JP3274265B2 - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JP3274265B2 JP3274265B2 JP31991093A JP31991093A JP3274265B2 JP 3274265 B2 JP3274265 B2 JP 3274265B2 JP 31991093 A JP31991093 A JP 31991093A JP 31991093 A JP31991093 A JP 31991093A JP 3274265 B2 JP3274265 B2 JP 3274265B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- phenol
- formula
- curing agent
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体デバイスの表面
実装化における耐半田ストレス性、硬化性に優れた半導
体封止用エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation, which is excellent in resistance to soldering stress and curability in surface mounting of a semiconductor device.
【0002】[0002]
【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラック型エポキシ樹脂をノボラック型フェノール
樹脂で硬化させたエポキシ樹脂組成物が用いられてい
る。ところが近年、集積回路の高集積化に伴いチップが
だんだん大型化し、かつパッケージは従来のDIPタイ
プから表面実装化された小型、薄型のフラットパッケー
ジ、SOP,SOJ,PLCCに変わってきている。即
ち大型チップを小型で薄いパッケージに封入することに
なり、応力によりクラック発生、これらのクラックによ
る耐湿性の低下等の問題が大きくクローズアップされて
きている。特に半田付けの工程において急激に200℃
以上の高温にさらされることによりパッケージの割れや
樹脂とチップの剥離により耐湿性が劣化してしまうとい
った問題点がでてきている。従ってこれらの大型のチッ
プを封止するのに適した、信頼性の高い封止用樹脂組成
物の開発が望まれてきている。2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits have been sealed with a thermosetting resin. In particular, in an integrated circuit, an ortho-cresol novolak type epoxy resin having excellent heat resistance and moisture resistance is used. An epoxy resin composition cured with a mold phenol resin is used. However, in recent years, chips have become larger and larger as integrated circuits have become more highly integrated, and packages have changed from conventional DIP types to small, thin flat packages surface-mounted, SOPs, SOJs, and PLCCs. That is, a large chip is sealed in a small and thin package, and cracks are generated due to stress, and problems such as a decrease in moisture resistance due to the cracks have been greatly highlighted. Especially 200 ° C suddenly in the soldering process
Exposure to the above-mentioned high temperature causes a problem that the moisture resistance is deteriorated due to cracking of the package or separation of the resin and the chip. Therefore, development of a highly reliable encapsulating resin composition suitable for encapsulating these large chips has been desired.
【0003】これらの問題を解決するためにエポキシ樹
脂として式(1)で示されるエポキシ樹脂の使用(特開
昭64−65116号公報)が検討されてきた。式
(1)で示されるエポキシ樹脂の使用により樹脂系の低
粘度化が図られ、従って溶融シリカ粉末を更に多く配合
することにより組成物の成形後の低熱膨張化及び低吸水
化により耐半田ストレス性の向上が図られた。ただし、
溶融シリカ粉末を多く配合することによる弾性率の増加
も一方の弊害であり、更なる耐半田ストレス性の向上が
必要である。[0003] In order to solve these problems, use of an epoxy resin represented by the formula (1) as an epoxy resin (JP-A-64-65116) has been studied. By using the epoxy resin represented by the formula (1), the viscosity of the resin system can be reduced. Therefore, by adding more fused silica powder, the composition can have low thermal expansion and low water absorption after molding, and can have low soldering stress. The performance has been improved. However,
An increase in the modulus of elasticity due to the addition of a large amount of fused silica powder is another adverse effect, and it is necessary to further improve the solder stress resistance.
【0004】この問題を解決するために、式(2)、式
(3)で示される可撓性フェノール樹脂硬化剤の使用が
検討され、耐半田ストレス性の改良には効果があるが、
反面エポキシ樹脂との反応性に劣り、ゲルタイムが長
い、バリが発生しやすい、熱時硬度が低い、離型性が劣
る、成形品表面に未反応成分による白色斑点が存在する
等の問題もあり、改良の必要があった。これらの問題を
解決する手段として、硬化促進剤の添加量の増加がある
が、一般に硬化促進剤の添加量を増加させると、硬化性
は促進され上記の問題は解決されるが、それに伴いエポ
キシ樹脂組成物の耐湿性が低下する。従って、硬化促進
剤の添加量を可能な限り少なくし、かつ硬化性を上げる
手段の開発が必要となってきた。この手段としてノボラ
ック型フェノール樹脂と硬化促進剤の溶融が提案されて
いる(特開昭61−4253号公報)。しかしながら、
式(2)、式(3)の可撓性フェノール樹脂硬化剤を併
用したエポキシ樹脂組成物では充分な硬化性の改良に至
らず、更に改良が必要となってきている。In order to solve this problem, the use of a flexible phenolic resin curing agent represented by the formulas (2) and (3) has been studied, which is effective in improving the solder stress resistance.
On the other hand, there are also problems such as poor reactivity with epoxy resin, long gel time, easy occurrence of burrs, low hardness when heated, poor releasability, and white spots due to unreacted components on the molded product surface. , There was a need for improvement. As a means for solving these problems, there is an increase in the addition amount of a curing accelerator. In general, when the addition amount of the curing accelerator is increased, the curability is accelerated and the above-mentioned problems are solved, however, the epoxy The moisture resistance of the resin composition decreases. Therefore, it has become necessary to develop a means for minimizing the amount of the curing accelerator added and improving the curability. Melting of the novolak type phenolic resin and curing accelerator has been proposed as the means (JP 6 1 -4253 JP). However,
Epoxy resin compositions using the flexible phenolic resin curing agents of the formulas (2) and (3) in combination do not lead to a sufficient improvement in curability and require further improvement.
【0005】[0005]
【発明が解決しようとする課題】本発明は半田付け工程
における急激な温度変化による熱ストレスを受けたとき
の耐クラック性に非常に優れ、かつ耐湿性、成形時の反
応性の違いから生じるバリ、白色斑点、離型性等の諸問
題の改良されたエポキシ樹脂組成物を提供することにあ
る。DISCLOSURE OF THE INVENTION The present invention is excellent in crack resistance when subjected to thermal stress due to a rapid temperature change in a soldering process, and has a burr caused by differences in moisture resistance and reactivity during molding. An object of the present invention is to provide an epoxy resin composition having improved problems such as white spots, releasability and the like.
【0006】[0006]
【課題を解決するための手段】本発明は、(A)式
(1)で示されるエポキシ樹脂を総エポキシ樹脂量中に
50〜100重量%含むエポキシ樹脂、According to the present invention, there is provided an epoxy resin comprising (A) an epoxy resin represented by the formula (1) in an amount of 50 to 100% by weight based on the total amount of the epoxy resin;
【0007】[0007]
【化4】 Embedded image
【0008】(B)式(2)及び/または式(3)で示
される可撓性フェノール樹脂硬化剤と硬化促進剤である
テトラフェニルホスホニウム・テトラフェニルボレート
とを予め加熱溶融されてなる溶融混合物及び(B) A molten mixture obtained by previously heating and melting a flexible phenol resin curing agent represented by the formula (2) and / or formula (3) and a curing accelerator, tetraphenylphosphonium tetraphenylborate. as well as
【0009】[0009]
【化5】 (式中のRはパラキシリレン、nの値は1〜5)Embedded image (R in the formula is paraxylylene, and the value of n is 1 to 5)
【0010】[0010]
【化6】 (式中のRはジシクロペタジエンとフェノールを付加反
応したジシクロペタジエンジフェノール、テルペン類と
フェノールを付加反応したテルペンジフェノール、シク
ロペンタジエンとフェノールを付加反応したシクロペン
タジエンジフェノール及びシクロヘキサノンとフェノー
ルを付加縮合したシクロヘキサノンジフェノールの各々
の2個のフェノール部を除いた残基を表し、これらの中
から選択される1種、nの値は0〜4)Embedded image (R in the formula represents dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol, and cyclohexanone. Represents a residue obtained by removing two phenol moieties of each of cyclohexanone diphenols obtained by addition condensation of phenol, and one kind selected from these, and the value of n is 0 to 4)
【0011】(C)無機充填材 を必須成分とする半導体封止用エポキシ樹脂組成物であ
る。(C) An epoxy resin composition for semiconductor encapsulation containing an inorganic filler as an essential component.
