JPS5894703A - 透明電極の製造方法およびその製造装置 - Google Patents
透明電極の製造方法およびその製造装置Info
- Publication number
- JPS5894703A JPS5894703A JP19328981A JP19328981A JPS5894703A JP S5894703 A JPS5894703 A JP S5894703A JP 19328981 A JP19328981 A JP 19328981A JP 19328981 A JP19328981 A JP 19328981A JP S5894703 A JPS5894703 A JP S5894703A
- Authority
- JP
- Japan
- Prior art keywords
- transparent electrode
- gas
- sputtering
- flow rate
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 21
- 238000004544 sputter deposition Methods 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 17
- 230000008021 deposition Effects 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 238000007740 vapor deposition Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- 239000007789 gas Substances 0.000 description 25
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 7
- 229910001882 dioxygen Inorganic materials 0.000 description 7
- 239000011261 inert gas Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19328981A JPS5894703A (ja) | 1981-11-30 | 1981-11-30 | 透明電極の製造方法およびその製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19328981A JPS5894703A (ja) | 1981-11-30 | 1981-11-30 | 透明電極の製造方法およびその製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5894703A true JPS5894703A (ja) | 1983-06-06 |
| JPH0375967B2 JPH0375967B2 (enrdf_load_stackoverflow) | 1991-12-04 |
Family
ID=16305435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19328981A Granted JPS5894703A (ja) | 1981-11-30 | 1981-11-30 | 透明電極の製造方法およびその製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5894703A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0247255A (ja) * | 1988-08-05 | 1990-02-16 | Matsushita Electric Ind Co Ltd | 酸化物薄膜製造法 |
| WO2012157202A1 (ja) * | 2011-05-13 | 2012-11-22 | シャープ株式会社 | 薄膜形成方法 |
| KR20170108819A (ko) | 2016-03-17 | 2017-09-27 | 시바우라 메카트로닉스 가부시끼가이샤 | 성막 장치 및 성막 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116999A (en) * | 1975-04-08 | 1976-10-14 | Toppan Printing Co Ltd | Process for manufacturing transparent conductive plastic |
| JPS53118417A (en) * | 1977-03-25 | 1978-10-16 | Asahi Glass Co Ltd | Production of glass with transparent* electrically conductive coat of sno2 |
| JPS56130009A (en) * | 1980-03-17 | 1981-10-12 | Sharp Kk | Method of producing transparent conductive film |
-
1981
- 1981-11-30 JP JP19328981A patent/JPS5894703A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116999A (en) * | 1975-04-08 | 1976-10-14 | Toppan Printing Co Ltd | Process for manufacturing transparent conductive plastic |
| JPS53118417A (en) * | 1977-03-25 | 1978-10-16 | Asahi Glass Co Ltd | Production of glass with transparent* electrically conductive coat of sno2 |
| JPS56130009A (en) * | 1980-03-17 | 1981-10-12 | Sharp Kk | Method of producing transparent conductive film |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0247255A (ja) * | 1988-08-05 | 1990-02-16 | Matsushita Electric Ind Co Ltd | 酸化物薄膜製造法 |
| WO2012157202A1 (ja) * | 2011-05-13 | 2012-11-22 | シャープ株式会社 | 薄膜形成方法 |
| KR20170108819A (ko) | 2016-03-17 | 2017-09-27 | 시바우라 메카트로닉스 가부시끼가이샤 | 성막 장치 및 성막 방법 |
| US10260145B2 (en) | 2016-03-17 | 2019-04-16 | Shibaura Mechatronics Corporation | Film formation apparatus and film formation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0375967B2 (enrdf_load_stackoverflow) | 1991-12-04 |
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