JPH0584512B2 - - Google Patents
Info
- Publication number
- JPH0584512B2 JPH0584512B2 JP60022164A JP2216485A JPH0584512B2 JP H0584512 B2 JPH0584512 B2 JP H0584512B2 JP 60022164 A JP60022164 A JP 60022164A JP 2216485 A JP2216485 A JP 2216485A JP H0584512 B2 JPH0584512 B2 JP H0584512B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- corrosion
- photosensitive
- resistant film
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60022164A JPS61180233A (ja) | 1985-02-06 | 1985-02-06 | 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法 |
US06/734,441 US4634655A (en) | 1984-06-04 | 1985-05-15 | Method of forming corrosion resistant film on the surface of substrate composed of copper or copper alloy |
EP85106277A EP0164022A3 (en) | 1984-06-04 | 1985-05-22 | Method of forming corrosion resistant film on the surface of substrate composed of copper or copper alloy |
KR1019850003761A KR890004620B1 (ko) | 1984-06-04 | 1985-05-30 | 동 또는 동합금 기재표면에의 내부식성 피막형성방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60022164A JPS61180233A (ja) | 1985-02-06 | 1985-02-06 | 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61180233A JPS61180233A (ja) | 1986-08-12 |
JPH0584512B2 true JPH0584512B2 (enrdf_load_stackoverflow) | 1993-12-02 |
Family
ID=12075179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60022164A Granted JPS61180233A (ja) | 1984-06-04 | 1985-02-06 | 銅又は銅合金からなる基材表面への耐食性皮膜の形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61180233A (enrdf_load_stackoverflow) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5034963A (enrdf_load_stackoverflow) * | 1973-07-27 | 1975-04-03 | ||
JPS5114932A (ja) * | 1974-07-30 | 1976-02-05 | Kansai Paint Co Ltd | Kokaseihifukusoseibutsu |
JPS5215321A (en) * | 1975-07-28 | 1977-02-04 | Hitachi Ltd | Photosensitive resinous composition |
JPS52125002A (en) * | 1976-04-12 | 1977-10-20 | Ueno Chem Ind | Water soluble photoosensitive composition |
US4061529A (en) * | 1977-02-28 | 1977-12-06 | Rca Corporation | Method for making etch-resistant stencil with dichromate-sensitized casein coating |
-
1985
- 1985-02-06 JP JP60022164A patent/JPS61180233A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61180233A (ja) | 1986-08-12 |
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