JPH06202328A - 放射線重合性混合物及びはんだマスクの製造方法 - Google Patents

放射線重合性混合物及びはんだマスクの製造方法

Info

Publication number
JPH06202328A
JPH06202328A JP25344293A JP25344293A JPH06202328A JP H06202328 A JPH06202328 A JP H06202328A JP 25344293 A JP25344293 A JP 25344293A JP 25344293 A JP25344293 A JP 25344293A JP H06202328 A JPH06202328 A JP H06202328A
Authority
JP
Japan
Prior art keywords
epoxy
radiation
compd
compound
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25344293A
Other languages
English (en)
Japanese (ja)
Inventor
Gerald Dr Schuetze
シューツェ ゲラルト
Juergen Lingnau
リングナウ ユルゲン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ATK Launch Systems LLC
Original Assignee
Morton Thiokol Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Thiokol Inc filed Critical Morton Thiokol Inc
Publication of JPH06202328A publication Critical patent/JPH06202328A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
JP25344293A 1992-10-09 1993-10-08 放射線重合性混合物及びはんだマスクの製造方法 Pending JPH06202328A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19924234072 DE4234072A1 (de) 1992-10-09 1992-10-09 Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstoppmaske
DE4234072:1 1992-10-09

Publications (1)

Publication Number Publication Date
JPH06202328A true JPH06202328A (ja) 1994-07-22

Family

ID=6470080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25344293A Pending JPH06202328A (ja) 1992-10-09 1993-10-08 放射線重合性混合物及びはんだマスクの製造方法

Country Status (4)

Country Link
EP (1) EP0591759A2 (OSRAM)
JP (1) JPH06202328A (OSRAM)
CA (1) CA2108048A1 (OSRAM)
DE (1) DE4234072A1 (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09120161A (ja) * 1995-08-01 1997-05-06 Morton Thiokol Inc 光像形成組成物
JPH10198027A (ja) * 1997-01-14 1998-07-31 Asahi Chem Ind Co Ltd 光重合性樹脂及びその用途

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4316087A1 (de) * 1993-05-13 1994-11-17 Morton Int Inc Verfahren zum bildmäßigen Metallisieren von strukturierten Leiterplatten
DE9420640U1 (de) * 1994-12-23 1995-03-23 Lord Corp., Cary, N.C. Strahlungsaushärtbare Zusammensetzungen mit einem Gehalt an hydroxy-terminierten Polyurethanen und einer Epoxy-Verbindung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426431A (en) * 1982-09-22 1984-01-17 Eastman Kodak Company Radiation-curable compositions for restorative and/or protective treatment of photographic elements
EP0345340B1 (en) * 1987-12-07 1995-03-08 Morton International, Inc. Photoimageable compositions
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09120161A (ja) * 1995-08-01 1997-05-06 Morton Thiokol Inc 光像形成組成物
JPH10198027A (ja) * 1997-01-14 1998-07-31 Asahi Chem Ind Co Ltd 光重合性樹脂及びその用途

Also Published As

Publication number Publication date
EP0591759A3 (OSRAM) 1994-04-20
CA2108048A1 (en) 1994-04-10
DE4234072A1 (de) 1994-04-14
EP0591759A2 (de) 1994-04-13

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