JPH0555600B2 - - Google Patents

Info

Publication number
JPH0555600B2
JPH0555600B2 JP61022044A JP2204486A JPH0555600B2 JP H0555600 B2 JPH0555600 B2 JP H0555600B2 JP 61022044 A JP61022044 A JP 61022044A JP 2204486 A JP2204486 A JP 2204486A JP H0555600 B2 JPH0555600 B2 JP H0555600B2
Authority
JP
Japan
Prior art keywords
substrate
organometallic compound
metal
temperature
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61022044A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62182279A (ja
Inventor
Masahiro Futaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP2204486A priority Critical patent/JPS62182279A/ja
Publication of JPS62182279A publication Critical patent/JPS62182279A/ja
Publication of JPH0555600B2 publication Critical patent/JPH0555600B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1233—Organic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemically Coating (AREA)
JP2204486A 1986-02-05 1986-02-05 無機質被膜の形成方法とそのための溶液 Granted JPS62182279A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2204486A JPS62182279A (ja) 1986-02-05 1986-02-05 無機質被膜の形成方法とそのための溶液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2204486A JPS62182279A (ja) 1986-02-05 1986-02-05 無機質被膜の形成方法とそのための溶液

Publications (2)

Publication Number Publication Date
JPS62182279A JPS62182279A (ja) 1987-08-10
JPH0555600B2 true JPH0555600B2 (enrdf_load_stackoverflow) 1993-08-17

Family

ID=12071935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2204486A Granted JPS62182279A (ja) 1986-02-05 1986-02-05 無機質被膜の形成方法とそのための溶液

Country Status (1)

Country Link
JP (1) JPS62182279A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190309422A1 (en) * 2018-04-06 2019-10-10 Versum Materials Us, Llc Spin-On Metallization
JP2021024846A (ja) * 2019-08-09 2021-02-22 株式会社高純度化学研究所 ビス（エチルシクロペンタジエニル）スズ
JP2021025121A (ja) * 2019-08-09 2021-02-22 株式会社高純度化学研究所 化学蒸着用原料、スズを含有する薄膜の製造方法、およびスズ酸化物薄膜の製造方法
WO2021029215A1 (ja) * 2019-08-09 2021-02-18 株式会社高純度化学研究所 ビス（エチルシクロペンタジエニル）スズ、化学蒸着用原料、スズを含有する薄膜の製造方法、およびスズ酸化物薄膜の製造方法
CN114630834A (zh) * 2019-08-29 2022-06-14 海星化学有限公司 用于沉积高纯度氧化锡的有机金属化合物和干法蚀刻所述氧化锡薄膜和沉积反应器

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5819746B2 (ja) * 1978-03-31 1983-04-19 昭栄化学工業株式会社 ルテニウム皮膜を形成する方法
JPS5524923A (en) * 1978-08-08 1980-02-22 Teijin Ltd Manufacture of transparent titanium oxide film
DE2941896A1 (de) * 1979-10-17 1981-04-30 Ruhrchemie Ag, 4200 Oberhausen Verfahren zur herstellung von haftfaehigen schichten auf polyolefinen
JPH0235029B2 (ja) * 1980-11-04 1990-08-08 Seiko Epson Corp Seimitsushudobuhin
JPS5948865B2 (ja) * 1981-09-21 1984-11-29 科学技術庁無機材質研究所長 金属表面の多色着色法
JPS58141389A (ja) * 1982-02-16 1983-08-22 Kamaya Kagaku Kogyo Kk 加飾方法
JPS60217619A (ja) * 1984-04-12 1985-10-31 Yaskawa Electric Mfg Co Ltd 硬質磁性膜の製造方法
JPS60243279A (ja) * 1984-05-14 1985-12-03 Alps Electric Co Ltd 透明電極形成方法

Also Published As

Publication number Publication date
JPS62182279A (ja) 1987-08-10

Similar Documents

Publication Publication Date Title
US4252841A (en) Process for producing transparent conductive film
AU2018312837B2 (en) Method for producing a film of light-absorbing material with a perovskite-like structure
JPH0555600B2 (enrdf_load_stackoverflow)
JP2021510924A (ja) ペロブスカイト様構造を有する光吸収フィルムを製造するための方法
JPS62114205A (ja) 厚膜電気部品の製造方法
JPH064497B2 (ja) 酸化錫膜の形成方法
JP4377003B2 (ja) 透明導電膜のシート抵抗値の調整方法及び透明導電膜の形成方法
JP4522566B2 (ja) 透明導電膜のシート抵抗値の調整方法
EP0316452B1 (en) Process for preparing thin film of base metal and application of the same
US3402067A (en) Method for depositing aluminum film
JPH0593915A (ja) パターン形成方法
JP4495798B2 (ja) 透明導電膜の形成方法
JPS5930723A (ja) 透明錫酸化膜の製造法
JPS6222312A (ja) 透明導電性被膜の形成方法
JPH0699809B2 (ja) 硫化物薄膜の形成方法
JPH01188679A (ja) 金属基体の表面処理方法
JPH0467285B2 (enrdf_load_stackoverflow)
JPS639327B2 (enrdf_load_stackoverflow)
JPH0193004A (ja) 透明導電性ガラス基板およびその製造方法
JP2752968B2 (ja) シリカ系被膜の形成法
JPH05217814A (ja) 積層膜の製造方法
JPH0572685B2 (enrdf_load_stackoverflow)
JPS62267476A (ja) 透明導電性被膜形成組成物
JPS58110427A (ja) 透明錫酸化膜の製造法
JPS60243279A (ja) 透明電極形成方法