JPH0542507B2 - - Google Patents
Info
- Publication number
- JPH0542507B2 JPH0542507B2 JP18951585A JP18951585A JPH0542507B2 JP H0542507 B2 JPH0542507 B2 JP H0542507B2 JP 18951585 A JP18951585 A JP 18951585A JP 18951585 A JP18951585 A JP 18951585A JP H0542507 B2 JPH0542507 B2 JP H0542507B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- vacuum
- sputtering
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 70
- 238000012545 processing Methods 0.000 claims description 42
- 238000004544 sputter deposition Methods 0.000 claims description 33
- 238000005530 etching Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 12
- 239000010408 film Substances 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000000605 extraction Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 238000000992 sputter etching Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18951585A JPS6250463A (ja) | 1985-08-30 | 1985-08-30 | 連続スパツタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18951585A JPS6250463A (ja) | 1985-08-30 | 1985-08-30 | 連続スパツタ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6250463A JPS6250463A (ja) | 1987-03-05 |
| JPH0542507B2 true JPH0542507B2 (xx) | 1993-06-28 |
Family
ID=16242569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18951585A Granted JPS6250463A (ja) | 1985-08-30 | 1985-08-30 | 連続スパツタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6250463A (xx) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150053430A (ko) * | 2013-11-08 | 2015-05-18 | 삼성중공업 주식회사 | 선박용 에어스포일러 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2626782B2 (ja) * | 1988-01-29 | 1997-07-02 | アネルバ株式会社 | 真空処理装置 |
| JP2566308B2 (ja) * | 1989-01-12 | 1996-12-25 | 東京エレクトロン株式会社 | ロードロック装置を備えた処理装置 |
| JP2644912B2 (ja) * | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | 真空処理装置及びその運転方法 |
| USRE39824E1 (en) | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors |
| US7089680B1 (en) | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
| USRE39756E1 (en) | 1990-08-29 | 2007-08-07 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
-
1985
- 1985-08-30 JP JP18951585A patent/JPS6250463A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150053430A (ko) * | 2013-11-08 | 2015-05-18 | 삼성중공업 주식회사 | 선박용 에어스포일러 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6250463A (ja) | 1987-03-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |