JPH0665756B2 - 部分メツキプラスチツク成形品及びその製法 - Google Patents

部分メツキプラスチツク成形品及びその製法

Info

Publication number
JPH0665756B2
JPH0665756B2 JP61146076A JP14607686A JPH0665756B2 JP H0665756 B2 JPH0665756 B2 JP H0665756B2 JP 61146076 A JP61146076 A JP 61146076A JP 14607686 A JP14607686 A JP 14607686A JP H0665756 B2 JPH0665756 B2 JP H0665756B2
Authority
JP
Japan
Prior art keywords
plating
compatible
incompatible
molded product
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61146076A
Other languages
English (en)
Other versions
JPS634092A (ja
Inventor
哲男 湯本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sankyo Kasei Co Ltd
Original Assignee
Sankyo Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sankyo Kasei Co Ltd filed Critical Sankyo Kasei Co Ltd
Priority to JP61146076A priority Critical patent/JPH0665756B2/ja
Priority to EP88300082A priority patent/EP0323685B1/en
Priority to DE8888300082T priority patent/DE3872505T2/de
Publication of JPS634092A publication Critical patent/JPS634092A/ja
Publication of JPH0665756B2 publication Critical patent/JPH0665756B2/ja
Priority to HK104396A priority patent/HK104396A/xx
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C23C18/1605—Process or apparatus coating on selected surface areas by masking
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1635—Composition of the substrate
    • C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
    • C23C18/1641—Organic substrates, e.g. resin, plastic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073—Multistep pretreatment
    • C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/285—Sensitising or activating with tin based compound or composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0014—Shaping of the substrate, e.g. by moulding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 （産業上の利用分野） 本発明は、部分的にメッキを施したプラスチック成形品
及びその製法に関する。
（従来の技術） 従来よりプラスチック成形品に部分的にメッキを施すこ
とによって製品、例えばプリント基板を生産する例が知
られている（例えば特開昭58−120640号公報）。この例
によるプラスチック成形品の部分メッキ法とは、成形品
である基板の表面に、所望の回路パターンに対応する形
状に無電解メッキが付く性質を備えたアンダーコート被
膜をマスク印刷等の方法で部分的に形成し、被膜乾燥
後、成形品を周知の無電解メッキ装置に通し、アンダー
コート被膜上にのみ金属膜が付着するようにしたもので
ある。
（考案が解決しようとする問題点） しかしながら、プラスチック成形品の形状が比較的単純
であり、大きさがあまり小さくないものでは、マスクを
利用する部分メッキ方法も特別な不都合は生じないが、
成形品の形状が例えば凹凸が多いもの、複雑なもの、球
体のように立体的なもの、そしてメッキ部分のパターン
が複雑できわめて精密なものである場合には、上記の方
法は採用できず、仮に採用できたとしても精度が出ず、
作業に大変な手間と時間がかかる。
本発明の目的は、成形品の形状やメッキすべき部分のパ
ターンが複雑であっても、作業能率良く形成できるよう
にすることにある。
（問題点を解決するための手段） 本発明のプラスチック成形品は、メッキ適合材で構成し
たメッキ適合部2,12とメッキ不適合材で構成したメッキ
不適合部3,13とを備え、いずれか一方の複数部分が他方
の表面からそれぞれ露出した露出部21,21a,121,123とな
っており、メッキ適合部の表面にメッキによる金属被膜
4,14を形成したものである。
本発明のプラスチックの成形品のメッキ方法は、メッキ
適合材で構成したメッキ適合部とメッキ不適合材で構成
したメッキ不適合部とを一体成形し、いずれか一方の複
数部分が他方の表面からそれぞれ露出部となるように
し、その後メッキ適合部の表面にメッキを施こしたもの
である。
（実施例） 以下本発明の実施例を説明する。
まず、部分メッキプラスチック成形品の第１実施例とし
て、回路基板を例にとって第１〜６図を参照して説明す
る。
第１〜３図に示すように、回路基板１の本体は、絶縁性
メッキ適合部材で構成したメッキ適合部２と絶縁性メッ
キ不適合部材で構成したメッキ不適合部３との二重構造
である。絶縁性メッキ適合部材として、例えば触媒入り
のポリエーテルスルホンがあり、この触媒は、粉末ケイ
酸アルミニウム粘度上に分散されたパラジュウム触媒
で、この触媒を含む絶縁材料の接着促進は、無電解金属
メッキのために材料を活性化する。また、絶縁性メッキ
不適合部材としては、結晶性熱可塑性樹脂のポリフエニ
レンサルフアイド樹脂、ポリエステル、ポリブチレンテ
レフタレート、ポリエチレンテレフタレートや熱硬化性
樹脂がある。
メッキ適合部２は、第４〜６図に示すように板状に成形
し、中間部を中心として左側の上面に、また右側の下面
にそれぞれ回路パターンに対応した形状の線状の露出部
21,…、21a,…が所定の高さに突出してある。露出部21,
21aとは、メッキ適合部２がメッキ不適合部３により被
覆された状態で、このメッキ不適合部の表面から露出し
ているメッキ適合部２の表面である。
両面の露出部21,21aの対向端部には、メッキ適合部２を
厚み方向に貫通する小孔22があけてある。
露出部21,21aの表面には、メッキにより所定厚に形成さ
れた金属被膜４（第2,3図）が付着している。
次に回路基板１の製法について説明する。
まず、前記した絶縁性メッキ適合プラスチック材を、射
出成形金型に注入することにより、第４図に示すような
一次成形品としての板状のメッキ適合部２を成形する。
ついで、別の金型のキャビティ内に一次成形品のメッキ
適合部２をインサートしてから、絶縁性メッキ不適合プ
ラスチック材を注入して、二次成形品としての回路基板
を型成形する。成形された回路基板１の表面には、メッ
キ適合部２の露出部21,21aが露出している。その後、二
次成形品をメッキすると、第2,3図に示すようにメッキ
適合部２の露出部21,21aの表面（小孔22の内周面も含
む）だけがメッキされて、所定厚の金属被膜４が形成さ
れて、第１図に示す回路基板１が形成される。
製法としては上例の他に、例えば２色成形法を用いても
よい。この例においては、上記したように第一次工程と
しての板状のメッキ適合部２を成形する必要はなくな
り、一工程が省略できる。
第２の実施例として、コネクタを例にとって、第７〜12
図を参照して説明する。
第７〜10図に示すようにコネクタ11の本体は、絶縁性の
メッキ適合部12及びメッキ不適合部13の二重構造である
ことは、上例と実質的に同一である。
メッキ適合部12は、第11,12図に示すように複数のピン1
21と各ピンを連結する連結部122とからなり、この両者
の連結部分を補強部123で補強している。
メッキ不適合部13は、第８〜10図に示すように連結部12
2を覆っており、ピン121と補強部123の上下両面とが外
表面に露出した露出部となっている。なお、メッキ不適
合部13の上下両面と補強部123のそれとは同一平面を形
成している。
131は、メッキ不適合部の上下両面に突設してあるリブ
である。
露出しているピン121及び補強部123の表面には、金属被
膜14（第8,9図）が形成してある。コネクタ11の製法
は、上例と実質的に同一であり、第11図に示す一次成形
品としてのメッキ適合部12を成形してから、メッキ不適
合部13で覆い、メッキしてもよく、また適合部と不適合
部とを２色成形法で成形してから、本体をメッキしても
よい。
成形品の種類によって、メッキ適合材及びメッキ不適合
材に絶縁性をもたせなくてもよく、また上記各例と反対
に不適合部の複数部分を適合部から露出させたものであ
ってもよい。
（発明の効果） 本発明によれば、プラスチック成形品の形状やメッキす
べき部分のパターンが複雑であっても、従来例に比較し
て、作業性が良く、製品化できる。また成形法として、
１次成形品を成形するものを採用した場合には、メッキ
適合部又はメッキ不適合部のいずれか一方の露出複数部
分が連結されているので、金型内に露出部を備えたメッ
キ適合部又はメッキ不適合部をインサートするだけでよ
く、メッキすべき複数の露出部を１つ１つセットする必
要がないから、作業効率がよい。
【図面の簡単な説明】
第１図〜第６図は本発明を回路基板に実施した例を示
し、第１図は正面図、第２図は第１図II−II線拡大断面
図、第３図は第１図III−III線拡大断面図、第４図は板
状のメッキ適合部の正面図、第５図は第４図Ｖ−Ｖ線拡
大断面図、第６図は第５図VI−VI線拡大断面図、 第７図〜第12図はコネクタに実施した例を示し、第７図
は正面図、第８図は第７図VIII−VIII線断面図、第９図
は第７図IX−IX線拡大断面図、第10図は第７図Ｘ−Ｘ線
拡大断面図、第11図はメッキ適合部の平面図、第12図は
第11図XII−XII線断面図である。 1,11……プラスチック成形品、 2,12……メッキ適合部、 3,13……メッキ不適合部、 21,21a,121,123……露出部、 4,14……金属被膜。

