JPH054326B2 - - Google Patents
Info
- Publication number
- JPH054326B2 JPH054326B2 JP1015472A JP1547289A JPH054326B2 JP H054326 B2 JPH054326 B2 JP H054326B2 JP 1015472 A JP1015472 A JP 1015472A JP 1547289 A JP1547289 A JP 1547289A JP H054326 B2 JPH054326 B2 JP H054326B2
- Authority
- JP
- Japan
- Prior art keywords
- silica
- temperature
- sol
- weight
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 86
- 239000000377 silicon dioxide Substances 0.000 claims description 39
- 238000004519 manufacturing process Methods 0.000 claims description 17
- -1 silicate ester Chemical class 0.000 claims description 12
- 238000003980 solgel method Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000003350 kerosene Substances 0.000 description 9
- 239000000839 emulsion Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000000741 silica gel Substances 0.000 description 8
- 229910002027 silica gel Inorganic materials 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical group CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 7
- 230000032683 aging Effects 0.000 description 6
- 230000002209 hydrophobic effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 5
- 229920000053 polysorbate 80 Polymers 0.000 description 5
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000000244 polyoxyethylene sorbitan monooleate Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 235000011069 sorbitan monooleate Nutrition 0.000 description 4
- 239000001593 sorbitan monooleate Substances 0.000 description 4
- 229940035049 sorbitan monooleate Drugs 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000004945 emulsification Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000011240 wet gel Substances 0.000 description 2
- NWGKJDSIEKMTRX-AAZCQSIUSA-N Sorbitan monooleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O NWGKJDSIEKMTRX-AAZCQSIUSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000010198 maturation time Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
- C01B33/163—Preparation of silica xerogels by hydrolysis of organosilicon compounds, e.g. ethyl orthosilicate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1015472A JPH02196015A (ja) | 1989-01-25 | 1989-01-25 | シリカの製造方法 |
| US07/469,314 US5011669A (en) | 1989-01-25 | 1990-01-24 | Process for producing a rod-form silica |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1015472A JPH02196015A (ja) | 1989-01-25 | 1989-01-25 | シリカの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02196015A JPH02196015A (ja) | 1990-08-02 |
| JPH054326B2 true JPH054326B2 (enExample) | 1993-01-19 |
Family
ID=11889744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1015472A Granted JPH02196015A (ja) | 1989-01-25 | 1989-01-25 | シリカの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US5011669A (enExample) |
| JP (1) | JPH02196015A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1266660B1 (it) * | 1993-11-04 | 1997-01-09 | Eniricerche Spa | Procedimento per la preparazione di xerogels di silice porosi in forma sferica |
| CA2179645C (en) * | 1993-12-21 | 2004-05-18 | Seiichiro Tanaka | Ultrafine reactive silica particles, suspension containing the same, and hard coating composition |
| JPH08188409A (ja) * | 1994-11-08 | 1996-07-23 | Showa Denko Kk | シリカ製細管およびその製造方法 |
| JP3586912B2 (ja) * | 1995-02-06 | 2004-11-10 | 三菱レイヨン株式会社 | コーティング液及びその製造方法 |
| EP1061050A1 (en) * | 1999-06-17 | 2000-12-20 | Lucent Technologies Inc. | Process for fabricating an article via sol-gel processing |
| JP2001080967A (ja) * | 1999-09-06 | 2001-03-27 | Sumitomo Electric Ind Ltd | Ｓｉ３Ｎ４セラミックスとその製造用Ｓｉ基組成物及びこれらの製造方法 |
| US6571582B2 (en) * | 2001-04-19 | 2003-06-03 | Fitel Usa Corp. | Manufacture of silica bodies using sol-gel techniques |
| JP4160348B2 (ja) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | シリカ、及びシリカの製造方法 |
| JP4160350B2 (ja) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | シリカ、及びシリカの製造方法 |
| JP4160347B2 (ja) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | シリカ、及びシリカの製造方法 |
| JP4160349B2 (ja) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | シリカヒドロゲル及びシリカ、並びにシリカヒドロゲルの製造方法 |
| US20060239943A1 (en) * | 2005-04-21 | 2006-10-26 | Tomasi Nestor S | Formula and method for providing protection from dermatitis, sunlight and/or insects |
| CN102164853B (zh) * | 2008-09-26 | 2014-12-31 | 扶桑化学工业株式会社 | 含有具有弯曲结构和/或分支结构的二氧化硅二次颗粒的胶体二氧化硅及其制造方法 |
| US8197782B2 (en) * | 2010-02-08 | 2012-06-12 | Momentive Performance Materials | Method for making high purity metal oxide particles and materials made thereof |
| US9249028B2 (en) | 2010-02-08 | 2016-02-02 | Momentive Performance Materials Inc. | Method for making high purity metal oxide particles and materials made thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926911A (ja) * | 1982-08-04 | 1984-02-13 | Toyo Soda Mfg Co Ltd | 球状多孔性シリカゲルおよびその製造法 |
| US4594330A (en) * | 1984-03-22 | 1986-06-10 | Mitsubishi Gas Chemical Company, Inc. | Fine amorphous powder and process for preparing fine powdery mixture of silicon nitride and silicon carbide |
| JPS6385012A (ja) * | 1986-09-29 | 1988-04-15 | Chisso Corp | 珪酸質球状粒子の製造方法 |
| JP2533563B2 (ja) * | 1987-09-10 | 1996-09-11 | 三菱化学株式会社 | ゲル状シリカ粒子の製造方法 |
| JPH03291807A (ja) * | 1990-04-09 | 1991-12-24 | Sumitomo Bakelite Co Ltd | 異方導電ペースト |
-
1989
- 1989-01-25 JP JP1015472A patent/JPH02196015A/ja active Granted
-
1990
- 1990-01-24 US US07/469,314 patent/US5011669A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02196015A (ja) | 1990-08-02 |
| US5011669A (en) | 1991-04-30 |
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