【0012】本発明に用いる式(1)の構造で示される
ビフェニル型エポキシ樹脂は1分子中に2個のエポキシ
基を有する2官能性エポキシ樹脂で、従来の多官能性エ
ポキシ樹脂に比べ溶融粘度が低く、トランスファー成形
時の流動性に優れる。従って、組成物の溶融シリカ粉末
を多く配合することができ、低熱膨張化及び低吸水化が
図られ、耐半田ストレス性に優れるエポキシ樹脂組成物
を得ることができる。このビフェニル型エポキシ樹脂の
使用量は、これを調節することにより耐半田ストレス性
を最大限に引き出すことができる。耐半田ストレス性の
効果を出すためには、式(1)で示されるビフェニル型
エポキシ樹脂を総エポキシ樹脂量の50重量%以上、好
ましくは70重量%以上使用するのが望ましい。50重
量%未満だと低熱膨張化及び低吸水性が得られず、耐半
田ストレス性が不充分である。更に式中のR1〜R4はメ
チル基、R5〜R8は水素原子が好ましい。式(1)で示
されるビフェニル型エポキシ樹脂以外に他のエポキシ樹
脂を併用する場合、用いるエポキシ樹脂とはエポキシ基
を有するポリマー全般をいう。例えばビスフェノール型
エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、
フェノールノボラック型エポキシ樹脂、トリフェノール
メタン型エポキシ樹脂及びアルキル変性トリフェノール
メタン型エポキシ樹脂等の3官能型エポキシ樹脂、トリ
アジン核含有エポキシ樹脂等のことをいう。The biphenyl type epoxy resin represented by the structure of the formula (1) used in the present invention is a bifunctional epoxy resin having two epoxy groups in one molecule, and has a higher melt viscosity than a conventional polyfunctional epoxy resin. And excellent fluidity during transfer molding. Therefore, a large amount of the fused silica powder of the composition can be blended, an epoxy resin composition having low thermal expansion and low water absorption, and having excellent solder stress resistance can be obtained. By adjusting the amount of the biphenyl type epoxy resin used, the solder stress resistance can be maximized. In order to obtain the effect of resistance to solder stress, it is desirable to use the biphenyl type epoxy resin represented by the formula (1) in an amount of 50% by weight or more, preferably 70% by weight or more of the total epoxy resin amount. If it is less than 50% by weight, low thermal expansion and low water absorption cannot be obtained, and the solder stress resistance is insufficient. Further, in the formula, R 1 to R 4 are preferably a methyl group, and R 5 to R 8 are preferably a hydrogen atom. When another epoxy resin is used in addition to the biphenyl-type epoxy resin represented by the formula (1), the epoxy resin used generally refers to any polymer having an epoxy group. For example, bisphenol type epoxy resin, cresol novolak type epoxy resin,
It refers to a trifunctional epoxy resin such as a phenol novolak type epoxy resin, a triphenolmethane type epoxy resin and an alkyl-modified triphenolmethane type epoxy resin, and a triazine nucleus containing epoxy resin.
【0013】本発明に用いる溶融混合物は式(2)及び
/または式(3)の可撓性フェノール樹脂硬化剤と硬化
促進剤であるテトラフェニルホスホニウム・テトラフェ
ニルボレートとからなる。式(2)及び式(3)の構造
で示されるフェノール樹脂硬化剤は、分子構造中に比較
的柔軟な構造を有する可撓性フェノール樹脂硬化剤であ
り、フェノールノボラック樹脂硬化剤に比べ半田処理温
度近辺での弾性率の低下とリードフレーム及び半導体チ
ップとの密着力を向上せしめることができる。従って半
田付け時の発生応力の低下と、それに伴う半導体チップ
等との剥離不良の防止に有効である。更に式(2)中の
Rはパラキシリレンで、nの値は1〜5である。nが5
を越えるとトランスファー成形時での流動性が低下し、
成形性が劣る傾向がある。また式(3)中のRはジシク
ロペタジエンとフェノールを付加反応したジシクロペタ
ジエンジフェノール、テルペン類とフェノールを付加反
応したテルペンジフェノール、シクロペンタジエンとフ
ェノールを付加反応したシクロペンタジエンジフェノー
ル及びシクロヘキサノンとフェノールを付加縮合したシ
クロヘキサノンジフェノールの各々の2個のフェノール
部を除いた残基を表し、これらの中ではテルペン類とフ
ェノールを付加反応したテルペンジフェノールの2個の
フェノール部を除いた残基が好ましい。nの値は0〜4
である。nが4を越えるとトランスファー成形時での流
動性が低下し、成形性が劣る傾向がある。The molten mixture used in the present invention comprises a flexible phenolic resin curing agent of formula (2) and / or formula (3) and a curing accelerator, tetraphenylphosphonium tetraphenylborate. The phenolic resin curing agents represented by the structures of formulas (2) and (3) are flexible phenolic resin curing agents having a relatively flexible structure in the molecular structure, and are more solder-treated than phenol novolak resin curing agents. It is possible to reduce the elastic modulus near the temperature and improve the adhesion between the lead frame and the semiconductor chip. Therefore, it is effective in preventing a reduction in stress generated at the time of soldering and a resulting peeling defect from a semiconductor chip or the like. Further, R in the formula (2) is paraxylylene, and the value of n is 1 to 5. n is 5
If it exceeds, the fluidity during transfer molding decreases,
Moldability tends to be poor. R in the formula (3) is dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, and cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol. And the residue of cyclohexanone diphenol obtained by addition condensation of cyclohexanone and phenol, excluding the two phenol moieties of terpene diphenol obtained by addition reaction of terpenes with phenol. Are preferred. The value of n is 0-4
It is. If n exceeds 4, the fluidity during transfer molding tends to decrease, and moldability tends to be poor.