Claims (2)

    【特許請求の範囲】
  1. 【請求項１】メッキ適合材で構成したメッキ適合部とメ
    ッキ不適合材で構成したメッキ不適合部とを備え、いず
    れか一方の複数部分が他方の表面からそれぞれ露出した
    露出部となっており、上記メッキ適合部の表面にメッキ
    が施こしてあることを特徴とする部分メッキプラスチッ
    ク成形品。
  2. 【請求項２】メッキ適合材で構成したメッキ適合部とメ
    ッキ不適合材で構成したメッキ不適合部とを一体成形
    し、いずれか一方の複数部分が他方の表面からそれぞれ
    露出部となるようにし、その後メッキして、上記メッキ
    適合部の表面のみに金属被膜を施こしたことを特徴とす
    る部分メッキプラスチック成形品の製法。
JP61146076A 1986-06-24 1986-06-24 部分メツキプラスチツク成形品及びその製法 Expired - Fee Related JPH0665756B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61146076A JPH0665756B2 (ja) 1986-06-24 1986-06-24 部分メツキプラスチツク成形品及びその製法
EP88300082A EP0323685B1 (en) 1986-06-24 1988-01-07 Process for the production of molded articles having partial metal plating
DE8888300082T DE3872505T2 (de) 1986-06-24 1988-01-07 Verfahren zur herstellung von partiell metallisierten gegossenen gegenstaenden.
HK104396A HK104396A (en) 1986-06-24 1996-06-13 Process for the production of molded articles having partial metal plating

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61146076A JPH0665756B2 (ja) 1986-06-24 1986-06-24 部分メツキプラスチツク成形品及びその製法
EP88300082A EP0323685B1 (en) 1986-06-24 1988-01-07 Process for the production of molded articles having partial metal plating

Publications (2)

Publication Number Publication Date
JPS634092A JPS634092A (ja) 1988-01-09
JPH0665756B2 true JPH0665756B2 (ja) 1994-08-24

Family

ID=39677692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61146076A Expired - Fee Related JPH0665756B2 (ja) 1986-06-24 1986-06-24 部分メツキプラスチツク成形品及びその製法

Country Status (4)

Country Link
EP (1) EP0323685B1 (ja)
JP (1) JPH0665756B2 (ja)
DE (1) DE3872505T2 (ja)
HK (1) HK104396A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4427983A1 (de) * 1994-08-08 1996-02-15 Hoechst Ag Thermoplastisches Material
DE19736093A1 (de) * 1997-08-20 1999-02-25 Bayer Ag Herstellung dreidimensionaler Leiterplatten
DE102006030248A1 (de) 2006-06-30 2008-01-03 Epcos Ag Gehäuse zur Aufnahme eines elektronische Bauelements und elektronische Bauelementtaranordnung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1254308A (en) * 1968-12-19 1971-11-17 Bakelite Xylonite Ltd Selective plating of plastics mouldings
EP0132485A1 (en) * 1983-07-21 1985-02-13 Celluloid I Gislaved Ab A method of producing chromium-plated plastics materials or plastics details, and an apparatus for carrying the method into effect
GB2171355B (en) * 1985-02-22 1989-11-22 Kollmorgen Tech Corp Molded articles suitable for adherent metallization, molded metallized articles and processes for making the same
IN167760B (ja) * 1986-08-15 1990-12-15 Kollmorgen Tech Corp

Also Published As

Publication number Publication date
HK104396A (en) 1996-06-21
DE3872505T2 (de) 1992-12-24
DE3872505D1 (de) 1992-08-06
JPS634092A (ja) 1988-01-09
EP0323685A1 (en) 1989-07-12
EP0323685B1 (en) 1992-07-01

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