JPS5688316A - Apparatus for forming thin layer - Google Patents
Apparatus for forming thin layerInfo
- Publication number
- JPS5688316A JPS5688316A JP16667979A JP16667979A JPS5688316A JP S5688316 A JPS5688316 A JP S5688316A JP 16667979 A JP16667979 A JP 16667979A JP 16667979 A JP16667979 A JP 16667979A JP S5688316 A JPS5688316 A JP S5688316A
- Authority
- JP
- Japan
- Prior art keywords
- bellow
- bottom plate
- lower electrode
- bolts
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/023—Means for mechanically adjusting components not otherwise provided for
Abstract
PURPOSE:To support electrodes precisely and in parallel with a specified distance being maintained by connecting the lower electrode to a vacuum chamber via a bellow so that it is tightly sealed, and providing an adjusting mechanism for parallel degrees and the like at the outside of the vacuum chamber. CONSTITUTION:The upper electrode 3 for glow dischage is fixed to the ceiling of a bell jar 1. The lower electrode 4 is fixed to a bottom plate 2 via the bellow 12, and supported by bolts 11 which are screwed into the screw holes in the bottom plate 2. Therefore, the position or inclination of the plane of the lower electrode 4 can be adjusted by the rotation of the bolts 11. The bellow 12 is made of metal and the lower electrode 4 is grounded by way of the bellow 12, the bolts 11, and the bottom plate 2. The space which is tightly sealed by the bell jar 1, the bottom plate 2, the bellow 12, and the electrode 4 constitute the vacuum chamber. In this constitution, the electrodes can be precisely supported in parallel with a specified distance being maintained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16667979A JPS5688316A (en) | 1979-12-21 | 1979-12-21 | Apparatus for forming thin layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16667979A JPS5688316A (en) | 1979-12-21 | 1979-12-21 | Apparatus for forming thin layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5688316A true JPS5688316A (en) | 1981-07-17 |
Family
ID=15835707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16667979A Pending JPS5688316A (en) | 1979-12-21 | 1979-12-21 | Apparatus for forming thin layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5688316A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60114577A (en) * | 1983-11-26 | 1985-06-21 | Matsushita Electric Ind Co Ltd | Chemical treating device |
JPS62271418A (en) * | 1986-05-20 | 1987-11-25 | Matsushita Electric Ind Co Ltd | Manufacture of amorphous silicon semiconductor element |
-
1979
- 1979-12-21 JP JP16667979A patent/JPS5688316A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60114577A (en) * | 1983-11-26 | 1985-06-21 | Matsushita Electric Ind Co Ltd | Chemical treating device |
JPH058271B2 (en) * | 1983-11-26 | 1993-02-01 | Matsushita Electric Ind Co Ltd | |
JPS62271418A (en) * | 1986-05-20 | 1987-11-25 | Matsushita Electric Ind Co Ltd | Manufacture of amorphous silicon semiconductor element |
JPH0556850B2 (en) * | 1986-05-20 | 1993-08-20 | Matsushita Electric Ind Co Ltd |
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