JPS6145858B2 - - Google Patents

Info

Publication number
JPS6145858B2
JPS6145858B2 JP52078672A JP7867277A JPS6145858B2 JP S6145858 B2 JPS6145858 B2 JP S6145858B2 JP 52078672 A JP52078672 A JP 52078672A JP 7867277 A JP7867277 A JP 7867277A JP S6145858 B2 JPS6145858 B2 JP S6145858B2
Authority
JP
Japan
Prior art keywords
pattern
electron beam
alignment
alignment mark
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52078672A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5412676A (en
Inventor
Kenichi Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7867277A priority Critical patent/JPS5412676A/ja
Publication of JPS5412676A publication Critical patent/JPS5412676A/ja
Publication of JPS6145858B2 publication Critical patent/JPS6145858B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP7867277A 1977-06-30 1977-06-30 Position matching method for electron beam exposure Granted JPS5412676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7867277A JPS5412676A (en) 1977-06-30 1977-06-30 Position matching method for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7867277A JPS5412676A (en) 1977-06-30 1977-06-30 Position matching method for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5412676A JPS5412676A (en) 1979-01-30
JPS6145858B2 true JPS6145858B2 (enrdf_load_stackoverflow) 1986-10-09

Family

ID=13668347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7867277A Granted JPS5412676A (en) 1977-06-30 1977-06-30 Position matching method for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5412676A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633830A (en) * 1979-08-29 1981-04-04 Fujitsu Ltd Detecting method for mark positioning by electron beam
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
JPS59107511A (ja) * 1982-12-13 1984-06-21 Hitachi Ltd パタ−ン形成方法
JPH079874B2 (ja) * 1985-03-15 1995-02-01 株式会社東芝 電子ビ−ム描画方法
JPH0789531B2 (ja) * 1985-12-24 1995-09-27 三菱電機株式会社 微細パターン形成方法
JP3970546B2 (ja) 2001-04-13 2007-09-05 沖電気工業株式会社 半導体装置及び半導体装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113572A (en) * 1975-03-31 1976-10-06 Hitachi Ltd Centering method for electronic ray picture and the unit using the sai d method

Also Published As

Publication number Publication date
JPS5412676A (en) 1979-01-30

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