is used as a novolak. An epoxy resin composition cured with a type phenolic resin is used. However, in recent years, as the integration of integrated circuits has increased, the size of the chip has gradually increased, and the package has changed from a conventional DIP type to a surface-mounted small and thin flat package, SOP, SOJ, and PLCC. That is, a large chip is enclosed in a small and thin package, and problems such as cracks caused by stress and deterioration of moisture resistance due to these cracks have been greatly highlighted. Especially in the soldering process, the temperature suddenly rises to 200 ° C.
Exposure to the above high temperature causes problems such as cracking of the package and peeling of the chip from the resin, resulting in deterioration of moisture resistance. Therefore, development of a highly reliable encapsulating resin composition suitable for encapsulating these large chips has been desired.

【0003】これらの問題を解決するためにエポキシ樹
脂として式(1)で示されるエポキシ樹脂の使用(特開
昭64−65116号公報)か検討されてきた。式
(1)で示されるエポキシ樹脂の使用により樹脂系の低
粘度化が図られ、従って溶融シリカ粉末を更に多く配合
することにより組成物の成形後の低熱膨張化及び低吸水
化により耐半田ストレス性の向上が図られた。ただし、
溶融シリカ粉末を多く配合することによる弾性率の増加
も一方の弊害であり、更なる耐半田ストレス性の向上が
必要である。この問題を解決するために、式(2)、式
(3)で示される可撓性フェノール樹脂硬化剤の使用が
検討され、耐半田ストレス性の改良には効果があるが、
反面エポキシ樹脂との反応性に劣り、ゲルタイムが長
い、バリが発生しやすい、熱時硬度が低い、離型性が劣
る成形品表面に未反応成分による白色斑点が存在する等
の問題もあり、改良の必要があった。これらの問題を解
決する手段として、硬化促進剤の添加量の増加がある
が、一般に硬化促進剤の添加量を増加させると、硬化性
は促進され上記の問題は解決されるが、それに伴いエポ
キシ樹脂組成物の耐湿性が低下する。従って、硬化促進
剤の添加量を可能な限り少なくし、かつ硬化性を上げる
手段の開発が必要となってきた。この手段としてノボラ
ック型フェノール樹脂と硬化促進剤の溶融が提案されて
いる(特開昭60−4253号公報)。しかしながら、
式(2)、式(3)の可撓性フェノール樹脂硬化剤を併
用したエポキシ樹脂組成物では充分な硬化性の改良に至
らず、更に改良が必要となってきている。
In order to solve these problems, the use of the epoxy resin represented by the formula (1) as the epoxy resin (Japanese Patent Laid-Open No. 64-65116) has been investigated. By using the epoxy resin represented by the formula (1), it is possible to reduce the viscosity of the resin system. Therefore, by adding a larger amount of fused silica powder, the composition has low thermal expansion and low water absorption after molding, and thus has a low solder stress resistance. The sexuality was improved. However,
An increase in elastic modulus due to the addition of a large amount of fused silica powder is one of the harmful effects, and further improvement in solder stress resistance is required. In order to solve this problem, the use of the flexible phenol resin curing agent represented by the formula (2) or the formula (3) has been studied, and it is effective in improving the solder stress resistance.
On the other hand, the reactivity with epoxy resin is poor, the gel time is long, burrs are likely to occur, the hardness at the time of heating is low, and the mold release property is poor, and there are problems such as the presence of white spots due to unreacted components. There was a need for improvement. As a means for solving these problems, there is an increase in the addition amount of the curing accelerator. Generally, when the addition amount of the curing accelerator is increased, the curability is promoted and the above problems are solved. The moisture resistance of the resin composition decreases. Therefore, it has become necessary to develop means for reducing the amount of the curing accelerator added as much as possible and increasing the curability. As a means for this, melting of a novolac type phenolic resin and a curing accelerator has been proposed (JP-A-60-4253). However,
The epoxy resin composition in which the flexible phenol resin curing agent of the formulas (2) and (3) is used in combination does not lead to sufficient improvement in curability, and further improvement is needed.

【0004】[0004]

【発明が解決しようとする課題】本発明は半田付け工程
における急激な温度変化による熱ストレスを受けたとき
の耐クラック性に非常に優れ、かつ耐湿性、成形時の反
応性の違いから生じるバリ、白色斑点、離型性等の諸問
題の改良されたエポキシ樹脂組成物を提供することにあ
る。
DISCLOSURE OF THE INVENTION The present invention has extremely excellent crack resistance when subjected to thermal stress due to a rapid temperature change in a soldering process, and has a burr caused by a difference in moisture resistance and reactivity during molding. Another object of the present invention is to provide an epoxy resin composition in which various problems such as white spots and releasability are improved.

【0005】[0005]

【課題を解決するための手段】本発明は、(A)式
(1)で示されるエポキシ樹脂を総エポキシ樹脂量中に
50〜100重量%含むエポキシ樹脂、
The present invention provides an epoxy resin containing (A) the epoxy resin represented by the formula (1) in an amount of 50 to 100% by weight in the total amount of epoxy resin,

【0006】[0006]

【化5】 (式中のR1〜R8は水素、ハロゲン、アルキル基の中か
ら選択される同一もしくは異なる原子または基)
[Chemical 5] (In the formula, R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups)

【0007】(B)式(2)及び/または式(3)で示
される可撓性フェノール樹脂硬化剤と硬化促進剤である
式(4)で示されるトリトリルホスフィンを予め加熱溶
融されてなる溶融混合物及び
(B) A flexible phenolic resin curing agent represented by the formula (2) and / or the formula (3) and a tollylphosphine represented by the formula (4) which is a curing accelerator are heated and melted in advance. Molten mixture and

【0008】[0008]

【化6】 (式中のRはパラキシリレン、nの値は1〜5)[Chemical 6] (R in the formula is paraxylylene, and the value of n is 1 to 5)

【0009】[0009]

【化7】 (式中のRはジシクロペタジエンとフェノールを付加反
応したジシクロペタジエンフェノール、テルペン類とフ
ェノールを付加反応したテルペンジフェノール、シクロ
ペンタジエンとフェノールを付加反応したシクロペタジ
エンジフェノール及びシクロヘキサノンとフェノールを
付加縮合したシクロヘキサノンジフェノールの各々の2
個のフェノール部を除いた残基を表し、これらの中から
選択される1種、nの値は1〜5)
[Chemical 7] (Wherein R is dicyclopetadienephenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopetadiene diphenol obtained by addition reaction of cyclopentadiene and phenol, and cyclohexanone 2 of each of cyclohexanone diphenols that have been addition-condensed with phenol
Represents the residue excluding the phenol part, one selected from these, the value of n is 1 to 5)

【0010】[0010]

【化8】 [Chemical 8]

【0011】(C)無機充填材を必須成分とする半導体
封止用エポキシ樹脂組成物である。本発明に用いる式
(1)の構造で示されるビフェニル型エポキシ樹脂は1
分子中に2個のエポキシ基を有する2官能性エポキシ樹
脂で、従来の多官能性エポキシ樹脂に比べ溶融粘度が低
く、トランスファー成形時の流動性に優れる。従って、
組成物の溶融シリカ粉末を多く配合することができ、低
熱膨張化及び低吸水化が図られ、耐半田ストレス性に優
れるエポキシ樹脂組成物を得ることができる。このビフ
ェニル型エポキシ樹脂の使用量は、これを調節すること
により耐半田ストレス性を最大限に引き出すことができ
る。耐半田ストレス性の効果を出すためには、式(1)
で示されるビフェニル型エポキシ樹脂を総エポキシ樹脂
量の50重量%以上、好ましくは70重量%以上使用す
るのが望ましい。50重量%未満だと低熱膨張化及び低
吸水性が得られず、耐半田ストレス性が不充分である。
更に式中のR1〜R8は水素、ハロゲン、アルキル基の中
から選択される同一もしくは異なる原子または基である
が、これらの中で、好ましいのはR1〜R4がメチル基、
5〜R8が水素原子である。
(C) An epoxy resin composition for semiconductor encapsulation containing an inorganic filler as an essential component. The biphenyl type epoxy resin represented by the structure of the formula (1) used in the present invention is 1
It is a bifunctional epoxy resin having two epoxy groups in the molecule and has a lower melt viscosity than conventional polyfunctional epoxy resins and has excellent fluidity during transfer molding. Therefore,
A large amount of fused silica powder of the composition can be blended, low thermal expansion and low water absorption can be achieved, and an epoxy resin composition excellent in solder stress resistance can be obtained. By adjusting the amount of the biphenyl type epoxy resin used, solder stress resistance can be maximized. To obtain the effect of solder stress resistance, the formula (1) is used.
It is desirable to use the biphenyl type epoxy resin represented by the above formula in an amount of 50% by weight or more, preferably 70% by weight or more based on the total amount of the epoxy resin. If it is less than 50% by weight, low thermal expansion and low water absorption cannot be obtained, and the solder stress resistance is insufficient.
Further, R 1 to R 8 in the formula are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups, and among these, preferred are R 1 to R 4 are methyl groups,
R 5 to R 8 are hydrogen atoms.

【0012】式(1)で示されるビフェニル型エポキシ
樹脂以外に他のエポキシ樹脂を併用する場合、用いるエ
ポキシ樹脂とはエポキシ基を有するポリマー全般をい
う。例えばビスフェノール型エポキシ樹脂、クレゾール
ノボラック型エポキシ樹脂、フェノールノボラック型エ
ポキシ樹脂、トリフェノールメタン型エポキシ樹脂及び
アルキル変性トリフェノールメタン型エポキシ樹脂等の
3官能型エポキシ樹脂、トリアジン核含有エポキシ樹脂
等のことをいう。
When another epoxy resin is used in combination with the biphenyl type epoxy resin represented by the formula (1), the epoxy resin used means all polymers having an epoxy group. For example, trifunctional epoxy resin such as bisphenol type epoxy resin, cresol novolac type epoxy resin, phenol novolac type epoxy resin, triphenol methane type epoxy resin and alkyl modified triphenol methane type epoxy resin, triazine nucleus-containing epoxy resin, etc. Say.

【0013】本発明に用いる溶融混合物は式(2)及び
/または式(3)の可撓性フェノール樹脂硬化剤と硬化
促進剤である式(4)のトリトリルホスフィンとからな
る。式(2)及び式(3)の構造で示されるフェノール
樹脂硬化剤は、分子構造中に比較的柔軟な構造を有する
可撓性フェノール樹脂硬化剤でありフェノールノボラッ
ク樹脂硬化剤に比べ半田処理温度近辺での弾性率の低下
とリードフレーム及び半導体チップとの密着力を向上せ
しめることができる。従って半田付け時の発生応力の低
下と、それに伴う半導体チップ等との剥離不良の防止に
有効である。更に式(2)中のRはパラキシリレンで、
nの値は1〜5である。nが5を越えるとトランスファ
ー成形時での流動性が低下し、成形性が劣る傾向があ
る。また式(3)中のRはジシクロペタジエンとフェノ
ールを付加反応したジシクロペタジエンジフェノール、
テルペン類とフェノールを付加反応したテルペンジフェ
ノール、シクロペンタジエンとフェノールを付加反応し
たシクロペンタジエンジフェノール及びシクロヘキサノ
ンとフェノールを付加縮合したシクロヘキサノンジフェ
ノールの各々の2個のフェノール部を除いた残基を表
し、これらの中ではテルペン類とフェノールを付加反応
したテルペンジフェノールの2個のフェノール部を除い
た残基が好ましい。nの値は1〜5である。nが5を越
えるとトランスファー成形時での流動性が低下し、成形
性が劣る傾向がある。
The melt mixture used in the present invention comprises a flexible phenolic resin curing agent of formula (2) and / or formula (3) and a tollylphosphine of formula (4) which is a curing accelerator. The phenol resin curing agent represented by the structures of the formulas (2) and (3) is a flexible phenol resin curing agent having a relatively flexible structure in its molecular structure, and has a soldering temperature higher than that of the phenol novolac resin curing agent. It is possible to reduce the elastic modulus in the vicinity and to improve the adhesive force between the lead frame and the semiconductor chip. Therefore, it is effective in reducing the stress generated at the time of soldering and preventing the defective peeling from the semiconductor chip or the like. Further, R in the formula (2) is paraxylylene,
The value of n is 1-5. If n exceeds 5, the fluidity at the time of transfer molding tends to deteriorate, and the moldability tends to deteriorate. R in the formula (3) is dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol,
Represents a residue of terpene diphenol obtained by addition reaction of terpenes with phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene with phenol, and cyclohexanone diphenol obtained by addition condensation of cyclohexanone with phenol, excluding two phenolic moieties. Of these, a residue in which two phenol moieties of terpene diphenol obtained by addition reaction of terpenes with phenol is removed is preferable. The value of n is 1-5. If n exceeds 5, the fluidity at the time of transfer molding tends to deteriorate, and the moldability tends to deteriorate.

【0014】本発明に用いる硬化促進剤となるトリトリ
ルホスフィンはエポキシ基と水酸基との反応を促進する
ものである。このトリトリルホスフィンを用いた樹脂組
成物は、保存安定性に優れているという特徴がある。こ
の硬化促進剤の添加量は、総樹脂組成物中に0.1〜
1.0重量%であることが好ましい。0.1重量%未満
だと硬化が十分ではなく、硬化物に十分な強度を与える
ことができない。1.0重量%を越えると、反応に関与
しない硬化促進剤が硬化物中に残留し、信頼性等に悪影
響を及ぼすからである。
The tritolylphosphine used as the curing accelerator in the present invention accelerates the reaction between the epoxy group and the hydroxyl group. The resin composition using this tritolylphosphine is characterized by excellent storage stability. The amount of the curing accelerator added is 0.1 to 0.1% based on the total resin composition.
It is preferably 1.0% by weight. If it is less than 0.1% by weight, the curing is insufficient and sufficient strength cannot be given to the cured product. This is because if it exceeds 1.0% by weight, the curing accelerator that does not participate in the reaction remains in the cured product and adversely affects the reliability and the like.

【0015】本発明の特徴は、式(2)及び/または式
(3)で示される可撓性フェノール樹脂硬化剤に硬化促
進剤である式(4)で示されるトリトリルホスフィンを
予め溶融混合した溶融混合物を用いることである。可撓
性フェノール樹脂硬化剤と硬化促進剤の溶融混合手順
は、例えば以下のようなものであるが、均一に溶融混合
できれば、これに限定されるものではない。可撓性フェ
ノール樹脂硬化剤と硬化促進剤とをN2置換下で撹拌し
ながら加熱溶融させる。この際、溶融混合温度は100
〜200℃が好ましい。溶融混合時間は、特に限定する
ものではないが、溶融混合系が透明になってから、30
分間程度であれば通常十分である。この溶融混合物はフ
ェノールノボラック樹脂硬化剤と併用してもよい。併用
するフェノールノボラック樹脂硬化剤は、フェノール類
とホルムアルデヒド等のアルデヒド源との重縮合反応に
より合成される1分子中に2個以上のフェノール性水酸
基を有する通常の樹脂、例えばフェノールノボラック樹
脂、クレゾールノボラック樹脂である。この溶融混合物
の量を調節することにより、耐半田ストレス性を最大限
に引きだすことができる。耐半田ストレス性の効果を引
きだすためには、溶融混合物中の式(2)及び/または
式(3)で示される可撓性フェノール樹脂硬化剤を総フ
ェノール樹脂硬化剤量中に30重量%以上、更に好まし
くは50重量%含むものが望ましい。使用量が30重量
%未満だと低弾性及びリードフレーム、半導体チップと
の密着力が不充分で耐半田ストレス性の向上が望めな
い。
A feature of the present invention is that the flexible phenol resin curing agent represented by the formula (2) and / or the formula (3) is preliminarily melt-mixed with the tritolylphosphine represented by the formula (4) which is a curing accelerator. It is to use the melt mixture. The procedure for melt-mixing the flexible phenol resin curing agent and the curing accelerator is, for example, as follows, but is not limited to this as long as it can be uniformly melt-mixed. The flexible phenol resin curing agent and the curing accelerator are heated and melted while stirring under N 2 substitution. At this time, the melt mixing temperature is 100
-200 degreeC is preferable. The melt-mixing time is not particularly limited, but after the melt-mixing system becomes transparent, 30
About a minute is usually sufficient. This molten mixture may be used in combination with a phenol novolac resin curing agent. The phenol novolac resin curing agent used in combination is an ordinary resin having two or more phenolic hydroxyl groups in one molecule synthesized by a polycondensation reaction of phenols with an aldehyde source such as formaldehyde, for example, phenol novolac resin, cresol novolac resin. It is a resin. By adjusting the amount of this molten mixture, the solder stress resistance can be maximized. In order to bring out the effect of resistance to solder stress, the flexible phenol resin curing agent represented by the formula (2) and / or the formula (3) in the molten mixture is added in an amount of 30% by weight or more based on the total amount of the phenol resin curing agent. , More preferably 50% by weight. If the amount used is less than 30% by weight, the elasticity is low and the adhesion to the lead frame and the semiconductor chip is insufficient, and improvement in solder stress resistance cannot be expected.

【0016】フェノールノボラック樹脂硬化剤に比べ
て、エポキシ樹脂との反応速度が遅い可撓性フェノール
樹脂硬化剤に式(4)に示すトリトリルホスフィンを溶
融混合して得られる溶融混合物を用いることにより、フ
ェノールノボラック樹脂硬化剤と同等の反応速度を得る
ことができる。これによりフェノールノボラック樹脂と
併用しても、反応速度の差による硬化後のエポキシ樹脂
組成物中の未反応の可撓性フェノール樹脂硬化剤の残留
を防ぐことができ、成形品表面に未反応成分による白色
斑点の存在、熱時硬化度の低下等の諸問題を解決するこ
とができる。溶融混合物の使用方法として、別々に製造
した2種以上の溶融混合物をエポキシ樹脂組成物の製造
時に用いてもよい。
By using a melt mixture obtained by melt-mixing the tollylphosphine represented by the formula (4) with a flexible phenol resin curing agent having a slow reaction rate with an epoxy resin as compared with a phenol novolac resin curing agent. It is possible to obtain the same reaction rate as that of the phenol novolac resin curing agent. As a result, even when used in combination with a phenol novolac resin, it is possible to prevent the unreacted flexible phenol resin curing agent from remaining in the cured epoxy resin composition due to the difference in reaction rate, and to prevent unreacted components on the surface of the molded product. It is possible to solve various problems such as the presence of white spots and the decrease in the degree of curing when heated. As a method of using the melt mixture, two or more kinds of melt mixtures produced separately may be used at the time of producing the epoxy resin composition.

【0017】本発明で用いる無機充填材としては、溶融
シリカ粉末、球状シリカ粉末、結晶シリカ粉末、2次凝
集シリカ粉末、多孔質シリカ粉末、2次凝集シリカ粉末
または多孔質シリカ粉末を粉砕したシリカ粉末、アルミ
ナ等が挙げられ、特に溶融シリカ粉末、球状シリカ粉
末、及び溶融シリカ粉末と球状シリカ粉末との混合物が
好ましい。また無機充填材の配合量としては耐半田スト
レス性と成形性のバランスから組成物総量中に70〜9
0重量%含むものが好ましい。
As the inorganic filler used in the present invention, fused silica powder, spherical silica powder, crystalline silica powder, secondary agglomerated silica powder, porous silica powder, secondary agglomerated silica powder or silica obtained by pulverizing porous silica powder is used. Examples thereof include powder and alumina, and fused silica powder, spherical silica powder, and a mixture of fused silica powder and spherical silica powder are particularly preferable. Further, the compounding amount of the inorganic filler is 70 to 9 in the total amount of the composition in view of the balance between solder stress resistance and moldability.
Those containing 0% by weight are preferable.

【0018】本発明の封止用エポキシ樹脂組成物はエポ
キシ樹脂、可撓性フェノール硬化剤とトリトリルホスフ
ィンとの溶融混合物および無機充填材を必須成分とする
が、これ以外に必要に応じて、シランカップリング剤、
ブロム化エポキシ樹脂、三酸化アンチモン、ヘキサブロ
ムベンゼン等の難燃剤、カーボンブラック、ベンガラ等
の着色剤、天然ワックス、合成ワックス等の離型剤及び
シリコーンオイル、ゴム等の低応力添加剤等の種々の添
加剤を適宜配合しても差し支えがない。また、本発明の
封止用エポキシ樹脂組成物を成形材料として製造するに
は、エポキシ樹脂、溶融混合物、無機充填材、その他の
添加剤をミキサー等によって充分に均一に混合した後、
更に熱ロール又はニーダー等で溶融混練し、冷却後粉砕
して成形材料とすることができる。これらの成形材料は
電子部品あるいは電気部品の封止、被覆、絶縁等に適用
することができる。
The epoxy resin composition for encapsulation of the present invention contains an epoxy resin, a melted mixture of a flexible phenol curing agent and tritolylphosphine, and an inorganic filler as essential components. Silane coupling agent,
A variety of flame retardants such as brominated epoxy resin, antimony trioxide, hexabromobenzene, colorants such as carbon black and red iron oxide, mold release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber. There is no problem even if the above-mentioned additive is properly mixed. Further, in order to produce the encapsulating epoxy resin composition of the present invention as a molding material, after the epoxy resin, the melt mixture, the inorganic filler, and other additives are sufficiently uniformly mixed by a mixer or the like,
Further, it can be melt-kneaded with a hot roll or a kneader, cooled and then pulverized to obtain a molding material. These molding materials can be applied to sealing, coating, insulating, etc. of electronic parts or electric parts.