【0014】本発明に用いる硬化促進剤となるテトラフ
ェニルホスホニウム・テトラフェニルボレートはエポキ
シ基と水酸基との反応を促進するものであり、一般に半
導体封止用材料に使用されている。この硬化促進剤の添
加量は、樹脂組成物中に0.1〜1.0重量%であるこ
とが好ましい。0.1未満だと充分な強度の硬化物が得
られず、1.0を越えると流動性が低下し、未充填の原
因となる。本発明の特徴は、式(2)及び/または式
(3)で示される可撓性フェノール樹脂硬化剤に硬化促
進剤であるテトラフェニルホスホニウム・テトラフェニ
ルボレートとを予め溶融混合した溶融混合物を用いるこ
とである。可撓性フェノール樹脂硬化剤と硬化促進剤の
溶融混合手順は、例えば以下のようなものであるが、均
一に溶融混合できれば、これに限定されるものではな
い。可撓性フェノール樹脂硬化剤と硬化促進剤とをN2
置換下で撹拌しながら加熱溶融させる。この際、溶融混
合温度は150〜250℃が好ましい。溶融混合時間
は、特に限定するものではないが、溶融混合系が透明に
なってから、30分間程度であれば通常十分である。Tetraphenylphosphonium tetraphenylborate, which is a curing accelerator used in the present invention, promotes the reaction between an epoxy group and a hydroxyl group, and is generally used as a semiconductor encapsulating material. The addition amount of this curing accelerator is preferably 0.1 to 1.0% by weight in the resin composition. If it is less than 0.1, a cured product of sufficient strength cannot be obtained, and if it exceeds 1.0, the fluidity decreases and it causes unfilling. A feature of the present invention is to use a molten mixture in which a flexible phenol resin curing agent represented by the formula (2) and / or the formula (3) is melt-mixed in advance with a curing accelerator, tetraphenylphosphonium / tetraphenylborate. That is. The procedure for melt-mixing the flexible phenolic resin curing agent and the curing accelerator is, for example, as follows, but is not limited to this as long as it can be uniformly melt-mixed. A flexible phenol resin curing agent and a curing accelerator are mixed with N 2
Heat and melt while stirring under displacement. At this time, the melting and mixing temperature is preferably from 150 to 250C. Although the melt mixing time is not particularly limited, it is usually sufficient if the melt mixing time is about 30 minutes after the melt mixing system becomes transparent.
【0015】この溶融混合物はフェノールノボラック樹
脂硬化剤と併用してもよい。併用するフェノールノボラ
ック樹脂硬化剤は、フェノール類とホルムアルデヒド等
のアルデヒド源との重縮合反応により合成される1分子
中に2個以上のフェノール性水酸基を有する通常の樹
脂、例えばフェノールノボラック樹脂、クレゾールノボ
ラック樹脂である。この溶融混合物の量を調節すること
により、耐半田ストレス性を最大限に引き出すことがで
きる。耐半田ストレス性の効果を引き出すためには、溶
融混合物中の式(2)及び/または式(3)で示される
可撓性フェノール樹脂硬化剤を総フェノール樹脂硬化剤
量中に30重量%以上、更に好ましくは50重量%含む
ものが望ましい。使用量が30重量%未満だと低弾性及
びリードフレーム、半導体チップとの密着力が不充分で
耐半田ストレス性の向上が望めない。フェノールノボラ
ック樹脂硬化剤に比べて、エポキシ樹脂との反応速度が
遅い可撓性フェノール樹脂硬化剤にテトラフェニルホス
ホニウム・テトラフェニルボレートを溶融混合して得ら
れる溶融混合物を用いることにより、フェノールノボラ
ック樹脂硬化剤と同等の反応速度を得ることができる。
これによりフェノールノボラック樹脂と併用しても、反
応速度の差による硬化後のエポキシ樹脂組成物中の未反
応の可撓性フェノール樹脂硬化剤の残留を防ぐことがで
き、成形品表面に未反応成分による白色斑点の存在、熱
時硬化度の低下等の諸問題を解決することができる。溶
融混合物の使用として、別々に製造した2種以上の溶融
混合物をエポキシ樹脂組成物の製造時に用いてもよい。This molten mixture may be used in combination with a phenol novolak resin curing agent. The phenol novolak resin curing agent to be used in combination is an ordinary resin having two or more phenolic hydroxyl groups in one molecule synthesized by a polycondensation reaction between a phenol and an aldehyde source such as formaldehyde, for example, a phenol novolak resin and a cresol novolak. Resin. By adjusting the amount of the molten mixture, the solder stress resistance can be maximized. In order to bring out the effect of resistance to soldering stress, the flexible phenolic resin curing agent represented by the formula (2) and / or (3) in the molten mixture is added in an amount of 30% by weight or more based on the total amount of the phenolic resin curing agent. And more preferably 50% by weight. If the amount is less than 30% by weight, low elasticity and insufficient adhesion to the lead frame and semiconductor chip cannot be expected to improve solder stress resistance. By using a molten mixture obtained by melt-mixing tetraphenylphosphonium / tetraphenylborate with a flexible phenolic resin curing agent whose reaction rate with an epoxy resin is slower than that of a phenol novolak resin curing agent, A reaction rate equivalent to that of the agent can be obtained.
