JPS59144127A - 像調整された光学装置 - Google Patents

像調整された光学装置

Info

Publication number
JPS59144127A
JPS59144127A JP58018714A JP1871483A JPS59144127A JP S59144127 A JPS59144127 A JP S59144127A JP 58018714 A JP58018714 A JP 58018714A JP 1871483 A JP1871483 A JP 1871483A JP S59144127 A JPS59144127 A JP S59144127A
Authority
JP
Japan
Prior art keywords
optical
image
wafer
imaging
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58018714A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059934B2 (enrdf_load_stackoverflow
Inventor
Akiyoshi Suzuki
章義 鈴木
Michio Kono
道生 河野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58018714A priority Critical patent/JPS59144127A/ja
Priority to GB08402807A priority patent/GB2138163B/en
Priority to DE19843404063 priority patent/DE3404063A1/de
Publication of JPS59144127A publication Critical patent/JPS59144127A/ja
Publication of JPH059934B2 publication Critical patent/JPH059934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Lenses (AREA)
JP58018714A 1983-02-07 1983-02-07 像調整された光学装置 Granted JPS59144127A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58018714A JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置
GB08402807A GB2138163B (en) 1983-02-07 1984-02-02 Optical projection system
DE19843404063 DE3404063A1 (de) 1983-02-07 1984-02-06 Optische vorrichtung, bei der die bildverzerrung aufgehoben ist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58018714A JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置

Publications (2)

Publication Number Publication Date
JPS59144127A true JPS59144127A (ja) 1984-08-18
JPH059934B2 JPH059934B2 (enrdf_load_stackoverflow) 1993-02-08

Family

ID=11979322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58018714A Granted JPS59144127A (ja) 1983-02-07 1983-02-07 像調整された光学装置

Country Status (3)

Country Link
JP (1) JPS59144127A (enrdf_load_stackoverflow)
DE (1) DE3404063A1 (enrdf_load_stackoverflow)
GB (1) GB2138163B (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198319A (ja) * 1989-12-27 1991-08-29 Toshiba Corp 露光装置
US6262793B1 (en) 1993-12-22 2001-07-17 Nikon Corporation Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
US6268903B1 (en) 1995-01-25 2001-07-31 Nikon Corporation Method of adjusting projection optical apparatus
JP2005292450A (ja) * 2004-03-31 2005-10-20 Orc Mfg Co Ltd 投影光学系および投影露光装置
KR100588941B1 (ko) 2004-08-03 2006-06-09 주식회사 대우일렉트로닉스 실린드리컬 방식의 홀로그래픽 데이터 기록 장치 및 그제어 방법
JP2006235625A (ja) * 2005-02-18 2006-09-07 Heidelberger Druckmas Ag 少なくとも１つのレーザダイオードバーを備える版の画像付け装置
JP2013511843A (ja) * 2009-11-20 2013-04-04 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3221226B2 (ja) * 1994-03-30 2001-10-22 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JPH1054932A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
DE19733193B4 (de) * 1997-08-01 2005-09-08 Carl Zeiss Jena Gmbh Mikroskop mit adaptiver Optik
DE19827603A1 (de) 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
US6937394B2 (en) 2001-04-10 2005-08-30 Carl Zeiss Semiconductor Manufacturing Technologies Ag Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
SG118242A1 (en) * 2003-04-30 2006-01-27 Asml Netherlands Bv Lithographic apparatus device manufacturing methods mask and method of characterising a mask and/or pellicle
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN110109104B (zh) * 2019-04-17 2022-03-15 电子科技大学 一种阵列sar等距离切片成像几何畸变校正方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH234371A (de) * 1942-10-22 1944-09-30 Zeiss Ikon Ag Verfahren zur Abbildung von Zeichnungen, Plänen und dergleichen und Vorrichtung zur Durchführung dieses Verfahrens.
US2976785A (en) * 1955-09-23 1961-03-28 Bariquand & Marre Sa Atel Italic-forming anamorphotic device for use in photo-composition
US3582331A (en) * 1968-05-06 1971-06-01 Eastman Kodak Co Process for making a small linear change in a photographic image
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
JPS5453867A (en) * 1977-10-06 1979-04-27 Canon Inc Printing device
DE2910280C2 (de) * 1978-03-18 1993-10-28 Canon Kk Optische Abbildungssysteme
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198319A (ja) * 1989-12-27 1991-08-29 Toshiba Corp 露光装置
US6262793B1 (en) 1993-12-22 2001-07-17 Nikon Corporation Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
US6958803B2 (en) 1993-12-22 2005-10-25 Nikon Corporation Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics
US6268903B1 (en) 1995-01-25 2001-07-31 Nikon Corporation Method of adjusting projection optical apparatus
US6377333B1 (en) 1995-01-25 2002-04-23 Nikon Corporation Method of adjusting projection optical apparatus
KR100422330B1 (ko) * 1995-01-25 2004-05-17 가부시키가이샤 니콘 투영광학장치조정방법
JP2005292450A (ja) * 2004-03-31 2005-10-20 Orc Mfg Co Ltd 投影光学系および投影露光装置
KR100588941B1 (ko) 2004-08-03 2006-06-09 주식회사 대우일렉트로닉스 실린드리컬 방식의 홀로그래픽 데이터 기록 장치 및 그제어 방법
JP2006235625A (ja) * 2005-02-18 2006-09-07 Heidelberger Druckmas Ag 少なくとも１つのレーザダイオードバーを備える版の画像付け装置
JP2013511843A (ja) * 2009-11-20 2013-04-04 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御
JP2015180945A (ja) * 2009-11-20 2015-10-15 コーニング インコーポレイテッド リソグラフィック結像システムの倍率制御

Also Published As

Publication number Publication date
GB8402807D0 (en) 1984-03-07
GB2138163B (en) 1987-06-24
GB2138163A (en) 1984-10-17
DE3404063A1 (de) 1984-08-09
DE3404063C2 (enrdf_load_stackoverflow) 1993-04-08
JPH059934B2 (enrdf_load_stackoverflow) 1993-02-08

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