JPH0560557B2 - - Google Patents

Info

Publication number
JPH0560557B2
JPH0560557B2 JP85291985A JP29198585A JPH0560557B2 JP H0560557 B2 JPH0560557 B2 JP H0560557B2 JP 85291985 A JP85291985 A JP 85291985A JP 29198585 A JP29198585 A JP 29198585A JP H0560557 B2 JPH0560557 B2 JP H0560557B2
Authority
JP
Japan
Prior art keywords
deformable
laser mirror
workpiece fixing
fixing device
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP85291985A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62151783A (ja
Inventor
Akira Iwase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP60291985A priority Critical patent/JPS62151783A/ja
Publication of JPS62151783A publication Critical patent/JPS62151783A/ja
Priority to US07/368,150 priority patent/US4953965A/en
Publication of JPH0560557B2 publication Critical patent/JPH0560557B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60291985A 1985-12-26 1985-12-26 高精度移動テ−ブル装置 Granted JPS62151783A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60291985A JPS62151783A (ja) 1985-12-26 1985-12-26 高精度移動テ−ブル装置
US07/368,150 US4953965A (en) 1985-12-26 1989-06-15 High-accuracy traveling table apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60291985A JPS62151783A (ja) 1985-12-26 1985-12-26 高精度移動テ−ブル装置

Publications (2)

Publication Number Publication Date
JPS62151783A JPS62151783A (ja) 1987-07-06
JPH0560557B2 true JPH0560557B2 (enrdf_load_stackoverflow) 1993-09-02

Family

ID=17776019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60291985A Granted JPS62151783A (ja) 1985-12-26 1985-12-26 高精度移動テ−ブル装置

Country Status (1)

Country Link
JP (1) JPS62151783A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0753059Y2 (ja) * 1986-02-05 1995-12-06 東芝機械株式会社 高精度移動テーブル装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5958825A (ja) * 1982-09-29 1984-04-04 Hitachi Ltd 測長誤差を少なくする機能を備えた移動装置
US4534047A (en) * 1984-01-06 1985-08-06 The Perkin-Elmer Corporation Mask ring assembly for X-ray lithography

Also Published As

Publication number Publication date
JPS62151783A (ja) 1987-07-06

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Legal Events

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R350 Written notification of registration of transfer

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EXPY Cancellation because of completion of term