This can prevent the unreacted flexible phenolic resin curing agent from remaining in the epoxy resin composition after curing due to the difference in reaction rate, even when used in combination with the phenol novolak resin, and the unreacted components remain on the molded product surface. Can solve various problems such as the presence of white spots and a decrease in the degree of curing when heated. As the use of the molten mixture, two or more separately prepared molten mixtures may be used at the time of producing the epoxy resin composition.
【0016】本発明で用いる無機充填材としては、溶融
シリカ粉末、球状シリカ粉末、結晶シリカ粉末、2次凝
集シリカ粉末、多孔質シリカ粉末、2次凝集シリカ粉末
または多孔質シリカ粉末を粉砕したシリカ粉末、アルミ
ナ等が挙げられ、特に溶融シリカ粉末、球状シリカ粉
末、及び溶融シリカ粉末と球状シリカ粉末との混合物が
好ましい。また無機充填材の配合量としては耐半田スト
レス性と成形性のバランスから組成物総量中に70〜9
0重量%含むものが好ましい。本発明の封止用エポキシ
樹脂組成物はエポキシ樹脂、可撓性フェノール硬化剤と
硬化促進剤との溶融混合物および無機充填材を必須成分
とするが、これ以外に必要に応じて、シランカップリン
グ剤、ブロム化エポキシ樹脂、三酸化アンチモン、ヘキ
サブロムベンゼン等の難燃剤、カーボンブラック、ベン
ガラ等の着色剤、天然ワックス、合成ワックス等の離型
剤及びシリコーンオイル、ゴム等の低応力添加剤等の種
々の添加剤を適宜配合しても差し支えがない。また、本
発明の封止用エポキシ樹脂組成物を成形材料として製造
するには、エポキシ樹脂、溶融混合物、無機充填材、そ
の他の添加剤をミキサー等によって充分に均一に混合し
た後、更に熱ロール又はニーダー等で溶融混練し、冷却
後粉砕して成形材料とすることができる。これらの成形
材料は電子部品あるいは電気部品の封止、被覆、絶縁等
に適用することができる。The inorganic filler used in the present invention includes fused silica powder, spherical silica powder, crystalline silica powder, secondary aggregated silica powder, porous silica powder, secondary aggregated silica powder or silica obtained by pulverizing porous silica powder. Powders, alumina and the like can be mentioned, and particularly preferred are fused silica powder, spherical silica powder, and a mixture of fused silica powder and spherical silica powder. The amount of the inorganic filler is preferably 70 to 9 in the total amount of the composition in consideration of the balance between solder stress resistance and moldability.
Those containing 0% by weight are preferred. The epoxy resin composition for encapsulation of the present invention comprises an epoxy resin, a molten mixture of a flexible phenol curing agent and a curing accelerator and an inorganic filler as essential components. Agents, brominated epoxy resins, antimony trioxide, hexabromobenzene, and other flame retardants, colorants such as carbon black and red iron oxide, release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber Various additives can be appropriately blended. Further, in order to produce the encapsulating epoxy resin composition of the present invention as a molding material, the epoxy resin, the molten mixture, the inorganic filler, and other additives are sufficiently uniformly mixed by a mixer or the like, and then further heated. Alternatively, it can be melt-kneaded in a kneader or the like, cooled and then pulverized to obtain a molding material. These molding materials can be applied to sealing, coating, insulating and the like of electronic parts or electric parts.
【0017】溶融混合物の製造例 溶融混合物1 式(4)で示される可撓性フェノール樹脂硬化剤(軟化
点75℃、水酸基当量175g/eq、nが1から4の
混合物であり、重量割合でn=1が20、n=2が4
0、n=3が30、n=4が10)600重量部とテト
ラフェニルホスホニウム・テトラフェニルボレート20
重量部を200℃で1時間溶融混合した(以下溶融混合
物Aとする)。Production Example of Melt Mixture Melt Mixture 1 A flexible phenol resin curing agent represented by the formula (4) (a mixture having a softening point of 75 ° C., a hydroxyl equivalent of 175 g / eq, and n of 1 to 4; 20 for n = 1, 4 for n = 2
0, n = 3 = 30, n = 4 = 10) 600 parts by weight and tetraphenylphosphonium / tetraphenylborate 20
The parts by weight were melt-mixed at 200 ° C. for 1 hour (hereinafter referred to as “melt mixture A”).
【0018】[0018]
【化7】 Embedded image
【0019】溶融混合物2 式(5)で示される可撓性フェノール樹脂硬化剤(軟化
点120℃、水酸基当量17g/eq、nが0から3の
混合物であり、重量割合でn=0が10、n=1が4
0、n=2が30、n=3が20)600重量部とテト
ラフェニルホスホニウム・テトラフェニルボレート20
重量部を200℃で1時間溶融混合した(以下溶融混合
物Bとする)。Melt mixture 2 A flexible phenol resin curing agent represented by the formula (5) (a mixture having a softening point of 120 ° C., a hydroxyl equivalent of 17 g / eq, n of 0 to 3 and a weight ratio of n = 0 to 10). , N = 1 is 4
0, n = 2 = 30, n = 3 = 20) 600 parts by weight and tetraphenylphosphonium / tetraphenylborate 20
The parts by weight were melt-mixed at 200 ° C. for 1 hour (hereinafter referred to as a melt mixture B).
【0020】[0020]
【化8】 Embedded image
【0021】溶融混合物3 フェノールノボラック樹脂硬化剤(軟化点105℃、水
酸基当量104g/eq)600重量部に、テトラフェ
ニルホスホニウム・テトラフェニルボレート20重量部
を200℃で1時間溶融混合した(以下溶融混合物Cと
する)。Melt Mixture 3 Twenty parts by weight of tetraphenylphosphonium / tetraphenylborate was melt-mixed with 600 parts by weight of a phenol novolak resin curing agent (softening point: 105 ° C., hydroxyl equivalent: 104 g / eq) at 200 ° C. for 1 hour (hereinafter referred to as melting). Mixture C).
【0022】[0022]
【実施例】以下本発明を実施例で具体的に説明する。 実施例1 下記組成物 3,3′,5,5′−テトラメチルビフェノールジグリシジルエーテル(融点 107℃、エポキシ当量190g/eq) 12重量部 溶融混合物A 6.2重量部 フェノールノボラック樹脂硬化剤(軟化点105℃、水酸基当量104g/e q) 2重量部 溶融シリカ粉末 78.8重量部 カーボンブラック 0.5重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕し成形材料とした。得られ
た成形材料を、タブレット化し、低圧トランスファー成
形機にて175℃、70kg/cm2、120秒の条件で半
田クラック試験用として6×6mmのチップを52pパ
ッケージに封止し、また半田耐湿性試験用として3×6
mmのチップを16pSOPパッケージに封止した。封
止したテスト用素子について下記の半田クラック試験及
び半田耐湿性試験を行った。評価結果を表1に示す。The present invention will be specifically described below with reference to examples. Example 1 The following composition 3,3 ′, 5,5′-tetramethylbiphenol diglycidyl ether (melting point 107 ° C., epoxy equivalent 190 g / eq) 12 parts by weight Melt mixture A 6.2 parts by weight Phenol novolak resin curing agent ( Softening point 105 ° C, hydroxyl equivalent 104g / eq) 2 parts by weight Fused silica powder 78.8 parts by weight Carbon black 0.5 part by weight Carnauba wax 0.5 part by weight is mixed at room temperature with a mixer, and the mixture is mixed at 70-100 ° C. The mixture was kneaded with a biaxial roll, cooled and pulverized to obtain a molding material. The obtained molding material is tableted, and a low pressure transfer molding machine is used to seal a 6 × 6 mm chip in a 52p package at 175 ° C., 70 kg / cm 2 , 120 seconds for solder cracking test. 3 x 6 for testability
mm chip was sealed in a 16pSOP package. The sealed test element was subjected to the following solder crack test and solder moisture resistance test. Table 1 shows the evaluation results.
【0023】評価試験 半田クラック試験:封止したテスト用素子を85℃、8
5%RHの環境下で48Hr及び72Hr処理し、その
後260℃の半田槽に10秒間浸漬後、顕微鏡で外部ク
ラックを観察した。 半田耐湿性試験:封止したテスト用素子を85℃、85
%RHの環境下で72Hr処理し、その後260℃の半
田槽に10秒間浸漬後、プレッシャークッカー試験(1
25℃、100%RH)を行い回路のオーブン不良を測
定した。 成形性試験:175℃、70kg/cm2でトランスファー
成形機を用いて、16pDIPを成形し、離型10秒後
にバコール硬度を測定した。得られた成形品により、バ
リ(ベント)、離型性、外観のチェックを行った。 ゲルタイム:175℃の熱板上で測定した。Evaluation test Solder crack test: A sealed test element was heated at 85 ° C. for 8 hours.
48 hours and 72 hours of treatment were performed in an environment of 5% RH, and then immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: Sealed test element at 85 ° C, 85
% RH environment, and then immersed in a solder bath at 260 ° C. for 10 seconds, and then subjected to a pressure cooker test (1
(25 ° C., 100% RH) to determine the oven failure of the circuit. Moldability test: 16 pDIP was molded using a transfer molding machine at 175 ° C. and 70 kg / cm 2 , and the Bacol hardness was measured 10 seconds after release from the mold. The obtained molded product was checked for burrs (vents), releasability, and appearance. Gel time: Measured on a hot plate at 175 ° C.
【0024】実施例2〜4 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料で試験用の封止した成形品を
得、この成形品を用いて実施例1と同様に半田クラック
試験及び半田耐湿性試験を行った。試験結果を表1に示
す。 比較例1〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。比較例1、3、4に用いる可撓性フェノー
ル樹脂硬化剤は式(4)の構造のものである(軟化点7
5℃、水酸基当量175g/eq、nが1から4の混合
物であり、重量割合でn=1が20、n=2が40、n
=3が30、n=4が10)。比較例1、3、4に用い
る可撓性フェノール樹脂硬化剤は式(5)の構造のもの
である(軟化点120℃、水酸基当量17g/eq、n
が0から3の混合物であり、重量割合でn=0が10、
n=1が40、n=2が30、n=3が20)。この成
形材料で試験用の封止した成形品を得、この成形品を用
いて実施例1と同様に半田クラック試験及び半田耐湿性
試験を行った。試験結果を表1に示す。Examples 2 to 4 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A sealed molded product for a test was obtained from this molding material, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results. Comparative Examples 1 to 5 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. The flexible phenol resin curing agent used in Comparative Examples 1, 3, and 4 has a structure represented by the formula (4) (softening point: 7).
5 ° C., a hydroxyl group equivalent of 175 g / eq, n is a mixture of 1 to 4, and n = 1 = 20, n = 2 = 40, n
= 3 = 30, n = 4 = 10). The flexible phenolic resin curing agent used in Comparative Examples 1, 3, and 4 has a structure represented by the formula (5) (softening point: 120 ° C., hydroxyl equivalent: 17 g / eq, n
Is a mixture of 0 to 3, and n = 0 is 10 by weight,
n = 1 is 40, n = 2 is 30, and n = 3 is 20). A sealed molded product for a test was obtained from this molding material, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results.
【0025】[0025]
【表1】 [Table 1]
【0026】[0026]
【発明の効果】本発明に従うと従来技術では得ることの
できなかった可撓性フェノール樹脂硬化剤及びエポキシ
樹脂よりなる組成物の成形性、硬化性の改良が達成で
き、半田付け工程における急激な温度変化による熱スト
レスを受けた時の耐クラック性に非常に優れ、更に耐湿
性が良好なことから電子、電気部品の封止用、被覆用、
絶縁用等に用いた場合、特に表面実装パッケージに搭載
された高集積大型チップICにおいて信頼性が非常に必
要とする製品について好適である。According to the present invention, the moldability and curability of a composition comprising a flexible phenolic resin curing agent and an epoxy resin, which could not be obtained by the prior art, can be improved, and a rapid increase in the soldering process can be achieved. It has excellent crack resistance when subjected to thermal stress due to temperature change, and also has good moisture resistance.
When used for insulation or the like, it is particularly suitable for a product that requires extremely high reliability in a highly integrated large chip IC mounted on a surface mount package.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI // H01L 23/29 H01L 23/30 R 23/31 (56)参考文献 特開 平6−322073(JP,A) 特開 平6−184280(JP,A) 特開 平5−343570(JP,A) 特開 平5−175369(JP,A) 特開 平4−173828(JP,A) 特開 平2−102217(JP,A) 特開 昭61−89221(JP,A) 特開 平4−363316(JP,A) 特開 昭61−4253(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 59/24 C08G 59/62 C08G 59/68 C08L 63/02 H01L 23/29 ────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 7 Identification symbol FI // H01L 23/29 H01L 23/30 R 23/31 (56) References JP-A-6-322073 (JP, A) JP JP-A-6-184280 (JP, A) JP-A-5-343570 (JP, A) JP-A-5-175369 (JP, A) JP-A-4-173828 (JP, A) JP-A-2-102217 (JP) JP-A-61-89221 (JP, A) JP-A-4-363316 (JP, A) JP-A-61-4253 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB Name) C08G 59/24 C08G 59/62 C08G 59/68 C08L 63/02 H01L 23/29
Claims (1)
を総エポキシ樹脂量中に50〜100重量%含むエポキ
シ樹脂、 【化1】 (B)式(2)及び/または式(3)で示される可撓性
フェノール樹脂硬化剤と硬化促進剤であるテトラフェニ
ルホスホニウム・テトラフェニルボレートとを予め加熱
溶融されてなる溶融混合物及び 【化2】 (式中のRはパラキシリレン、nの値は1〜5) 【化3】 (式中のRはジシクロペタジエンとフェノールを付加反
応したジシクロペタジエンジフェノール、テルペン類と
フェノールを付加反応したテルペンジフェノール、シク
ロペンタジエンとフェノールを付加反応したシクロペン
タジエンジフェノール及びシクロヘキサノンとフェノー
ルを付加縮合したシクロヘキサノンジフェノールの各々
の2個のフェノール部を除いた残基を表し、これらの中
から選択される1種、nの値は0〜4) (C)無機充填材 を必須成分とすることを特徴とする半導体封止用エポキ
シ樹脂組成物。1. An epoxy resin containing (A) an epoxy resin represented by the formula (1) in an amount of 50 to 100% by weight based on the total amount of the epoxy resin. (B) a molten mixture obtained by previously heating and melting a flexible phenolic resin curing agent represented by the formula (2) and / or formula (3) and a curing accelerator, tetraphenylphosphonium / tetraphenylborate; 2] (R in the formula is paraxylylene, and the value of n is 1 to 5) (R in the formula represents dicyclopetadiene diphenol obtained by addition reaction of dicyclopetadiene and phenol, terpene diphenol obtained by addition reaction of terpenes and phenol, cyclopentadiene diphenol obtained by addition reaction of cyclopentadiene and phenol, and cyclohexanone. A residue of the cyclohexanone diphenol obtained by addition condensation of phenol, excluding the two phenolic moieties. One of these is selected. The value of n is 0 to 4.) (C) Inorganic filler is essential An epoxy resin composition for encapsulating a semiconductor, comprising: a component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31991093A JP3274265B2 (en) | 1993-12-20 | 1993-12-20 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31991093A JP3274265B2 (en) | 1993-12-20 | 1993-12-20 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07173253A JPH07173253A (en) | 1995-07-11 |
JP3274265B2 true JP3274265B2 (en) | 2002-04-15 |
Family
ID=18115602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31991093A Expired - Lifetime JP3274265B2 (en) | 1993-12-20 | 1993-12-20 | Epoxy resin composition |
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Country | Link |
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JP (1) | JP3274265B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4054927B2 (en) * | 1998-06-25 | 2008-03-05 | 北興化学工業株式会社 | Epoxy resin composition for semiconductor encapsulation and semiconductor device |
MY123645A (en) | 1999-07-22 | 2006-05-31 | Sumitomo Bakelite Co | Composition of polyepoxide, phenolic co-condensate and phosphonium-polyphenolic molecular association product |
JP5442929B2 (en) * | 2006-11-24 | 2014-03-19 | パナソニック株式会社 | Epoxy resin composition for sealing and semiconductor device using the same |
JP2009260232A (en) * | 2008-03-26 | 2009-11-05 | Hitachi Chem Co Ltd | Film-like adhesive for sealing semiconductor, and semiconductor apparatus and method of manufacturing the same |
-
1993
- 1993-12-20 JP JP31991093A patent/JP3274265B2/en not_active Expired - Lifetime
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JPH07173253A (en) | 1995-07-11 |
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