【0019】溶融混合物の製造例 溶融混合物1 式(5)で示される可撓性フェノール樹脂硬化剤(軟化
点75℃、水酸基当量175g/eq、nが1から4の
混合物であり、重量割合でn=1が20、n=2が4
0、n=3が30、n=4が10)600重量部と式
(4)に示すトリトリルホスフィン20重量部を150
℃で1時間溶融混合した(以下溶融混合物Aとする)。
Production Example of Melt Mixture Melt Mixture 1 A flexible phenol resin curing agent represented by the formula (5) (softening point 75 ° C., hydroxyl group equivalent 175 g / eq, n is a mixture of 1 to 4, and is in a weight ratio. 20 for n = 1, 4 for n = 2
0, n = 3 = 30, n = 4 = 10) 600 parts by weight and 150 parts by weight of tritolylphosphine represented by the formula (4).
The mixture was melt-mixed at 0 ° C. for 1 hour (hereinafter referred to as “melt mixture A”).

【0020】[0020]

【化9】 [Chemical 9]

【0021】溶融混合物2 式(6)で示される可撓性フェノール樹脂硬化剤(軟化
点120℃、水酸基当量174g/eq、nが1から4
の混合物であり、重量割合でn=1が10、n=2が4
0、n=3が30、n=4が20)600重量部と式
(4)で示されるトリトリルホスフィン20重量部を1
50℃で1時間溶融混合した(以下溶融混合物Bとす
る)。
Melt Mixture 2 Flexible phenolic resin curing agent represented by the formula (6) (softening point 120 ° C., hydroxyl group equivalent 174 g / eq, n is 1 to 4)
And n = 1 is 10 and n = 2 is 4 by weight.
0, n = 3 = 30, n = 4 = 20) 600 parts by weight and 1 part of 20 parts by weight of the tritolylphosphine represented by the formula (4).
Melt mixing was carried out at 50 ° C. for 1 hour (hereinafter referred to as “melt mixture B”).

【0022】[0022]

【化10】 [Chemical 10]

【0023】溶融混合物3 フェノールノボラック樹脂硬化剤(軟化点105℃、水
酸基当量104g/eq)600重量部と式(4)で示
されるトリトリルホスフィン20重量部を150℃で1
時間溶融混合した(以下溶融混合物Cとする)。
Melt Mixture 3 600 parts by weight of a phenol novolac resin curing agent (softening point: 105 ° C., hydroxyl group equivalent: 104 g / eq) and 20 parts by weight of tritolylphosphine represented by the formula (4) at 150 ° C.
It was melt-mixed for a time (hereinafter referred to as a melt mixture C).

【0024】[0024]

【実施例】以下、本発明を実施例で具体的に説明する。 実施例1 下記組成物3、3′、5、5′−テトラメチルビフェノールジグリシジルエー テル(融点104℃、エポキシ基当量190g/eq) 12重量部 溶融混合物A 6.2重量部 フェノールノボラック樹脂硬化剤(軟化点105℃、水酸基当量104g/e q) 2重量部 溶融シリカ粉末 78.8重量部 カーボンブラック 0.5重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルで混練し、冷却後粉砕し成形材料とした。得られた成
形材料を、タブレット化し、低圧トランスファー成形機
にて175℃、70kg/cm2、120秒の条件で半
田クラック試験用として6×6mmのチップを52pパッ
ケージに封止し、また半田耐湿性試験用として3×6mm
のチップを16pSOPパッケージに封止した。封止し
たテスト用素子について下記の半田クラック試験及び半
田耐湿性試験を行った。評価結果を表1に示す。
EXAMPLES The present invention will be specifically described below with reference to examples. Example 1 The following composition 3,3 ', 5,5'-tetramethylbiphenol diglycidyl ether (melting point 104 ° C, epoxy group equivalent 190 g / eq) 12 parts by weight Melt mixture A 6.2 parts by weight Phenol novolac resin curing Agent (softening point 105 ° C., hydroxyl group equivalent 104 g / eq) 2 parts by weight fused silica powder 78.8 parts by weight carbon black 0.5 parts by weight Carnauba wax 0.5 parts by weight are mixed with a mixer at room temperature to 70 to 100. The mixture was kneaded with a biaxial roll at ℃, cooled and pulverized to obtain a molding material. The obtained molding material is made into a tablet, and a 6 x 6 mm chip is sealed in a 52p package for a solder crack test under conditions of 175 ° C, 70 kg / cm 2 and 120 seconds with a low-pressure transfer molding machine, and solder moisture resistance. 3 × 6mm for sex test
The chip was encapsulated in a 16p SOP package. The following solder crack test and solder moisture resistance test were performed on the sealed test element. The evaluation results are shown in Table 1.

