JPH071791Y2 - 半導体ウエハ取外装置 - Google Patents
半導体ウエハ取外装置Info
- Publication number
- JPH071791Y2 JPH071791Y2 JP1988138323U JP13832388U JPH071791Y2 JP H071791 Y2 JPH071791 Y2 JP H071791Y2 JP 1988138323 U JP1988138323 U JP 1988138323U JP 13832388 U JP13832388 U JP 13832388U JP H071791 Y2 JPH071791 Y2 JP H071791Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- polishing jig
- jig
- wax
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988138323U JPH071791Y2 (ja) | 1988-10-24 | 1988-10-24 | 半導体ウエハ取外装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988138323U JPH071791Y2 (ja) | 1988-10-24 | 1988-10-24 | 半導体ウエハ取外装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0258331U JPH0258331U (enrdf_load_html_response) | 1990-04-26 |
| JPH071791Y2 true JPH071791Y2 (ja) | 1995-01-18 |
Family
ID=31400553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988138323U Expired - Lifetime JPH071791Y2 (ja) | 1988-10-24 | 1988-10-24 | 半導体ウエハ取外装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH071791Y2 (enrdf_load_html_response) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012081611A1 (ja) * | 2010-12-14 | 2012-06-21 | 住友ベークライト株式会社 | 基材の加工方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5612735A (en) * | 1979-07-10 | 1981-02-07 | Nec Corp | Peeling of monocrystalline wafer |
| JPS56161340U (enrdf_load_html_response) * | 1980-04-28 | 1981-12-01 |
-
1988
- 1988-10-24 JP JP1988138323U patent/JPH071791Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0258331U (enrdf_load_html_response) | 1990-04-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7355618B2 (ja) | ウエーハ分割装置 | |
| JP4133333B2 (ja) | 被処理体の処理方法及びその処理装置 | |
| JPH0745556A (ja) | ダイシング装置 | |
| KR940006209A (ko) | 표면 처리방법 및 장치 | |
| JP2009027187A (ja) | カセットから炉へのウエーハ移送用のシステム及び方法 | |
| JP4342745B2 (ja) | 基板処理方法および半導体装置の製造方法 | |
| JPH11214478A (ja) | 予備真空室およびそれを用いた真空処理装置 | |
| US20050120956A1 (en) | Plasma processing apparatus | |
| JP4623715B2 (ja) | 基板搬送機構及び該基板搬送機構を備える基板搬送装置 | |
| JPH071791Y2 (ja) | 半導体ウエハ取外装置 | |
| JP4804654B2 (ja) | 容器内面成膜用cvd装置及び容器内面成膜方法 | |
| JPH0748004A (ja) | 基板保持容器およびこの容器を用いる基板処理装置 | |
| JPS6228359A (ja) | 真空コンテナ | |
| JPS6379313A (ja) | 熱処理装置 | |
| JPH098025A (ja) | 基板へのシリカ系被膜形成方法及び装置 | |
| JP2533706B2 (ja) | 基板搬送方法、及びその装置 | |
| JPH0566286B2 (enrdf_load_html_response) | ||
| JP2001068394A (ja) | レジスト除去方法および装置 | |
| JPH0513354A (ja) | 半導体ウエハの熱処理方法 | |
| JPH0258223A (ja) | 半導体装置の製造装置 | |
| JP4331422B2 (ja) | 被加工体の貼り付け方法及び被加工体の貼り付け装置 | |
| JPS6195512A (ja) | Cvd装置 | |
| JP2023183035A (ja) | ウエーハの取り扱い方法 | |
| JP3886734B2 (ja) | 搬送装置 | |
| JPH0627650Y2 (ja) | 基板の搬出入処理装置 |