JPH0563933B2 - - Google Patents

Info

Publication number
JPH0563933B2
JPH0563933B2 JP58177286A JP17728683A JPH0563933B2 JP H0563933 B2 JPH0563933 B2 JP H0563933B2 JP 58177286 A JP58177286 A JP 58177286A JP 17728683 A JP17728683 A JP 17728683A JP H0563933 B2 JPH0563933 B2 JP H0563933B2
Authority
JP
Japan
Prior art keywords
holding
thin film
mask
end surface
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58177286A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6068336A (ja
Inventor
Hideo Kato
Hirofumi Shibata
Keiko Matsushita
Osamu Takamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58177286A priority Critical patent/JPS6068336A/ja
Priority to DE19843435177 priority patent/DE3435177A1/de
Priority to GB08424300A priority patent/GB2148539B/en
Publication of JPS6068336A publication Critical patent/JPS6068336A/ja
Priority to US07/398,309 priority patent/US4956249A/en
Priority to US07/534,875 priority patent/US5112707A/en
Publication of JPH0563933B2 publication Critical patent/JPH0563933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58177286A 1983-09-26 1983-09-26 リソグラフィー用マスク構造体 Granted JPS6068336A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58177286A JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体
DE19843435177 DE3435177A1 (de) 1983-09-26 1984-09-25 Maske fuer lithographische zwecke
GB08424300A GB2148539B (en) 1983-09-26 1984-09-26 Lithographic mask
US07/398,309 US4956249A (en) 1983-09-26 1989-08-25 Mask structure for lithography
US07/534,875 US5112707A (en) 1983-09-26 1990-06-08 Mask structure for lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58177286A JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体

Publications (2)

Publication Number Publication Date
JPS6068336A JPS6068336A (ja) 1985-04-18
JPH0563933B2 true JPH0563933B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-09-13

Family

ID=16028369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58177286A Granted JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体

Country Status (1)

Country Link
JP (1) JPS6068336A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185986U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1985-05-09 1986-11-20
JPH0744137B2 (ja) * 1985-08-31 1995-05-15 大日本印刷株式会社 ステップアンドレピート方式用ｘ線露光マスク
FR2894690B1 (fr) * 2005-12-13 2008-02-15 Commissariat Energie Atomique Masque de lithographie en reflexion et procede de fabrication du masque

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041457B2 (ja) * 1977-08-23 1985-09-17 大日本印刷株式会社 軟ｘ線リソグラフィ用マスクの製造法
JPS54124977A (en) * 1978-03-23 1979-09-28 Cho Lsi Gijutsu Kenkyu Kumiai Xxray exposure mask

Also Published As

Publication number Publication date
JPS6068336A (ja) 1985-04-18

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