JPH0375967B2 - - Google Patents

Info

Publication number
JPH0375967B2
JPH0375967B2 JP56193289A JP19328981A JPH0375967B2 JP H0375967 B2 JPH0375967 B2 JP H0375967B2 JP 56193289 A JP56193289 A JP 56193289A JP 19328981 A JP19328981 A JP 19328981A JP H0375967 B2 JPH0375967 B2 JP H0375967B2
Authority
JP
Japan
Prior art keywords
transparent electrode
gas
flow rate
sputtering
gas flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56193289A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5894703A (ja
Inventor
Takao Chikamura
Kosaku Yano
Yutaka Myata
Yoshio Oota
Shinji Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP19328981A priority Critical patent/JPS5894703A/ja
Publication of JPS5894703A publication Critical patent/JPS5894703A/ja
Publication of JPH0375967B2 publication Critical patent/JPH0375967B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP19328981A 1981-11-30 1981-11-30 透明電極の製造方法およびその製造装置 Granted JPS5894703A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19328981A JPS5894703A (ja) 1981-11-30 1981-11-30 透明電極の製造方法およびその製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19328981A JPS5894703A (ja) 1981-11-30 1981-11-30 透明電極の製造方法およびその製造装置

Publications (2)

Publication Number Publication Date
JPS5894703A JPS5894703A (ja) 1983-06-06
JPH0375967B2 true JPH0375967B2 (enrdf_load_stackoverflow) 1991-12-04

Family

ID=16305435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19328981A Granted JPS5894703A (ja) 1981-11-30 1981-11-30 透明電極の製造方法およびその製造装置

Country Status (1)

Country Link
JP (1) JPS5894703A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0751746B2 (ja) * 1988-08-05 1995-06-05 松下電器産業株式会社 酸化物薄膜製造法
US20140083841A1 (en) * 2011-05-13 2014-03-27 Sharp Kabushiki Kaisha Thin film-forming method
JP6775972B2 (ja) 2016-03-17 2020-10-28 芝浦メカトロニクス株式会社 成膜装置及び成膜方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51116999A (en) * 1975-04-08 1976-10-14 Toppan Printing Co Ltd Process for manufacturing transparent conductive plastic
JPS53118417A (en) * 1977-03-25 1978-10-16 Asahi Glass Co Ltd Production of glass with transparent* electrically conductive coat of sno2
JPS56130009A (en) * 1980-03-17 1981-10-12 Sharp Kk Method of producing transparent conductive film

Also Published As

Publication number Publication date
JPS5894703A (ja) 1983-06-06

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