JPH0560250B2 - - Google Patents
Info
- Publication number
- JPH0560250B2 JPH0560250B2 JP26881384A JP26881384A JPH0560250B2 JP H0560250 B2 JPH0560250 B2 JP H0560250B2 JP 26881384 A JP26881384 A JP 26881384A JP 26881384 A JP26881384 A JP 26881384A JP H0560250 B2 JPH0560250 B2 JP H0560250B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- polished
- wafer
- bonding
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26881384A JPS61145839A (ja) | 1984-12-20 | 1984-12-20 | 半導体ウエ−ハの接着方法および接着治具 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26881384A JPS61145839A (ja) | 1984-12-20 | 1984-12-20 | 半導体ウエ−ハの接着方法および接着治具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61145839A JPS61145839A (ja) | 1986-07-03 |
| JPH0560250B2 true JPH0560250B2 (OSRAM) | 1993-09-01 |
Family
ID=17463609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26881384A Granted JPS61145839A (ja) | 1984-12-20 | 1984-12-20 | 半導体ウエ−ハの接着方法および接着治具 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61145839A (OSRAM) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6271215A (ja) * | 1985-09-25 | 1987-04-01 | Toshiba Corp | ウエハ接合装置 |
| JP2642645B2 (ja) * | 1987-11-19 | 1997-08-20 | 株式会社日立製作所 | 半導体基板の製造方法及び半導体装置の製造方法 |
| JP2589994B2 (ja) * | 1987-12-24 | 1997-03-12 | 富士通株式会社 | ウェーハの接着方法 |
| US4837177A (en) * | 1987-12-28 | 1989-06-06 | Motorola Inc. | Method of making bipolar semiconductor device having a conductive recombination layer |
| US6635941B2 (en) * | 2001-03-21 | 2003-10-21 | Canon Kabushiki Kaisha | Structure of semiconductor device with improved reliability |
| TWI283906B (en) * | 2001-12-21 | 2007-07-11 | Esec Trading Sa | Pick-up tool for mounting semiconductor chips |
| AU2002307578A1 (en) | 2002-04-30 | 2003-12-02 | Agency For Science Technology And Research | A method of wafer/substrate bonding |
| US7259466B2 (en) | 2002-12-17 | 2007-08-21 | Finisar Corporation | Low temperature bonding of multilayer substrates |
| US7361593B2 (en) | 2002-12-17 | 2008-04-22 | Finisar Corporation | Methods of forming vias in multilayer substrates |
| FR2860178B1 (fr) * | 2003-09-30 | 2005-11-04 | Commissariat Energie Atomique | Procede de separation de plaques collees entre elles pour constituer une structure empilee. |
| US7650688B2 (en) | 2003-12-31 | 2010-01-26 | Chippac, Inc. | Bonding tool for mounting semiconductor chips |
| US7153759B2 (en) | 2004-04-20 | 2006-12-26 | Agency For Science Technology And Research | Method of fabricating microelectromechanical system structures |
| JP5136411B2 (ja) * | 2006-06-29 | 2013-02-06 | 株式会社ニコン | ウェハ接合装置 |
| KR20100108418A (ko) * | 2008-11-14 | 2010-10-06 | 도쿄엘렉트론가부시키가이샤 | 접합 장치 및 접합 방법 |
| US7927975B2 (en) | 2009-02-04 | 2011-04-19 | Micron Technology, Inc. | Semiconductor material manufacture |
| JP6501447B2 (ja) | 2013-03-26 | 2019-04-17 | 芝浦メカトロニクス株式会社 | 貼合装置および貼合基板の製造方法 |
| WO2015046243A1 (ja) | 2013-09-25 | 2015-04-02 | 芝浦メカトロニクス株式会社 | 吸着ステージ、貼合装置、および貼合基板の製造方法 |
| KR102274677B1 (ko) * | 2017-09-21 | 2021-07-08 | 에베 그룹 에. 탈너 게엠베하 | 기판을 접합하기 위한 장치 및 방법 |
-
1984
- 1984-12-20 JP JP26881384A patent/JPS61145839A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61145839A (ja) | 1986-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0560250B2 (OSRAM) | ||
| JP2873598B2 (ja) | 半導体ウエハ用真空チャック | |
| JPS6271215A (ja) | ウエハ接合装置 | |
| ATE261649T1 (de) | Nachgiebige zwischenschicht für einen halbleiterchip | |
| JPH0384919A (ja) | 半導体基板の接着方法及び接着装置 | |
| EP0926706A3 (en) | Substrate processing apparatus, substrate support apparatus, substrate processing method, and substrate manufacturing method | |
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| JPS6361143U (OSRAM) | ||
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |