JPH0717377Y2 - 真空装置 - Google Patents

真空装置

Info

Publication number
JPH0717377Y2
JPH0717377Y2 JP1986139375U JP13937586U JPH0717377Y2 JP H0717377 Y2 JPH0717377 Y2 JP H0717377Y2 JP 1986139375 U JP1986139375 U JP 1986139375U JP 13937586 U JP13937586 U JP 13937586U JP H0717377 Y2 JPH0717377 Y2 JP H0717377Y2
Authority
JP
Japan
Prior art keywords
vacuum
ventilation
present
vacuum container
dust particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986139375U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346834U (enExample
Inventor
務 斎藤
文雄 成瀬
Original Assignee
日本真空技術株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本真空技術株式会社 filed Critical 日本真空技術株式会社
Priority to JP1986139375U priority Critical patent/JPH0717377Y2/ja
Publication of JPS6346834U publication Critical patent/JPS6346834U/ja
Application granted granted Critical
Publication of JPH0717377Y2 publication Critical patent/JPH0717377Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
  • Physical Vapour Deposition (AREA)
JP1986139375U 1986-09-12 1986-09-12 真空装置 Expired - Lifetime JPH0717377Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986139375U JPH0717377Y2 (ja) 1986-09-12 1986-09-12 真空装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986139375U JPH0717377Y2 (ja) 1986-09-12 1986-09-12 真空装置

Publications (2)

Publication Number Publication Date
JPS6346834U JPS6346834U (enExample) 1988-03-30
JPH0717377Y2 true JPH0717377Y2 (ja) 1995-04-26

Family

ID=31045222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986139375U Expired - Lifetime JPH0717377Y2 (ja) 1986-09-12 1986-09-12 真空装置

Country Status (1)

Country Link
JP (1) JPH0717377Y2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2566308B2 (ja) * 1989-01-12 1996-12-25 東京エレクトロン株式会社 ロードロック装置を備えた処理装置
CN112718727A (zh) * 2021-01-27 2021-04-30 河北君业科技股份有限公司 一种保温管滚动传送隔档装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62132535A (ja) * 1985-12-05 1987-06-15 Toyota Motor Corp 真空圧力容器
JPH0517144U (ja) * 1991-08-07 1993-03-05 株式会社アツギユニシア 内燃機関用ピストン

Also Published As

Publication number Publication date
JPS6346834U (enExample) 1988-03-30

Similar Documents

Publication Publication Date Title
JPH0717377Y2 (ja) 真空装置
JPH11347937A (ja) 研磨加工室の換気構造
US6616526B2 (en) Clean room and method for fabricating semiconductor device
JPS60144544A (ja) 清浄空間形成方法
JPH0820091B2 (ja) 清浄室装置
JPS647250Y2 (enExample)
JPS6380148A (ja) 排気装置用二重構造フ−ド
KR102851960B1 (ko) 기판 처리 장치 및 기판 처리 방법
JPH0117314Y2 (enExample)
JP2524697Y2 (ja) 回転式基板処理装置の排気連通装置
JPS6034279Y2 (ja) 無塵室装置
CN213110325U (zh) 一种硅片加工用除异味装置
US6505417B2 (en) Method for controlling airflow on a backside of a semiconductor wafer during spin processing
JPH01281350A (ja) クリーンルーム
JP2654204B2 (ja) 精密洗浄装置およびその換気方法
JP2001276714A (ja) スピン処理装置
JPS63227023A (ja) 半導体ウエハ−乾燥装置
JPS61213541A (ja) クリ−ンベンチ
JPS6253942B2 (enExample)
JPH02157549A (ja) 人工竜巻式フード及びそれを利用した排気方法
JPS59120270A (ja) スピン塗布装置
JPH0438516Y2 (enExample)
JPH0342687Y2 (enExample)
JPS62152434U (enExample)
JPS6018179Y2 (ja) 圧力調理器