JPH05503994A - 結晶方位を有する運動センサ及びその製造方法 - Google Patents

結晶方位を有する運動センサ及びその製造方法

Info

Publication number
JPH05503994A
JPH05503994A JP3502377A JP50237791A JPH05503994A JP H05503994 A JPH05503994 A JP H05503994A JP 3502377 A JP3502377 A JP 3502377A JP 50237791 A JP50237791 A JP 50237791A JP H05503994 A JPH05503994 A JP H05503994A
Authority
JP
Japan
Prior art keywords
paddle
layer
silicon
etching
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3502377A
Other languages
English (en)
Japanese (ja)
Inventor
マレク，イーリ
ヴァルト，マルティン
フィントラー，ギュンター
トラー，ハンス―ペーター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of JPH05503994A publication Critical patent/JPH05503994A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C9/00—Measuring inclination, e.g. by clinometers, by levels
    • G01C9/02—Details
    • G01C9/06—Electric or photoelectric indication or reading means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H11/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties
    • G01H11/06—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0817—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for pivoting movement of the mass, e.g. in-plane pendulum

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Pressure Sensors (AREA)
  • Weting (AREA)
JP3502377A 1990-02-06 1991-01-22 結晶方位を有する運動センサ及びその製造方法 Pending JPH05503994A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19904003473 DE4003473A1 (de) 1990-02-06 1990-02-06 Kristallorientierter bewegungssensor und verfahren zu dessen herstellung

Publications (1)

Publication Number Publication Date
JPH05503994A true JPH05503994A (ja) 1993-06-24

Family

ID=6399525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3502377A Pending JPH05503994A (ja) 1990-02-06 1991-01-22 結晶方位を有する運動センサ及びその製造方法

Country Status (4)

Country Link
EP (1) EP0514395A1 (enrdf_load_stackoverflow)
JP (1) JPH05503994A (enrdf_load_stackoverflow)
DE (1) DE4003473A1 (enrdf_load_stackoverflow)
WO (1) WO1991012497A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133479A (ja) * 2000-09-21 2001-05-18 Mitsubishi Electric Corp 慣性力センサおよびその製造方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6903084B2 (en) 1991-08-28 2005-06-07 Sterix Limited Steroid sulphatase inhibitors
JP3367113B2 (ja) 1992-04-27 2003-01-14 株式会社デンソー 加速度センサ
DE4226430C2 (de) * 1992-08-10 1996-02-22 Karlsruhe Forschzent Kapazitiver Beschleunigungssensor
JPH06249693A (ja) * 1993-02-25 1994-09-09 Robert Bosch Gmbh 質量流量センサおよびその製造方法
DE4318466B4 (de) * 1993-06-03 2004-12-09 Robert Bosch Gmbh Verfahren zur Herstellung eines mikromechanischen Sensors
US5616514A (en) * 1993-06-03 1997-04-01 Robert Bosch Gmbh Method of fabricating a micromechanical sensor
DE4406342C1 (de) * 1994-02-26 1995-03-09 Kernforschungsz Karlsruhe Sensor und Verfahren zu dessen Herstellung
DE4421337A1 (de) * 1994-06-17 1995-12-21 Telefunken Microelectron Ätzverfahren zur Herstellung von quasiplanaren, freitragenden Strukturen in Silizium
DE19547642A1 (de) * 1994-12-20 1996-06-27 Zexel Corp Beschleunigungssensor und Verfahren zu dessen Herstellung
SE9500729L (sv) * 1995-02-27 1996-08-28 Gert Andersson Anordning för mätning av vinkelhastighet i enkristallint material samt förfarande för framställning av sådan
US7335650B2 (en) 2000-01-14 2008-02-26 Sterix Limited Composition
WO2004068591A1 (ja) * 2003-01-29 2004-08-12 Mitsubishi Denki Kabushiki Kaisha 半導体装置の製造方法及び加速度センサ
JP4752078B2 (ja) * 2009-09-17 2011-08-17 株式会社デンソー 半導体力学量センサ
JP6866624B2 (ja) * 2016-12-07 2021-04-28 セイコーエプソン株式会社 物理量センサー、物理量センサーデバイス、電子機器および移動体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938621A (ja) * 1982-08-27 1984-03-02 Nissan Motor Co Ltd 振動分析装置
FR2558263B1 (fr) * 1984-01-12 1986-04-25 Commissariat Energie Atomique Accelerometre directif et son procede de fabrication par microlithographie
JPH0821722B2 (ja) * 1985-10-08 1996-03-04 日本電装株式会社 半導体振動・加速度検出装置
DE3703793A1 (de) * 1987-02-07 1988-08-18 Messerschmitt Boelkow Blohm Detektorelement
DE3814952A1 (de) * 1988-05-03 1989-11-23 Bosch Gmbh Robert Sensor
US4882933A (en) * 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping
DE3927163A1 (de) * 1989-08-17 1991-02-21 Bosch Gmbh Robert Verfahren zur strukturierung eines halbleiterkoerpers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133479A (ja) * 2000-09-21 2001-05-18 Mitsubishi Electric Corp 慣性力センサおよびその製造方法

Also Published As

Publication number Publication date
WO1991012497A1 (de) 1991-08-22
DE4003473A1 (de) 1991-08-08
EP0514395A1 (de) 1992-11-25
DE4003473C2 (enrdf_load_stackoverflow) 1991-11-14

Similar Documents

Publication Publication Date Title
JP3493068B2 (ja) 結晶性材料からなる加速度センサおよびこの加速度センサの製造方法
JPH05503994A (ja) 結晶方位を有する運動センサ及びその製造方法
EP0102069B1 (en) Vibration analyzing device
US3893228A (en) Silicon pressure sensor
US4553436A (en) Silicon accelerometer
EP0049344B1 (en) Capacitive pressure transducers and methods of fabricating them
JP3149196B2 (ja) 振動又は加速度測定センサ
US4783237A (en) Solid state transducer and method of making same
US4144636A (en) Method for manufacture of a moisture sensor
US6076404A (en) Micromechanical sensor including a single-crystal silicon support
USRE41213E1 (en) Dynamic amount sensor and process for the production thereof
EP0772045B1 (en) All-silicon monolithic motion sensor with integrated conditioning circuit
US4050049A (en) Solid state force transducer, support and method of making same
KR840007315A (ko) 압력감지소자(壓力感知素子)를 가진 반도체 장치와 그 제조법
JPS62174978A (ja) 半導体振動・加速度検出装置
JPH07209330A (ja) 静電容量型加速度センサ及びその製造方法
US5840597A (en) Method of making a semiconductor device force and/or acceleration sensor
JP3616659B2 (ja) マイクロメカニックセンサおよびその製造方法
US5172205A (en) Piezoresistive semiconductor device suitable for use in a pressure sensor
JPH0794760A (ja) 過負荷安全装置を有するマイクロメカニカルセンサの製造方法およびこの種のセンサ
KR920008983A (ko) 반도체 압력센서 및 그 제조방법
KR100904994B1 (ko) 압력센서 제조방법 및 그 구조
US3969749A (en) Substrate for dielectric isolated integrated circuit with V-etched depth grooves for lapping guide
JP2000155030A (ja) 角速度センサの製造方法
JPH0472190B2 (enrdf_load_stackoverflow)