JPH069016Y2 - 透明電極の製造装置 - Google Patents
透明電極の製造装置Info
- Publication number
- JPH069016Y2 JPH069016Y2 JP1987164223U JP16422387U JPH069016Y2 JP H069016 Y2 JPH069016 Y2 JP H069016Y2 JP 1987164223 U JP1987164223 U JP 1987164223U JP 16422387 U JP16422387 U JP 16422387U JP H069016 Y2 JPH069016 Y2 JP H069016Y2
- Authority
- JP
- Japan
- Prior art keywords
- transparent electrode
- gas
- target
- sputtering
- electrode manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 238000005477 sputtering target Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 16
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 238000001444 catalytic combustion detection Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987164223U JPH069016Y2 (ja) | 1987-10-26 | 1987-10-26 | 透明電極の製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987164223U JPH069016Y2 (ja) | 1987-10-26 | 1987-10-26 | 透明電極の製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0170864U JPH0170864U (enrdf_load_stackoverflow) | 1989-05-11 |
| JPH069016Y2 true JPH069016Y2 (ja) | 1994-03-09 |
Family
ID=31449646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987164223U Expired - Lifetime JPH069016Y2 (ja) | 1987-10-26 | 1987-10-26 | 透明電極の製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069016Y2 (enrdf_load_stackoverflow) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6082660A (ja) * | 1983-10-08 | 1985-05-10 | Konishiroku Photo Ind Co Ltd | 酸化物層の形成装置 |
| JPS60130008A (ja) * | 1983-12-15 | 1985-07-11 | ダイセル化学工業株式会社 | 透明導電性膜の形成方法 |
-
1987
- 1987-10-26 JP JP1987164223U patent/JPH069016Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0170864U (enrdf_load_stackoverflow) | 1989-05-11 |
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