JPH059934B2 - - Google Patents

Info

Publication number
JPH059934B2
JPH059934B2 JP58018714A JP1871483A JPH059934B2 JP H059934 B2 JPH059934 B2 JP H059934B2 JP 58018714 A JP58018714 A JP 58018714A JP 1871483 A JP1871483 A JP 1871483A JP H059934 B2 JPH059934 B2 JP H059934B2
Authority
JP
Japan
Prior art keywords
optical
image
wafer
imaging
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58018714A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59144127A (ja
Inventor
Akyoshi Suzuki
Michio Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58018714A priority Critical patent/JPS59144127A/ja
Priority to GB08402807A priority patent/GB2138163B/en
Priority to DE19843404063 priority patent/DE3404063A1/de
Publication of JPS59144127A publication Critical patent/JPS59144127A/ja
Publication of JPH059934B2 publication Critical patent/JPH059934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Lenses (AREA)
JP58018714A 1983-02-07 1983-02-07 像調整された光学装置 Granted JPS59144127A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58018714A JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置
GB08402807A GB2138163B (en) 1983-02-07 1984-02-02 Optical projection system
DE19843404063 DE3404063A1 (de) 1983-02-07 1984-02-06 Optische vorrichtung, bei der die bildverzerrung aufgehoben ist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58018714A JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置

Publications (2)

Publication Number Publication Date
JPS59144127A JPS59144127A (ja) 1984-08-18
JPH059934B2 true JPH059934B2 (enrdf_load_stackoverflow) 1993-02-08

Family

ID=11979322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58018714A Granted JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置

Country Status (3)

Country Link
JP (1) JPS59144127A (enrdf_load_stackoverflow)
DE (1) DE3404063A1 (enrdf_load_stackoverflow)
GB (1) GB2138163B (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752712B2 (ja) * 1989-12-27 1995-06-05 株式会社東芝 露光装置
JP3341269B2 (ja) 1993-12-22 2002-11-05 株式会社ニコン 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JP3221226B2 (ja) * 1994-03-30 2001-10-22 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP3893626B2 (ja) * 1995-01-25 2007-03-14 株式会社ニコン 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法
JPH1054932A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
DE19733193B4 (de) * 1997-08-01 2005-09-08 Carl Zeiss Jena Gmbh Mikroskop mit adaptiver Optik
DE19827603A1 (de) 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
US6937394B2 (en) 2001-04-10 2005-08-30 Carl Zeiss Semiconductor Manufacturing Technologies Ag Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
SG118242A1 (en) * 2003-04-30 2006-01-27 Asml Netherlands Bv Lithographic apparatus device manufacturing methods mask and method of characterising a mask and/or pellicle
JP4195674B2 (ja) * 2004-03-31 2008-12-10 株式会社オーク製作所 投影光学系および投影露光装置
KR100588941B1 (ko) 2004-08-03 2006-06-09 주식회사 대우일렉트로닉스 실린드리컬 방식의 홀로그래픽 데이터 기록 장치 및 그제어 방법
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5095946B2 (ja) * 2005-02-18 2012-12-12 ハイデルベルガー ドルツクマシーネン アクチエンゲゼルシヤフト 少なくとも１つのレーザダイオードバーを備える版の画像付け装置
US8922750B2 (en) * 2009-11-20 2014-12-30 Corning Incorporated Magnification control for lithographic imaging system
CN110109104B (zh) * 2019-04-17 2022-03-15 电子科技大学 一种阵列sar等距离切片成像几何畸变校正方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH234371A (de) * 1942-10-22 1944-09-30 Zeiss Ikon Ag Verfahren zur Abbildung von Zeichnungen, Plänen und dergleichen und Vorrichtung zur Durchführung dieses Verfahrens.
US2976785A (en) * 1955-09-23 1961-03-28 Bariquand & Marre Sa Atel Italic-forming anamorphotic device for use in photo-composition
US3582331A (en) * 1968-05-06 1971-06-01 Eastman Kodak Co Process for making a small linear change in a photographic image
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
JPS5453867A (en) * 1977-10-06 1979-04-27 Canon Inc Printing device
DE2910280C2 (de) * 1978-03-18 1993-10-28 Canon Kk Optische Abbildungssysteme
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法

Also Published As

Publication number Publication date
JPS59144127A (ja) 1984-08-18
GB8402807D0 (en) 1984-03-07
GB2138163B (en) 1987-06-24
GB2138163A (en) 1984-10-17
DE3404063A1 (de) 1984-08-09
DE3404063C2 (enrdf_load_stackoverflow) 1993-04-08

Similar Documents

Publication Publication Date Title
KR100285030B1 (ko) 투영노광장치 및 소자제조방법
US4492459A (en) Projection printing apparatus for printing a photomask
JPH059934B2 (enrdf_load_stackoverflow)
KR20030017431A (ko) 조명 광학 장치, 노광 장치, 노광 방법 및 마이크로장치의 제조 방법
JP2004056103A (ja) 照明光学装置、露光装置および露光方法
KR20040023629A (ko) 투영 광학계 및 상기 투영 광학계를 구비한 노광 장치
EP1164407B1 (en) Illumination system and scanning exposure apparatus using the same
KR20040086313A (ko) 노광장치 및 노광방법
JPH0533368B2 (enrdf_load_stackoverflow)
JP4497949B2 (ja) 露光装置
KR102372650B1 (ko) 투영 광학계, 노광 장치, 물품의 제조 방법, 및 조정 방법
JP2002287029A (ja) 投影光学系およびこれを用いた投影露光装置
KR20080049673A (ko) 노광장치 및 디바이스의 제조방법
KR100511360B1 (ko) 투영광학계 및 그것을 사용한 투영노광장치, 및디바이스제조방법
US6987621B2 (en) Aberration correction optical system
JP2008292801A (ja) 露光装置および方法
JP4296701B2 (ja) 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
KR100918335B1 (ko) 투영 노광 장치
KR100992302B1 (ko) 광학계, 노광장치 및 디바이스 제조방법
JP2010257998A (ja) 反射投影光学系、露光装置、及びデバイスの製造方法
JP2004012825A (ja) 投影光学系およびそれを用いた投影露光装置
JP2002169083A (ja) 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
TWI658333B (zh) Exposure device, exposure method, and article manufacturing method
KR20050092434A (ko) 노광 장치
JPH0533371B2 (enrdf_load_stackoverflow)