JPH0610680Y2 - インライン式成膜装置の搬送機構 - Google Patents

インライン式成膜装置の搬送機構

Info

Publication number
JPH0610680Y2
JPH0610680Y2 JP17040588U JP17040588U JPH0610680Y2 JP H0610680 Y2 JPH0610680 Y2 JP H0610680Y2 JP 17040588 U JP17040588 U JP 17040588U JP 17040588 U JP17040588 U JP 17040588U JP H0610680 Y2 JPH0610680 Y2 JP H0610680Y2
Authority
JP
Japan
Prior art keywords
substrate
chamber
cart
film forming
heating chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17040588U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0289831U (enrdf_load_stackoverflow
Inventor
正義 今村
博 高宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP17040588U priority Critical patent/JPH0610680Y2/ja
Publication of JPH0289831U publication Critical patent/JPH0289831U/ja
Application granted granted Critical
Publication of JPH0610680Y2 publication Critical patent/JPH0610680Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP17040588U 1988-12-28 1988-12-28 インライン式成膜装置の搬送機構 Expired - Lifetime JPH0610680Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17040588U JPH0610680Y2 (ja) 1988-12-28 1988-12-28 インライン式成膜装置の搬送機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17040588U JPH0610680Y2 (ja) 1988-12-28 1988-12-28 インライン式成膜装置の搬送機構

Publications (2)

Publication Number Publication Date
JPH0289831U JPH0289831U (enrdf_load_stackoverflow) 1990-07-17
JPH0610680Y2 true JPH0610680Y2 (ja) 1994-03-16

Family

ID=31461317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17040588U Expired - Lifetime JPH0610680Y2 (ja) 1988-12-28 1988-12-28 インライン式成膜装置の搬送機構

Country Status (1)

Country Link
JP (1) JPH0610680Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5190802B2 (ja) * 2009-02-25 2013-04-24 株式会社島津製作所 インライン成膜処理装置

Also Published As

Publication number Publication date
JPH0289831U (enrdf_load_stackoverflow) 1990-07-17

Similar Documents

Publication Publication Date Title
JP2888026B2 (ja) プラズマcvd装置
US6070341A (en) Vacuum processing and operating method with wafers, substrates and/or semiconductors
JP2729106B2 (ja) ウェファ処理クラスタ・ツール・バッチ予熱及び脱気方法及び装置
JP3909888B2 (ja) トレイ搬送式インライン成膜装置
JP2001526316A (ja) 基板加熱冷却を改良した真空処理装置
JP3175333B2 (ja) 基板処理装置
JPH09176857A (ja) ワークピースを表面処理するための真空装置
CN101399173A (zh) 热处理方法以及热处理装置
JPS63299136A (ja) サブストレートをほぼ連続的に処理する装置
JPH0610680Y2 (ja) インライン式成膜装置の搬送機構
JP2001338578A5 (enrdf_load_stackoverflow)
JP3970184B2 (ja) 処理装置
CN100511629C (zh) 处理系统及其运作方法
JPH09115985A (ja) ウエハトランスファチャンバ及びウエハの予熱方法
JPH06277971A (ja) 加工機におけるワーク支持装置及びこれを用いたワークの加工方法
JPH07242929A (ja) 連続処理装置の搬送機構
JPWO2020172244A5 (enrdf_load_stackoverflow)
JPH0610679Y2 (ja) 連続インライン式成膜装置
JP2601514Y2 (ja) 連続式熱処理炉
JPH04231464A (ja) インライン式成膜装置の搬送装置
JPH0630156U (ja) 基板処理装置
JP2594145B2 (ja) 熱処理炉における搬出入装置
JPS63139019A (ja) ガラス成形装置
JP3149027B2 (ja) 熱処理用ボートの位置決め装置
JP3059746B2 (ja) 真空成膜製造装置