JPH0575840B2 - - Google Patents

Info

Publication number
JPH0575840B2
JPH0575840B2 JP1142980A JP14298089A JPH0575840B2 JP H0575840 B2 JPH0575840 B2 JP H0575840B2 JP 1142980 A JP1142980 A JP 1142980A JP 14298089 A JP14298089 A JP 14298089A JP H0575840 B2 JPH0575840 B2 JP H0575840B2
Authority
JP
Japan
Prior art keywords
electrode
metal
corrosion
plate
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1142980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0310099A (ja
Inventor
Yukie Matsumoto
Takanobu Hayashi
Yoshiaki Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Nora Permelec Ltd
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Priority to JP14298089A priority Critical patent/JPH0310099A/ja
Priority to EP90830250A priority patent/EP0407355A1/en
Publication of JPH0310099A publication Critical patent/JPH0310099A/ja
Publication of JPH0575840B2 publication Critical patent/JPH0575840B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
JP14298089A 1989-06-07 1989-06-07 電気メッキ用不溶性電極とその製造方法 Granted JPH0310099A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP14298089A JPH0310099A (ja) 1989-06-07 1989-06-07 電気メッキ用不溶性電極とその製造方法
EP90830250A EP0407355A1 (en) 1989-06-07 1990-06-01 Insoluble electrode for electroplating and process for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14298089A JPH0310099A (ja) 1989-06-07 1989-06-07 電気メッキ用不溶性電極とその製造方法

Publications (2)

Publication Number Publication Date
JPH0310099A JPH0310099A (ja) 1991-01-17
JPH0575840B2 true JPH0575840B2 (en, 2012) 1993-10-21

Family

ID=15328132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14298089A Granted JPH0310099A (ja) 1989-06-07 1989-06-07 電気メッキ用不溶性電極とその製造方法

Country Status (2)

Country Link
EP (1) EP0407355A1 (en, 2012)
JP (1) JPH0310099A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006073163A1 (ja) 2005-01-07 2006-07-13 Daiso Co., Ltd 不溶性陽極

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2510807Y2 (ja) * 1989-09-26 1996-09-18 ダイソー株式会社 電気メッキ用陽極
JP3124847B2 (ja) * 1992-11-06 2001-01-15 ペルメレック電極株式会社 金属箔の電解による製造方法
JP3124848B2 (ja) * 1992-11-11 2001-01-15 ペルメレック電極株式会社 金属箔の電解による製造方法
JPH07316861A (ja) * 1994-05-24 1995-12-05 Permelec Electrode Ltd 電極構造体
JPH0827598A (ja) * 1994-07-14 1996-01-30 Permelec Electrode Ltd 電極構造体およびその製造方法
US6365017B1 (en) 1998-09-08 2002-04-02 Ebara Corporation Substrate plating device
US6793794B2 (en) 2000-05-05 2004-09-21 Ebara Corporation Substrate plating apparatus and method
FR2909390B1 (fr) * 2006-11-30 2009-12-11 Electro Rech Anode pour dispositif d'electrodeposition de revetements metalliques anticorrosion ou cosmetique quelconque sur une piece metallique
CN102348837A (zh) * 2009-05-07 2012-02-08 大曹株式会社 氧产生用阳极
CN102320683B (zh) * 2011-06-03 2013-03-06 大连海事大学 钛基锡锑铂氧化物电极材料及其制备方法
KR101565844B1 (ko) * 2014-05-07 2015-11-05 한국생산기술연구원 불용성 양극 및 그 제조방법
KR101577313B1 (ko) * 2015-05-11 2015-12-15 한국생산기술연구원 전극활성물질 나노스피어를 포함한 다공성 필름층을 갖는 불용성 양극 및 이의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428141A (en) * 1977-08-04 1979-03-02 Ricoh Co Ltd Liquid developer for static latent image
JPS6021232A (ja) * 1983-07-18 1985-02-02 Kaito Kagaku Kogyo Kk プラスチツクフイルム製造装置
JPS62274087A (ja) * 1986-05-22 1987-11-28 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
IT1213567B (it) * 1986-12-19 1989-12-20 Permelec Spa Anodo permanente per procedimenti galvanici ad alta densita' di correnti

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006073163A1 (ja) 2005-01-07 2006-07-13 Daiso Co., Ltd 不溶性陽極
JP2006188742A (ja) * 2005-01-07 2006-07-20 Daiso Co Ltd 不溶性陽極

Also Published As

Publication number Publication date
EP0407355A1 (en) 1991-01-09
JPH0310099A (ja) 1991-01-17

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