JPH0578167B2 - - Google Patents

Info

Publication number
JPH0578167B2
JPH0578167B2 JP58185404A JP18540483A JPH0578167B2 JP H0578167 B2 JPH0578167 B2 JP H0578167B2 JP 58185404 A JP58185404 A JP 58185404A JP 18540483 A JP18540483 A JP 18540483A JP H0578167 B2 JPH0578167 B2 JP H0578167B2
Authority
JP
Japan
Prior art keywords
sample
electron beam
mark
stage
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58185404A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6077422A (ja
Inventor
Toshuki Honda
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP18540483A priority Critical patent/JPS6077422A/ja
Publication of JPS6077422A publication Critical patent/JPS6077422A/ja
Publication of JPH0578167B2 publication Critical patent/JPH0578167B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP18540483A 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ− Granted JPS6077422A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18540483A JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18540483A JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Publications (2)

Publication Number Publication Date
JPS6077422A JPS6077422A (ja) 1985-05-02
JPH0578167B2 true JPH0578167B2 (enrdf_load_stackoverflow) 1993-10-28

Family

ID=16170196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18540483A Granted JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Country Status (1)

Country Link
JP (1) JPS6077422A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0824225A3 (en) * 1989-09-26 1998-03-04 Canon Kabushiki Kaisha Alignment method
JPH11288863A (ja) 1998-04-01 1999-10-19 Mitsubishi Electric Corp Ｘ線マスクおよびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS575330A (en) * 1980-06-11 1982-01-12 Toshiba Corp Specimen cassette for microminiature machining apparatus
JPS5821326A (ja) * 1981-07-29 1983-02-08 Toshiba Corp 電子ビ−ム描画装置のカセツト位置合わせ方法
JPS58127325A (ja) * 1982-01-26 1983-07-29 Toshiba Corp 電子ビ−ム露光用位置合わせ装置

Also Published As

Publication number Publication date
JPS6077422A (ja) 1985-05-02

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