【0025】半田クラック試験:封止したテスト用素子
を85℃、85%RHの環境下で48Hr及び72Hr
処理し、その後260℃の半田槽に10秒間浸漬後、顕
微鏡で外部クラックを観察した。 半田耐湿性試験:封止したテスト用素子を85℃、85
%RHの環境下で72Hr処理し、その後260℃の半
田槽に10秒間浸漬後、プレッシャークッカー試験(1
25℃、100%RH)を行い回路のオーブン不良を測
定した。 成形性試験:175℃、70kg/cm2でトランスフ
ァー成形機を用いて、160pDIPを成形し、離型1
0秒後にバコール硬度を測定した。得られた成形品によ
り、バリ(ベント)、離型性、外観のチェックを行っ
た。 ゲルタイム:175℃の熱板上で測定した。
Solder crack test: The sealed test element was subjected to an environment of 85 ° C. and 85% RH for 48 hours and 72 hours.
After processing, it was immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: sealed test element at 85 ° C, 85
72Hr treatment in an environment of% RH, then after dipping in a solder bath at 260 ° C for 10 seconds, a pressure cooker test (1
At 25 ° C. and 100% RH), the oven failure of the circuit was measured. Moldability test: 160 pDIP was molded using a transfer molding machine at 175 ° C. and 70 kg / cm 2 , and mold release 1
Bacol hardness was measured after 0 seconds. The obtained molded product was checked for burr (vent), releasability and appearance. Gel time: measured on a hot plate at 175 ° C.

【0026】実施例2、3 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で試験用の封止した成形品を
得、この成形品を用いて実施例1と同様に半田クラック
試験及び半田耐湿性試験を行った。なお実施例4のオル
ソクレゾールノボラック型エポキシ樹脂は、軟化点65
℃、エポキシ基当量200g/eqである。評価結果を
表1に示す。 比較例1〜6 表2の処方に従って配合し、実施例1と同様にして成形
材料を得た。比較例1、4、5に用いる可撓性フェノー
ル樹脂硬化剤は式(5)の構造のものである(軟化点7
5℃、水酸基当量175g/eq、nが1から4の混合
物であり、重量割合でn=1が20、n=2が40、n
=3が30、n=4が10)。比較例2に用いる可撓性
フェノール樹脂硬化剤は式(6)の構造のものである
(軟化点120℃、水酸基当量170g/eq、nが1
から4の混合物であり、重量割合でn=1が10、n=
2が40、n=3が30、n=4が20)。この成形材
料で試験用の封止した成形品を得、この成形品を用いて
実施例1と同様に半田クラック試験及び半田耐湿性試験
を行った。評価結果を表2に示す。
Examples 2 and 3 Compounding was carried out according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. Using this molding material, a molded product sealed for testing was obtained, and a solder crack test and a solder moisture resistance test were carried out in the same manner as in Example 1 using this molded product. The ortho-cresol novolac type epoxy resin of Example 4 had a softening point of 65.
C., epoxy group equivalent is 200 g / eq. The evaluation results are shown in Table 1. Comparative Examples 1 to 6 Compounding was carried out according to the prescription of Table 2, and a molding material was obtained in the same manner as in Example 1. The flexible phenol resin curing agent used in Comparative Examples 1, 4, and 5 has the structure of formula (5) (softening point 7
5 ° C., hydroxyl group equivalent 175 g / eq, n is a mixture of 1 to 4, and in weight ratio, n = 1 is 20, n = 2 is 40, n
= 3 = 30, n = 4 = 10). The flexible phenol resin curing agent used in Comparative Example 2 has the structure of formula (6) (softening point 120 ° C., hydroxyl group equivalent 170 g / eq, n is 1).
To 4 in a weight ratio of n = 1 to 10, n =
2 is 40, n = 3 is 30, and n = 4 is 20). Using this molding material, a molded product sealed for testing was obtained, and a solder crack test and a solder moisture resistance test were carried out in the same manner as in Example 1 using this molded product. The evaluation results are shown in Table 2.

