GB2138163B - Optical projection system - Google Patents

Optical projection system

Info

Publication number
GB2138163B
GB2138163B GB08402807A GB8402807A GB2138163B GB 2138163 B GB2138163 B GB 2138163B GB 08402807 A GB08402807 A GB 08402807A GB 8402807 A GB8402807 A GB 8402807A GB 2138163 B GB2138163 B GB 2138163B
Authority
GB
United Kingdom
Prior art keywords
projection system
optical projection
optical
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08402807A
Other versions
GB2138163A (en
GB8402807D0 (en
Inventor
Akiyoshi Suzuki
Michio Kohno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8402807D0 publication Critical patent/GB8402807D0/en
Publication of GB2138163A publication Critical patent/GB2138163A/en
Application granted granted Critical
Publication of GB2138163B publication Critical patent/GB2138163B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Projection-Type Copiers In General (AREA)
GB08402807A 1983-02-07 1984-02-02 Optical projection system Expired GB2138163B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58018714A JPS59144127A (en) 1983-02-07 1983-02-07 Optical apparatus with adjustment of image

Publications (3)

Publication Number Publication Date
GB8402807D0 GB8402807D0 (en) 1984-03-07
GB2138163A GB2138163A (en) 1984-10-17
GB2138163B true GB2138163B (en) 1987-06-24

Family

ID=11979322

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08402807A Expired GB2138163B (en) 1983-02-07 1984-02-02 Optical projection system

Country Status (3)

Country Link
JP (1) JPS59144127A (en)
DE (1) DE3404063A1 (en)
GB (1) GB2138163B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752712B2 (en) * 1989-12-27 1995-06-05 株式会社東芝 Exposure equipment
JP3341269B2 (en) 1993-12-22 2002-11-05 株式会社ニコン Projection exposure apparatus, exposure method, semiconductor manufacturing method, and projection optical system adjustment method
JP3221226B2 (en) * 1994-03-30 2001-10-22 キヤノン株式会社 Illumination apparatus and projection exposure apparatus using the same
JP3893626B2 (en) * 1995-01-25 2007-03-14 株式会社ニコン Projection optical apparatus adjustment method, projection optical apparatus, exposure apparatus, and exposure method
JPH1054932A (en) * 1996-08-08 1998-02-24 Nikon Corp Projection optical device and projection exposure device provided the device
DE19733193B4 (en) * 1997-08-01 2005-09-08 Carl Zeiss Jena Gmbh Microscope with adaptive optics
DE19827603A1 (en) * 1998-06-20 1999-12-23 Zeiss Carl Fa Projection light exposure system for microlithography
US6937394B2 (en) 2001-04-10 2005-08-30 Carl Zeiss Semiconductor Manufacturing Technologies Ag Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
SG118242A1 (en) * 2003-04-30 2006-01-27 Asml Netherlands Bv Lithographic apparatus device manufacturing methods mask and method of characterising a mask and/or pellicle
JP4195674B2 (en) * 2004-03-31 2008-12-10 株式会社オーク製作所 Projection optical system and projection exposure apparatus
KR100588941B1 (en) 2004-08-03 2006-06-09 주식회사 대우일렉트로닉스 Cylindrical type holographic data recoding apparatus and method for controlling thereof
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5095946B2 (en) * 2005-02-18 2012-12-12 ハイデルベルガー ドルツクマシーネン アクチエンゲゼルシヤフト Plate imaging apparatus comprising at least one laser diode bar
US8922750B2 (en) * 2009-11-20 2014-12-30 Corning Incorporated Magnification control for lithographic imaging system
CN110109104B (en) * 2019-04-17 2022-03-15 电子科技大学 Array SAR (synthetic aperture radar) equidistant slice imaging geometric distortion correction method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH234371A (en) * 1942-10-22 1944-09-30 Zeiss Ikon Ag Method for depicting drawings, plans and the like and apparatus for carrying out this method.
US2976785A (en) * 1955-09-23 1961-03-28 Bariquand & Marre Sa Atel Italic-forming anamorphotic device for use in photo-composition
US3582331A (en) * 1968-05-06 1971-06-01 Eastman Kodak Co Process for making a small linear change in a photographic image
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
JPS5453867A (en) * 1977-10-06 1979-04-27 Canon Inc Printing device
DE2910280C2 (en) * 1978-03-18 1993-10-28 Canon Kk Optical imaging systems
JPS58108745A (en) * 1981-12-23 1983-06-28 Canon Inc Erroneous transcription adjusting device
JPS58116735A (en) * 1981-12-29 1983-07-12 Canon Inc Projection printing apparatus

Also Published As

Publication number Publication date
GB2138163A (en) 1984-10-17
DE3404063A1 (en) 1984-08-09
DE3404063C2 (en) 1993-04-08
JPH059934B2 (en) 1993-02-08
JPS59144127A (en) 1984-08-18
GB8402807D0 (en) 1984-03-07

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20040201