JPH0613264Y2 - 気相エピタキシアル成長装置 - Google Patents

気相エピタキシアル成長装置

Info

Publication number
JPH0613264Y2
JPH0613264Y2 JP567688U JP567688U JPH0613264Y2 JP H0613264 Y2 JPH0613264 Y2 JP H0613264Y2 JP 567688 U JP567688 U JP 567688U JP 567688 U JP567688 U JP 567688U JP H0613264 Y2 JPH0613264 Y2 JP H0613264Y2
Authority
JP
Japan
Prior art keywords
holding jig
substrate holding
growth
vapor phase
phase epitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP567688U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01110268U (en, 2012
Inventor
佳晴 東川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP567688U priority Critical patent/JPH0613264Y2/ja
Publication of JPH01110268U publication Critical patent/JPH01110268U/ja
Application granted granted Critical
Publication of JPH0613264Y2 publication Critical patent/JPH0613264Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP567688U 1988-01-20 1988-01-20 気相エピタキシアル成長装置 Expired - Lifetime JPH0613264Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP567688U JPH0613264Y2 (ja) 1988-01-20 1988-01-20 気相エピタキシアル成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP567688U JPH0613264Y2 (ja) 1988-01-20 1988-01-20 気相エピタキシアル成長装置

Publications (2)

Publication Number Publication Date
JPH01110268U JPH01110268U (en, 2012) 1989-07-25
JPH0613264Y2 true JPH0613264Y2 (ja) 1994-04-06

Family

ID=31209260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP567688U Expired - Lifetime JPH0613264Y2 (ja) 1988-01-20 1988-01-20 気相エピタキシアル成長装置

Country Status (1)

Country Link
JP (1) JPH0613264Y2 (en, 2012)

Also Published As

Publication number Publication date
JPH01110268U (en, 2012) 1989-07-25

Similar Documents

Publication Publication Date Title
EP1138060B1 (en) Gas driven rotating susceptor for rapid thermal processing (rtp) system
KR880001438B1 (ko) 반도체 기상성장장치
KR101312789B1 (ko) 웨이퍼의 위치 결정 방법
US7905700B2 (en) Vertical-type heat processing apparatus and method of controlling transfer mechanism in vertical-type heat processing apparatus
JPH06124899A (ja) 半導体製造装置
JP2007083232A (ja) コンポーネントを製造するための方法および装置
US6546307B1 (en) Method and apparatus for detecting proper orientation of a semiconductor wafer in a wafer transfer system
JPH0613264Y2 (ja) 気相エピタキシアル成長装置
JPH04226802A (ja) 旋盤/研削装置
JPH05304196A (ja) ウエハ搬送装置
JP2005044938A (ja) アライナ付き基板移載装置
KR19990014227A (ko) 복수의 반송밸트를 갖는 반송장치 및 처리장치
CN217847887U (zh) 一种晶圆寻边附加装置和光刻机
JPH09213770A (ja) 半導体ウエハ処理装置および半導体ウエハ処理装置におけるアライメント方法
JPH0825209A (ja) 切削装置
JPS62173147A (ja) 温度変化に起因する誤差が低減された精密装置
JP2001013014A (ja) 非接触式温度計の較正方法
EP0372884A3 (en) Processing semi-conductor wafers and other substrates
JPH11343028A (ja) 半導体ウエハの搬送ロボット
JP2648751B2 (ja) 熱処理方法及び熱処理装置
JP3149027B2 (ja) 熱処理用ボートの位置決め装置
JP2000058437A (ja) レジスト塗布方法
JPH11233392A (ja) 基板処理装置
JPS6040605Y2 (ja) 気相成長装置のノズル高さ調整装置
JPH10138231A (ja) ワイヤソー