JPH0559879B2 - - Google Patents
Info
- Publication number
- JPH0559879B2 JPH0559879B2 JP3466588A JP3466588A JPH0559879B2 JP H0559879 B2 JPH0559879 B2 JP H0559879B2 JP 3466588 A JP3466588 A JP 3466588A JP 3466588 A JP3466588 A JP 3466588A JP H0559879 B2 JPH0559879 B2 JP H0559879B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- compound semiconductor
- single crystal
- semiconductor single
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3466588A JPH01208396A (ja) | 1988-02-16 | 1988-02-16 | 化合物半導体単結晶の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3466588A JPH01208396A (ja) | 1988-02-16 | 1988-02-16 | 化合物半導体単結晶の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01208396A JPH01208396A (ja) | 1989-08-22 |
| JPH0559879B2 true JPH0559879B2 (enrdf_load_stackoverflow) | 1993-09-01 |
Family
ID=12420729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3466588A Granted JPH01208396A (ja) | 1988-02-16 | 1988-02-16 | 化合物半導体単結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01208396A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11371164B2 (en) | 2017-03-31 | 2022-06-28 | Jx Nippon Mining & Metals Corporation | Compound semiconductor and method for producing single crystal of compound semiconductor |
-
1988
- 1988-02-16 JP JP3466588A patent/JPH01208396A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01208396A (ja) | 1989-08-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4645560A (en) | Liquid encapsulation method for growing single semiconductor crystals | |
| US3173765A (en) | Method of making crystalline silicon semiconductor material | |
| Shinoyama et al. | Growth of dislocation-free undoped InP crystals | |
| US4944925A (en) | Apparatus for producing single crystals | |
| JP4060106B2 (ja) | 一方向凝固シリコンインゴット及びこの製造方法並びにシリコン板及び太陽電池用基板及びスパッタリング用ターゲット素材 | |
| US4299650A (en) | Minimization of strain in single crystals | |
| KR20050120707A (ko) | 단결정의 제조방법 | |
| US7361219B2 (en) | Method for producing silicon wafer and silicon wafer | |
| JPH0559879B2 (enrdf_load_stackoverflow) | ||
| EP0355833B1 (en) | Method of producing compound semiconductor single crystal | |
| JP2700145B2 (ja) | 化合物半導体単結晶の製造方法 | |
| JPH01290587A (ja) | 化合物半導体単結晶の製造方法 | |
| JPS606918B2 (ja) | 3−5族化合物単結晶の製造方法 | |
| JPH01188500A (ja) | 化合物半導体単結晶の製造方法 | |
| Dutta et al. | Bulk growth of GaSb and Ga 1-x In x Sb | |
| JPH01188495A (ja) | 化合物半導体単結晶の製造方法 | |
| JP2733898B2 (ja) | 化合物半導体単結晶の製造方法 | |
| WO2005007939A1 (en) | InP SINGLE CRYSTAL, GaAs SINGLE CRYSTAL, AND METHOD FOR PRODUCTION THEREOF | |
| JPH0341432B2 (enrdf_load_stackoverflow) | ||
| JPH03174390A (ja) | 単結晶の製造装置 | |
| JPH08104591A (ja) | 単結晶成長装置 | |
| JPS63319286A (ja) | 単結晶の成長方法 | |
| JP2005047797A (ja) | InP単結晶、GaAs単結晶、及びそれらの製造方法 | |
| JP2773441B2 (ja) | GaAs単結晶の製造方法 | |
| JPH07206589A (ja) | 化合物半導体単結晶の製造方法 |