JPH0572096B2 - - Google Patents

Info

Publication number
JPH0572096B2
JPH0572096B2 JP58147015A JP14701583A JPH0572096B2 JP H0572096 B2 JPH0572096 B2 JP H0572096B2 JP 58147015 A JP58147015 A JP 58147015A JP 14701583 A JP14701583 A JP 14701583A JP H0572096 B2 JPH0572096 B2 JP H0572096B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
wafer
temperature
lamp
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58147015A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6037717A (ja
Inventor
Juri Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP58147015A priority Critical patent/JPS6037717A/ja
Publication of JPS6037717A publication Critical patent/JPS6037717A/ja
Publication of JPH0572096B2 publication Critical patent/JPH0572096B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P10/00—

Landscapes

  • Recrystallisation Techniques (AREA)
JP58147015A 1983-08-10 1983-08-10 半導体装置の製造方法 Granted JPS6037717A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58147015A JPS6037717A (ja) 1983-08-10 1983-08-10 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58147015A JPS6037717A (ja) 1983-08-10 1983-08-10 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP26628392A Division JPH05251377A (ja) 1992-10-05 1992-10-05 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6037717A JPS6037717A (ja) 1985-02-27
JPH0572096B2 true JPH0572096B2 (en:Method) 1993-10-08

Family

ID=15420610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58147015A Granted JPS6037717A (ja) 1983-08-10 1983-08-10 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6037717A (en:Method)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6173324A (ja) * 1984-09-17 1986-04-15 Dainippon Screen Mfg Co Ltd 熱処理装置
JPH07105345B2 (ja) * 1985-08-08 1995-11-13 日電アネルバ株式会社 基体処理装置
JPS62128525A (ja) * 1985-11-29 1987-06-10 Matsushita Electric Ind Co Ltd 化合物半導体基板のアニ−ル方法
JP2001297995A (ja) * 2000-04-13 2001-10-26 Nec Corp 回路製造方法および装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5872837U (ja) * 1981-11-10 1983-05-17 株式会社日立国際電気 減圧気相成長装置

Also Published As

Publication number Publication date
JPS6037717A (ja) 1985-02-27

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