JPH0547628B2 - - Google Patents
Info
- Publication number
- JPH0547628B2 JPH0547628B2 JP27809389A JP27809389A JPH0547628B2 JP H0547628 B2 JPH0547628 B2 JP H0547628B2 JP 27809389 A JP27809389 A JP 27809389A JP 27809389 A JP27809389 A JP 27809389A JP H0547628 B2 JPH0547628 B2 JP H0547628B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- thin film
- rotating shaft
- substrate
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 17
- 239000010408 film Substances 0.000 claims 1
- 238000000608 laser ablation Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000013076 target substance Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27809389A JPH03138356A (ja) | 1989-10-24 | 1989-10-24 | 薄膜作成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27809389A JPH03138356A (ja) | 1989-10-24 | 1989-10-24 | 薄膜作成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03138356A JPH03138356A (ja) | 1991-06-12 |
JPH0547628B2 true JPH0547628B2 (enrdf_load_stackoverflow) | 1993-07-19 |
Family
ID=17592539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27809389A Granted JPH03138356A (ja) | 1989-10-24 | 1989-10-24 | 薄膜作成装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03138356A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106574357A (zh) * | 2014-07-15 | 2017-04-19 | 埃西勒国际通用光学公司 | 一种用于在多个基底的表面上物理气相沉积材料层的方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100581852B1 (ko) * | 2002-06-12 | 2006-05-22 | 삼성에스디아이 주식회사 | 박막 증착장치 및 이를 이용한 박막 증착방법 |
-
1989
- 1989-10-24 JP JP27809389A patent/JPH03138356A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106574357A (zh) * | 2014-07-15 | 2017-04-19 | 埃西勒国际通用光学公司 | 一种用于在多个基底的表面上物理气相沉积材料层的方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH03138356A (ja) | 1991-06-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5084300A (en) | Apparatus for the ablation of material from a target and coating method and apparatus | |
JPH03104861A (ja) | レーザアブレーションに使用するための装置 | |
US5468930A (en) | Laser sputtering apparatus | |
JPH0547628B2 (enrdf_load_stackoverflow) | ||
Blank et al. | High Tc thin films prepared by laser ablation: material distribution and droplet problem | |
JP2001108832A5 (enrdf_load_stackoverflow) | ||
US3656453A (en) | Specimen positioning | |
RU2373303C1 (ru) | Способ получения наночастиц металла на поверхности подложки | |
JP2756309B2 (ja) | レーザーpvd装置 | |
CA2016354A1 (en) | Method of fabricating oxide superconducting film | |
JP2905589B2 (ja) | 成膜装置 | |
JPH02311307A (ja) | 超伝導物質薄膜製造方法 | |
JPH08306978A (ja) | 酸化物薄膜の製造方法および装置 | |
JP3080096B2 (ja) | 大面積薄膜の作製方法 | |
Jackson et al. | Design of an elegant and inexpensive multiple target holder and laser beam scanner for use in laser-ablation deposition of thin films | |
JPH05139735A (ja) | レーザアブレーシヨン法による薄膜形成装置 | |
JP2890686B2 (ja) | レーザ・スパッタリング装置 | |
JPS6148566A (ja) | 電子ビ−ム蒸着装置 | |
JPH04141580A (ja) | レーザーフラッシュ蒸着装置 | |
JPS62149870A (ja) | 蒸着装置 | |
JPH05279848A (ja) | レーザアブレーションによる薄膜形成方法 | |
JPH02294472A (ja) | 真空蒸着装置 | |
JPH03146658A (ja) | 薄膜作成装置 | |
JPH01208455A (ja) | レーザ真空蒸着装置 | |
JPH0734222A (ja) | 薄板部材端部への薄膜の成膜方法およびその成膜装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |