JPH065416Y2 - プラズマｃｖｄ窒化膜成長装置 - Google Patents

プラズマｃｖｄ窒化膜成長装置

Info

Publication number
JPH065416Y2
JPH065416Y2 JP10094788U JP10094788U JPH065416Y2 JP H065416 Y2 JPH065416 Y2 JP H065416Y2 JP 10094788 U JP10094788 U JP 10094788U JP 10094788 U JP10094788 U JP 10094788U JP H065416 Y2 JPH065416 Y2 JP H065416Y2
Authority
JP
Japan
Prior art keywords
nitride film
plasma cvd
growth apparatus
film growth
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10094788U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0222365U (enrdf_load_stackoverflow
Inventor
秀明 早野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP10094788U priority Critical patent/JPH065416Y2/ja
Publication of JPH0222365U publication Critical patent/JPH0222365U/ja
Application granted granted Critical
Publication of JPH065416Y2 publication Critical patent/JPH065416Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Separation Of Gases By Adsorption (AREA)
JP10094788U 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置 Expired - Lifetime JPH065416Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10094788U JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10094788U JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Publications (2)

Publication Number Publication Date
JPH0222365U JPH0222365U (enrdf_load_stackoverflow) 1990-02-14
JPH065416Y2 true JPH065416Y2 (ja) 1994-02-09

Family

ID=31329490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10094788U Expired - Lifetime JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Country Status (1)

Country Link
JP (1) JPH065416Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571176B2 (ja) * 1992-06-09 1997-01-16 株式会社荏原製作所 Ｃｖｄ法排ガスの除害方法

Also Published As

Publication number Publication date
JPH0222365U (enrdf_load_stackoverflow) 1990-02-14

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