JPH0578949B2 - - Google Patents
Info
- Publication number
- JPH0578949B2 JPH0578949B2 JP60056018A JP5601885A JPH0578949B2 JP H0578949 B2 JPH0578949 B2 JP H0578949B2 JP 60056018 A JP60056018 A JP 60056018A JP 5601885 A JP5601885 A JP 5601885A JP H0578949 B2 JPH0578949 B2 JP H0578949B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- conductivity type
- exhibiting
- semiconductor layer
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 48
- 230000001747 exhibiting effect Effects 0.000 claims description 40
- 239000012535 impurity Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 15
- 230000007423 decrease Effects 0.000 description 9
- 239000000969 carrier Substances 0.000 description 8
- 238000001947 vapour-phase growth Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- 210000000746 body region Anatomy 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- XUKUURHRXDUEBC-SXOMAYOGSA-N (3s,5r)-7-[2-(4-fluorophenyl)-3-phenyl-4-(phenylcarbamoyl)-5-propan-2-ylpyrrol-1-yl]-3,5-dihydroxyheptanoic acid Chemical compound C=1C=CC=CC=1C1=C(C=2C=CC(F)=CC=2)N(CC[C@@H](O)C[C@H](O)CC(O)=O)C(C(C)C)=C1C(=O)NC1=CC=CC=C1 XUKUURHRXDUEBC-SXOMAYOGSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 210000003754 fetus Anatomy 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/083—Anode or cathode regions of thyristors or gated bipolar-mode devices
- H01L29/0834—Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60056018A JPS61216363A (ja) | 1985-03-22 | 1985-03-22 | 伝導度変調型半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60056018A JPS61216363A (ja) | 1985-03-22 | 1985-03-22 | 伝導度変調型半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61216363A JPS61216363A (ja) | 1986-09-26 |
| JPH0578949B2 true JPH0578949B2 (fr) | 1993-10-29 |
Family
ID=13015320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60056018A Granted JPS61216363A (ja) | 1985-03-22 | 1985-03-22 | 伝導度変調型半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61216363A (fr) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07123166B2 (ja) * | 1986-11-17 | 1995-12-25 | 日産自動車株式会社 | 電導度変調形ｍｏｓｆｅｔ |
| JPS63254762A (ja) * | 1987-04-13 | 1988-10-21 | Nissan Motor Co Ltd | Ｃｍｏｓ半導体装置 |
| JPS6445173A (en) * | 1987-08-13 | 1989-02-17 | Fuji Electric Co Ltd | Conductive modulation type mosfet |
| JPS6490561A (en) * | 1987-09-30 | 1989-04-07 | Mitsubishi Electric Corp | Semiconductor device |
| JP2526653B2 (ja) * | 1989-01-25 | 1996-08-21 | 富士電機株式会社 | 伝導度変調型ｍｏｓｆｅｔ |
| WO1991003842A1 (fr) * | 1989-08-31 | 1991-03-21 | Nippondenso Co., Ltd. | Transistor bipolaire a grille isolee |
| JPH04291767A (ja) * | 1991-03-20 | 1992-10-15 | Fuji Electric Co Ltd | 伝導度変調型ｍｏｓｆｅｔ |
| JPH05347413A (ja) * | 1992-06-12 | 1993-12-27 | Toshiba Corp | 半導体装置の製造方法 |
| JP3081739B2 (ja) * | 1992-10-20 | 2000-08-28 | 三菱電機株式会社 | 絶縁ゲート型半導体装置及びその製造方法 |
| US5981981A (en) * | 1993-10-13 | 1999-11-09 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device including a bipolar structure |
| EP0665597A1 (fr) * | 1994-01-27 | 1995-08-02 | Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno - CoRiMMe | IGBT et son procédé de fabrication |
| JP6667798B2 (ja) * | 2016-01-29 | 2020-03-18 | サンケン電気株式会社 | 半導体装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58108773A (ja) * | 1981-11-23 | 1983-06-28 | ゼネラル・エレクトリツク・カンパニイ | タ−ンオフ時に活性ベ−ス領域から多数キヤリヤを急速に除去する半導体素子およびその製造方法 |
-
1985
- 1985-03-22 JP JP60056018A patent/JPS61216363A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58108773A (ja) * | 1981-11-23 | 1983-06-28 | ゼネラル・エレクトリツク・カンパニイ | タ−ンオフ時に活性ベ−ス領域から多数キヤリヤを急速に除去する半導体素子およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61216363A (ja) | 1986-09-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |