JPH0557730B2 - - Google Patents

Info

Publication number
JPH0557730B2
JPH0557730B2 JP1242600A JP24260089A JPH0557730B2 JP H0557730 B2 JPH0557730 B2 JP H0557730B2 JP 1242600 A JP1242600 A JP 1242600A JP 24260089 A JP24260089 A JP 24260089A JP H0557730 B2 JPH0557730 B2 JP H0557730B2
Authority
JP
Japan
Prior art keywords
resist pattern
forming
insulating film
lower resist
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1242600A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02168612A (ja
Inventor
Naoki Kitano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP1242600A priority Critical patent/JPH02168612A/ja
Publication of JPH02168612A publication Critical patent/JPH02168612A/ja
Publication of JPH0557730B2 publication Critical patent/JPH0557730B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1242600A 1988-09-19 1989-09-19 半導体装置の製造方法 Granted JPH02168612A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1242600A JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63-234521 1988-09-19
JP23452188 1988-09-19
JP1242600A JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPH02168612A JPH02168612A (ja) 1990-06-28
JPH0557730B2 true JPH0557730B2 (cg-RX-API-DMAC7.html) 1993-08-24

Family

ID=16972328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1242600A Granted JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPH02168612A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5535147B2 (ja) * 2011-08-03 2014-07-02 株式会社ジャパンディスプレイ 表示装置及び表示装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935446A (ja) * 1982-08-23 1984-02-27 Seiko Epson Corp 半導体装置の製造方法
JPS62133722A (ja) * 1985-12-05 1987-06-16 Ricoh Co Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPH02168612A (ja) 1990-06-28

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