JPH0556654B2 - - Google Patents

Info

Publication number
JPH0556654B2
JPH0556654B2 JP60068384A JP6838485A JPH0556654B2 JP H0556654 B2 JPH0556654 B2 JP H0556654B2 JP 60068384 A JP60068384 A JP 60068384A JP 6838485 A JP6838485 A JP 6838485A JP H0556654 B2 JPH0556654 B2 JP H0556654B2
Authority
JP
Japan
Prior art keywords
wafer
alignment
pattern
rollers
aligned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60068384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61228644A (ja
Inventor
Yoshiji Namiki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP60068384A priority Critical patent/JPS61228644A/ja
Publication of JPS61228644A publication Critical patent/JPS61228644A/ja
Publication of JPH0556654B2 publication Critical patent/JPH0556654B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60068384A 1985-04-02 1985-04-02 ウエハのアライメント装置 Granted JPS61228644A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60068384A JPS61228644A (ja) 1985-04-02 1985-04-02 ウエハのアライメント装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60068384A JPS61228644A (ja) 1985-04-02 1985-04-02 ウエハのアライメント装置

Publications (2)

Publication Number Publication Date
JPS61228644A JPS61228644A (ja) 1986-10-11
JPH0556654B2 true JPH0556654B2 (enrdf_load_stackoverflow) 1993-08-20

Family

ID=13372173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60068384A Granted JPS61228644A (ja) 1985-04-02 1985-04-02 ウエハのアライメント装置

Country Status (1)

Country Link
JP (1) JPS61228644A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS61228644A (ja) 1986-10-11

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