CN101542019A - 排气系统 - Google Patents
排气系统 Download PDFInfo
- Publication number
- CN101542019A CN101542019A CNA2007800149508A CN200780014950A CN101542019A CN 101542019 A CN101542019 A CN 101542019A CN A2007800149508 A CNA2007800149508 A CN A2007800149508A CN 200780014950 A CN200780014950 A CN 200780014950A CN 101542019 A CN101542019 A CN 101542019A
- Authority
- CN
- China
- Prior art keywords
- lamina affixad
- exhaust
- pair
- pipe
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007110264A JP5128168B2 (ja) | 2006-04-24 | 2007-04-19 | 排気装置 |
JP110264/2007 | 2007-04-19 | ||
PCT/US2007/010112 WO2007127294A2 (en) | 2006-04-24 | 2007-04-25 | Exhaust system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101542019A true CN101542019A (zh) | 2009-09-23 |
CN101542019B CN101542019B (zh) | 2011-01-12 |
Family
ID=40686879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800149508A Expired - Fee Related CN101542019B (zh) | 2007-04-19 | 2007-04-25 | 排气系统 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101048255B1 (zh) |
CN (1) | CN101542019B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100958112B1 (ko) * | 2009-09-15 | 2010-05-18 | 박영수 | 배기라인용 히팅 파이프 및 반도체 공정의 배기라인 구조 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9211663D0 (en) * | 1992-06-02 | 1992-07-15 | Merpro Azgaz Ltd | Liquid/gas seperator |
US5578132A (en) * | 1993-07-07 | 1996-11-26 | Tokyo Electron Kabushiki Kaisha | Apparatus for heat treating semiconductors at normal pressure and low pressure |
JP3246708B2 (ja) * | 1995-05-02 | 2002-01-15 | 東京エレクトロン株式会社 | トラップ装置及びこれを用いた未反応処理ガス排気機構 |
WO1998029178A1 (en) * | 1996-12-31 | 1998-07-09 | Atmi Ecosys Corporation | Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
US6085830A (en) * | 1997-03-24 | 2000-07-11 | Fujikura Ltd. | Heat sink, and process and apparatus for manufacturing the same |
-
2007
- 2007-04-25 CN CN2007800149508A patent/CN101542019B/zh not_active Expired - Fee Related
- 2007-04-25 KR KR1020087025497A patent/KR101048255B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20090018779A (ko) | 2009-02-23 |
KR101048255B1 (ko) | 2011-07-08 |
CN101542019B (zh) | 2011-01-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20110223 Address after: Tokyo, Japan, Japan Co-patentee after: Spansion Co., Ltd. Patentee after: Mitsubishi Cable Industries, Ltd. Address before: Tokyo, Japan, Japan Co-patentee before: Osaka Rasenkan Kogyo Co., Ltd. Patentee before: Mitsubishi Cable Industries, Ltd. Co-patentee before: Spansion Co., Ltd. Co-patentee before: Nippon Spansion Co., Ltd. |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110112 Termination date: 20140425 |