JPH0623569Y2 - プラズマ発生反応装置 - Google Patents

プラズマ発生反応装置

Info

Publication number
JPH0623569Y2
JPH0623569Y2 JP1988027979U JP2797988U JPH0623569Y2 JP H0623569 Y2 JPH0623569 Y2 JP H0623569Y2 JP 1988027979 U JP1988027979 U JP 1988027979U JP 2797988 U JP2797988 U JP 2797988U JP H0623569 Y2 JPH0623569 Y2 JP H0623569Y2
Authority
JP
Japan
Prior art keywords
microwave
plasma generation
power
distribution circuit
applicator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988027979U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01132236U (enrdf_load_stackoverflow
Inventor
眞治 只野
順二 木下
盛男 坂井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP1988027979U priority Critical patent/JPH0623569Y2/ja
Publication of JPH01132236U publication Critical patent/JPH01132236U/ja
Application granted granted Critical
Publication of JPH0623569Y2 publication Critical patent/JPH0623569Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1988027979U 1988-03-02 1988-03-02 プラズマ発生反応装置 Expired - Lifetime JPH0623569Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988027979U JPH0623569Y2 (ja) 1988-03-02 1988-03-02 プラズマ発生反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988027979U JPH0623569Y2 (ja) 1988-03-02 1988-03-02 プラズマ発生反応装置

Publications (2)

Publication Number Publication Date
JPH01132236U JPH01132236U (enrdf_load_stackoverflow) 1989-09-07
JPH0623569Y2 true JPH0623569Y2 (ja) 1994-06-22

Family

ID=31250949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988027979U Expired - Lifetime JPH0623569Y2 (ja) 1988-03-02 1988-03-02 プラズマ発生反応装置

Country Status (1)

Country Link
JP (1) JPH0623569Y2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2798552B1 (fr) * 1999-09-13 2001-11-30 Centre Nat Rech Scient Dispositif assurant une division de puissance micro-onde predeterminee sur une pluralite de charges, notamment pour la production de plasma
JP2005310478A (ja) * 2004-04-20 2005-11-04 Naohisa Goto プラズマ処理装置および処理方法、並びに、フラットパネルディスプレイの製造方法
JP2006040609A (ja) * 2004-07-23 2006-02-09 Naohisa Goto プラズマ処理装置および方法、並びにフラットパネルディスプレイ装置の製造方法
JP2011249106A (ja) * 2010-05-26 2011-12-08 Hitachi Ltd マイクロ波加熱装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3147986C2 (de) * 1981-12-04 1992-02-27 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zur Erzeugung eines Mikrowellenplasmas für die Behandlung von Substraten, insbesondere zur Plasmapolymerisation von Monomeren
JPS59189130A (ja) * 1983-04-13 1984-10-26 Toyota Motor Corp プラズマ処理方法
JPS637376A (ja) * 1986-06-25 1988-01-13 Shimadzu Corp Ｅｃｒ−ｃｖｄ装置

Also Published As

Publication number Publication date
JPH01132236U (enrdf_load_stackoverflow) 1989-09-07

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