JPH05505909A - シリコンのエアゾール蒸着および膜の形成 - Google Patents

シリコンのエアゾール蒸着および膜の形成

Info

Publication number
JPH05505909A
JPH05505909A JP91514827A JP51482791A JPH05505909A JP H05505909 A JPH05505909 A JP H05505909A JP 91514827 A JP91514827 A JP 91514827A JP 51482791 A JP51482791 A JP 51482791A JP H05505909 A JPH05505909 A JP H05505909A
Authority
JP
Japan
Prior art keywords
silicon
substrate
powder
film
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP91514827A
Other languages
English (en)
Japanese (ja)
Inventor
ホーク，ロジヤー　エム
ガデパリー，カメツシユ　ブイ
Original Assignee
ザ　ボード　オブ　トラステイーズ　オブ　ザ　ユニバーシテイ　オブ　アーカンソー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ザ　ボード　オブ　トラステイーズ　オブ　ザ　ユニバーシテイ　オブ　アーカンソー filed Critical ザ　ボード　オブ　トラステイーズ　オブ　ザ　ユニバーシテイ　オブ　アーカンソー
Publication of JPH05505909A publication Critical patent/JPH05505909A/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/03—Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying
    • B05B5/032—Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying for spraying particulate materials
    • H10P14/22—
    • H10P14/2905—
    • H10P14/2921—
    • H10P14/2923—
    • H10P14/3411—
    • H10P14/36—

Landscapes

  • Silicon Compounds (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP91514827A 1990-11-09 1991-07-23 シリコンのエアゾール蒸着および膜の形成 Pending JPH05505909A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/611,428 US5075257A (en) 1990-11-09 1990-11-09 Aerosol deposition and film formation of silicon
US611,428 1990-11-09
PCT/US1991/005063 WO1992009100A1 (en) 1990-11-09 1991-07-23 Aerosol deposition and film formation of silicon

Publications (1)

Publication Number Publication Date
JPH05505909A true JPH05505909A (ja) 1993-08-26

Family

ID=24448980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP91514827A Pending JPH05505909A (ja) 1990-11-09 1991-07-23 シリコンのエアゾール蒸着および膜の形成

Country Status (5)

