JPH058271B2 - - Google Patents

Info

Publication number
JPH058271B2
JPH058271B2 JP58222532A JP22253283A JPH058271B2 JP H058271 B2 JPH058271 B2 JP H058271B2 JP 58222532 A JP58222532 A JP 58222532A JP 22253283 A JP22253283 A JP 22253283A JP H058271 B2 JPH058271 B2 JP H058271B2
Authority
JP
Japan
Prior art keywords
vacuum container
power supply
electrode
load electrode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58222532A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60114577A (ja
Inventor
Yoichi Oonishi
Hirozo Shima
Junichi Nozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP22253283A priority Critical patent/JPS60114577A/ja
Publication of JPS60114577A publication Critical patent/JPS60114577A/ja
Publication of JPH058271B2 publication Critical patent/JPH058271B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP22253283A 1983-11-26 1983-11-26 化学処理装置 Granted JPS60114577A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22253283A JPS60114577A (ja) 1983-11-26 1983-11-26 化学処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22253283A JPS60114577A (ja) 1983-11-26 1983-11-26 化学処理装置

Publications (2)

Publication Number Publication Date
JPS60114577A JPS60114577A (ja) 1985-06-21
JPH058271B2 true JPH058271B2 (enrdf_load_stackoverflow) 1993-02-01

Family

ID=16783904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22253283A Granted JPS60114577A (ja) 1983-11-26 1983-11-26 化学処理装置

Country Status (1)

Country Link
JP (1) JPS60114577A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2646582B2 (ja) * 1987-10-16 1997-08-27 松下電器産業株式会社 プラズマｃｖｄ装置
JPH01136970A (ja) * 1987-11-20 1989-05-30 Matsushita Electric Ind Co Ltd プラズマｃｖｄ装置のクリーニング方法
JP5749071B2 (ja) * 2010-05-18 2015-07-15 株式会社半導体エネルギー研究所 プラズマ処理装置
JP5700632B2 (ja) 2010-11-04 2015-04-15 東京エレクトロン株式会社 プラズマ処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688316A (en) * 1979-12-21 1981-07-17 Fuji Electric Co Ltd Apparatus for forming thin layer
JPS5832410A (ja) * 1981-08-06 1983-02-25 ザ・パ−キン−エルマ−・コ−ポレイシヨン ガス状減圧環境下で構造物を処理する方法及び装置

Also Published As

Publication number Publication date
JPS60114577A (ja) 1985-06-21

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