JPH0559593B2 - - Google Patents
Info
- Publication number
- JPH0559593B2 JPH0559593B2 JP58195657A JP19565783A JPH0559593B2 JP H0559593 B2 JPH0559593 B2 JP H0559593B2 JP 58195657 A JP58195657 A JP 58195657A JP 19565783 A JP19565783 A JP 19565783A JP H0559593 B2 JPH0559593 B2 JP H0559593B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gaas
- stripe
- semiconductor laser
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195657A JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195657A JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6086888A JPS6086888A (ja) | 1985-05-16 |
| JPH0559593B2 true JPH0559593B2 (cs) | 1993-08-31 |
Family
ID=16344817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58195657A Granted JPS6086888A (ja) | 1983-10-19 | 1983-10-19 | 半導体レ−ザ装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6086888A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2687668B2 (ja) * | 1990-04-17 | 1997-12-08 | 日本電気株式会社 | 高出力半導体レーザ素子及びその製造方法 |
-
1983
- 1983-10-19 JP JP58195657A patent/JPS6086888A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6086888A (ja) | 1985-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2831667B2 (ja) | 半導体レーザ装置及びその製造方法 | |
| US4932033A (en) | Semiconductor laser having a lateral p-n junction utilizing inclined surface and method of manufacturing same | |
| JPH0646669B2 (ja) | 半導体レ−ザ及びその製造方法 | |
| GB2046983A (en) | Semiconductor lasers | |
| JPH07162086A (ja) | 半導体レーザの製造方法 | |
| JP2001057459A (ja) | 半導体レーザ | |
| JPH0559593B2 (cs) | ||
| JP2001077465A (ja) | 半導体レーザ及びその製造方法 | |
| JPH0559594B2 (cs) | ||
| JPH0846283A (ja) | 半導体レーザの製造方法 | |
| JPH0430758B2 (cs) | ||
| JPH0648742B2 (ja) | 半導体レ−ザの製造方法 | |
| JPS6362292A (ja) | 半導体レ−ザ装置およびその製造方法 | |
| JPS6352479B2 (cs) | ||
| US4358850A (en) | Terraced substrate semiconductor laser | |
| JPS60137088A (ja) | 半導体レ−ザ装置 | |
| JPH03104292A (ja) | 半導体レーザ | |
| JPH01162397A (ja) | 半導体レーザ素子 | |
| JPH0414277A (ja) | 半導体レーザ装置及びその製造方法 | |
| JPS61139082A (ja) | 半導体発光装置 | |
| JPS621290A (ja) | ヘテロ接合型半導体レ−ザ | |
| JP2586826B2 (ja) | AlGaInP系半導体レーザとその製法 | |
| JP2538613B2 (ja) | 半導体レ―ザ及びその製造方法 | |
| JPH0370391B2 (cs) | ||
| JPH0766992B2 (ja) | AlGaInP系半導体レーザとその製造方法 |