Country Link
US (1) US5075257A (OSRAM)
EP (1) EP0510128A1 (OSRAM)
JP (1) JPH05505909A (OSRAM)
AU (1) AU654671B2 (OSRAM)
WO (1) WO1992009100A1 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016501705A (ja) * 2012-11-27 2016-01-21 ラミナー カンパニー，リミテッド 混合用反応装置およびこの反応装置を用いた製造方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4220472C2 (de) * 1992-03-05 2002-08-22 Industrieanlagen Betriebsges Verfahren zur Herstellung von Leichtbaureflektoren mittels Silicium-Wafern
US5565052A (en) * 1992-03-05 1996-10-15 Industrieanlagen-Betriebsgesellschaft Gmbh Method for the production of a reflector
US5320864A (en) * 1992-06-29 1994-06-14 Lsi Logic Corporation Sedimentary deposition of photoresist on semiconductor wafers
US5330883A (en) * 1992-06-29 1994-07-19 Lsi Logic Corporation Techniques for uniformizing photoresist thickness and critical dimension of underlying features
US5559057A (en) * 1994-03-24 1996-09-24 Starfire Electgronic Development & Marketing Ltd. Method for depositing and patterning thin films formed by fusing nanocrystalline precursors
US5576248A (en) * 1994-03-24 1996-11-19 Starfire Electronic Development & Marketing, Ltd. Group IV semiconductor thin films formed at low temperature using nanocrystal precursors
US5518546A (en) * 1994-10-05 1996-05-21 Enexus Corporation Apparatus for coating substrates with inductively charged resinous powder particles
US6127289A (en) * 1997-09-05 2000-10-03 Lucent Technologies, Inc. Method for treating semiconductor wafers with corona charge and devices using corona charging
JP2963993B1 (ja) * 1998-07-24 1999-10-18 工業技術院長 超微粒子成膜法
US6746539B2 (en) 2001-01-30 2004-06-08 Msp Corporation Scanning deposition head for depositing particles on a wafer
US6827969B1 (en) 2003-12-12 2004-12-07 General Electric Company Field repairable high temperature smooth wear coating
KR20060057826A (ko) * 2004-11-24 2006-05-29 삼성전자주식회사 나노입자를 제조하기 위한 방법 및 장치
JP2010530032A (ja) * 2007-06-15 2010-09-02 ナノグラム・コーポレイション 反応流による無機箔体の析出および合成法
DE102010005375A1 (de) * 2010-01-22 2011-07-28 MTU Aero Engines GmbH, 80995 Vorrichtung und Verfahren zum Pulverspritzen mit erhöhter Gasstromgeschwindigkeit
EP2530723A3 (en) 2011-06-03 2014-01-15 Sony Corporation Photovoltaic device comprising silicon microparticles
WO2019125933A1 (en) * 2017-12-19 2019-06-27 Applied Materials, Inc. Method and precursor selection for flowable silicon dioxide gap fill for advanced memory application
US11764057B2 (en) 2021-05-24 2023-09-19 Che Inc. Method of forming structure having coating layer and structure having coating layer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793049A (en) * 1969-06-16 1974-02-19 R Probst Electrostatic coating method
US4003770A (en) * 1975-03-24 1977-01-18 Monsanto Research Corporation Plasma spraying process for preparing polycrystalline solar cells
US4040849A (en) * 1976-01-06 1977-08-09 General Electric Company Polycrystalline silicon articles by sintering
FR2401696A1 (fr) * 1977-08-31 1979-03-30 Ugine Kuhlmann Methode de depot de silicium cristallin en films minces sur substrats graphites
DE2941908C2 (de) * 1979-10-17 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer eine Silizium-Schicht aufweisenden Solarzelle
US4440800A (en) * 1980-04-24 1984-04-03 Unisearch Limited Vapor coating of powders
DE3019653A1 (de) * 1980-05-22 1981-11-26 SIEMENS AG AAAAA, 1000 Berlin und 8000 München Verbesserung eines verfahres zur herstellung von platten-, band- oder folienfoermigen siliziumkristallkoerpern fuer solarzellen
US4332838A (en) * 1980-09-24 1982-06-01 Wegrzyn James E Particulate thin film fabrication process
DE3446286A1 (de) * 1984-12-19 1986-06-19 Sigri GmbH, 8901 Meitingen Verfahren zum beschichten von kohlenstoff- und graphitkoerpern
JPH0675692B2 (ja) * 1985-05-16 1994-09-28 小野田セメント株式会社 静電粉体塗装方法及塗装装置
US4615903A (en) * 1985-07-01 1986-10-07 The United States Of America As Represented By The Secretary Of The Navy Method for melt-coating a surface
US4779564A (en) * 1986-06-09 1988-10-25 Morton Thiokol, Inc. Apparatus for electrostatic powder spray coating and resulting coated product
US4865252A (en) * 1988-05-11 1989-09-12 The Perkin-Elmer Corporation High velocity powder thermal spray gun and method
US5056720A (en) * 1990-09-19 1991-10-15 Nordson Corporation Electrostatic spray gun

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016501705A (ja) * 2012-11-27 2016-01-21 ラミナー カンパニー，リミテッド 混合用反応装置およびこの反応装置を用いた製造方法

Also Published As

Publication number Publication date
WO1992009100A1 (en) 1992-05-29
EP0510128A4 (OSRAM) 1994-04-06
US5075257A (en) 1991-12-24
AU654671B2 (en) 1994-11-17
AU8437691A (en) 1992-06-11
EP0510128A1 (en) 1992-10-28

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