【0027】[0027]

【表1】 [Table 1]

【0028】[0028]

【表2】 [Table 2]

【0028】[0028]

【発明の効果】本発明に従うと従来技術では得ることの
できなかった可撓性フェノール樹脂硬化剤及びエポキシ
樹脂よりなる組成物の成形性、硬化性の改良が達成で
き、半田付け工程における急激な温度変化による熱スト
レスを受けた時の耐クラック性に非常に優れ、更に耐湿
性が良好なことから電子、電気部品の封止用、被覆用、
絶縁用等に用いた場合、特に表面実装パッケージに搭載
された高集積大型チップICにおいて、信頼性を非常に
必要とする製品について好適である。
According to the present invention, it is possible to improve the moldability and curability of a composition comprising a flexible phenol resin curing agent and an epoxy resin, which could not be obtained by the prior art, and to achieve a rapid improvement in the soldering process. It has excellent resistance to cracking when it is subjected to thermal stress due to temperature changes, and because it has good resistance to moisture, it can be used for sealing and coating electronic and electrical parts.
When used for insulation or the like, it is suitable for products that require extremely high reliability, especially in highly integrated large chip ICs mounted in surface mount packages.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C08G 59/62 NJS C08K 3/00 NKT C08L 63/00 NJW H01L 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C08G 59/62 NJS C08K 3/00 NKT C08L 63/00 NJW H01L 23/29 23/31

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (A)式(1)で示されるエポキシ樹脂
を総エポキシ樹脂量中に50〜100重量%含むエポキ
シ樹脂、 【化1】 (式中のR1〜R8は水素、ハロゲン、アルキル基の中か
ら選択される同一もしくは異なる原子または基) (B)式(2)及び/または式(3)で示される可撓性
フェノール樹脂硬化剤と式(4)で示される硬化促進剤
であるトリトリルホスフィンを予め加熱溶融されてなる
溶融混合物及び 【化2】 (式中のRはパラキシリレン、nの値は1〜5) 【化3】 (式中のRはジシクロペタジエンとフェノールを付加反
応したジシクロペタジエンフェノール、テルペン類とフ
ェノールを付加反応したテルペンジフェノール、シクロ
ペンタジエンとフェノールを付加反応したシクロペンタ
ジエンジフェノール及びシクロヘキサノンとフェノール
を付加縮合したシクロヘキサノンジフェノールの各々の
2個のフェノール部を除いた残基を表し、これらの中か
ら選択される1種、nの値は1〜5) 【化4】 (C)無機充填材を必須成分とすることを特徴とする半
導体封止用エポキシ樹脂組成物。
1. An epoxy resin comprising (A) an epoxy resin represented by the formula (1) in an amount of 50 to 100% by weight in the total amount of epoxy resin, (Wherein R 1 to R 8 are the same or different atoms or groups selected from hydrogen, halogen and alkyl groups) (B) Flexible phenol represented by formula (2) and / or formula (3) A molten mixture obtained by previously heating and melting a resin curing agent and a tollylphosphine that is a curing accelerator represented by the formula (4), and (R in the formula is paraxylylene, and the value of n is 1 to 5) (R in the formula is dicyclopetadiene phenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol and cyclohexanone and phenol Represents a residue obtained by removing each of the two phenol moieties of cyclohexanone diphenol that is addition-condensed with, and one selected from these, the value of n is 1 to 5). (C) An epoxy resin composition for semiconductor encapsulation, which comprises an inorganic filler as an essential component.
【請求項2】 式(3)のRがテルペン類とフェノール
を付加反応したテルペンジフェノールの2個のフェノー
ル部を除いた残基である請求項1記載の半導体封止用エ
ポキシ樹脂組成物。
2. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein R in the formula (3) is a residue of terpene diphenol obtained by addition reaction of terpenes with phenol, excluding two phenol moieties.
JP6634894A 1994-04-05 1994-04-05 Epoxy resin composition Expired - Lifetime JP3192315B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6634894A JP3192315B2 (en) 1994-04-05 1994-04-05 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6634894A JP3192315B2 (en) 1994-04-05 1994-04-05 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPH07278261A true JPH07278261A (en) 1995-10-24
JP3192315B2 JP3192315B2 (en) 2001-07-23

Family

ID=13313275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6634894A Expired - Lifetime JP3192315B2 (en) 1994-04-05 1994-04-05 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JP3192315B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008127553A (en) * 2006-11-24 2008-06-05 Matsushita Electric Works Ltd Epoxy resin composition for sealing, and semiconductor device using it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008127553A (en) * 2006-11-24 2008-06-05 Matsushita Electric Works Ltd Epoxy resin composition for sealing, and semiconductor device using it

Also Published As

Publication number Publication date
JP3192315B2 (en) 2001-07-23

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