JPH0575840B2 - - Google Patents
Info
- Publication number
- JPH0575840B2 JPH0575840B2 JP1142980A JP14298089A JPH0575840B2 JP H0575840 B2 JPH0575840 B2 JP H0575840B2 JP 1142980 A JP1142980 A JP 1142980A JP 14298089 A JP14298089 A JP 14298089A JP H0575840 B2 JPH0575840 B2 JP H0575840B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- metal
- corrosion
- plate
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 claims description 54
- 239000002184 metal Substances 0.000 claims description 53
- 238000005260 corrosion Methods 0.000 claims description 16
- 230000007797 corrosion Effects 0.000 claims description 16
- 239000007772 electrode material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- 238000009713 electroplating Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 238000003763 carbonization Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000004080 punching Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- -1 wire rolls Substances 0.000 description 2
- 229910001335 Galvanized steel Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000008397 galvanized steel Substances 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14298089A JPH0310099A (ja) | 1989-06-07 | 1989-06-07 | 電気メッキ用不溶性電極とその製造方法 |
EP90830250A EP0407355A1 (en) | 1989-06-07 | 1990-06-01 | Insoluble electrode for electroplating and process for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14298089A JPH0310099A (ja) | 1989-06-07 | 1989-06-07 | 電気メッキ用不溶性電極とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0310099A JPH0310099A (ja) | 1991-01-17 |
JPH0575840B2 true JPH0575840B2 (ko) | 1993-10-21 |
Family
ID=15328132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14298089A Granted JPH0310099A (ja) | 1989-06-07 | 1989-06-07 | 電気メッキ用不溶性電極とその製造方法 |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0407355A1 (ko) |
JP (1) | JPH0310099A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006073163A1 (ja) | 2005-01-07 | 2006-07-13 | Daiso Co., Ltd | 不溶性陽極 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2510807Y2 (ja) * | 1989-09-26 | 1996-09-18 | ダイソー株式会社 | 電気メッキ用陽極 |
JP3124847B2 (ja) * | 1992-11-06 | 2001-01-15 | ペルメレック電極株式会社 | 金属箔の電解による製造方法 |
JP3124848B2 (ja) * | 1992-11-11 | 2001-01-15 | ペルメレック電極株式会社 | 金属箔の電解による製造方法 |
JPH07316861A (ja) * | 1994-05-24 | 1995-12-05 | Permelec Electrode Ltd | 電極構造体 |
JPH0827598A (ja) * | 1994-07-14 | 1996-01-30 | Permelec Electrode Ltd | 電極構造体およびその製造方法 |
US6365017B1 (en) | 1998-09-08 | 2002-04-02 | Ebara Corporation | Substrate plating device |
US6793794B2 (en) | 2000-05-05 | 2004-09-21 | Ebara Corporation | Substrate plating apparatus and method |
FR2909390B1 (fr) * | 2006-11-30 | 2009-12-11 | Electro Rech | Anode pour dispositif d'electrodeposition de revetements metalliques anticorrosion ou cosmetique quelconque sur une piece metallique |
CN102348837A (zh) * | 2009-05-07 | 2012-02-08 | 大曹株式会社 | 氧产生用阳极 |
CN102320683B (zh) * | 2011-06-03 | 2013-03-06 | 大连海事大学 | 钛基锡锑铂氧化物电极材料及其制备方法 |
KR101565844B1 (ko) * | 2014-05-07 | 2015-11-05 | 한국생산기술연구원 | 불용성 양극 및 그 제조방법 |
KR101577313B1 (ko) * | 2015-05-11 | 2015-12-15 | 한국생산기술연구원 | 전극활성물질 나노스피어를 포함한 다공성 필름층을 갖는 불용성 양극 및 이의 제조방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5428141A (en) * | 1977-08-04 | 1979-03-02 | Ricoh Co Ltd | Liquid developer for static latent image |
JPS6021232A (ja) * | 1983-07-18 | 1985-02-02 | Kaito Kagaku Kogyo Kk | プラスチツクフイルム製造装置 |
JPS62274087A (ja) * | 1986-05-22 | 1987-11-28 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1213567B (it) * | 1986-12-19 | 1989-12-20 | Permelec Spa | Anodo permanente per procedimenti galvanici ad alta densita' di correnti |
-
1989
- 1989-06-07 JP JP14298089A patent/JPH0310099A/ja active Granted
-
1990
- 1990-06-01 EP EP90830250A patent/EP0407355A1/en not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5428141A (en) * | 1977-08-04 | 1979-03-02 | Ricoh Co Ltd | Liquid developer for static latent image |
JPS6021232A (ja) * | 1983-07-18 | 1985-02-02 | Kaito Kagaku Kogyo Kk | プラスチツクフイルム製造装置 |
JPS62274087A (ja) * | 1986-05-22 | 1987-11-28 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006073163A1 (ja) | 2005-01-07 | 2006-07-13 | Daiso Co., Ltd | 不溶性陽極 |
JP2006188742A (ja) * | 2005-01-07 | 2006-07-20 | Daiso Co Ltd | 不溶性陽極 |
JP4585867B2 (ja) * | 2005-01-07 | 2010-11-24 | ダイソー株式会社 | 不溶性陽極 |
Also Published As
Publication number | Publication date |
---|---|
JPH0310099A (ja) | 1991-01-17 |
EP0407355A1 (en) | 1991-01-09 |
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Legal Events
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R250 | Receipt of annual fees |
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LAPS | Cancellation because of no payment of annual fees |