JPH0541703B2 - - Google Patents

Info

Publication number
JPH0541703B2
JPH0541703B2 JP62265103A JP26510387A JPH0541703B2 JP H0541703 B2 JPH0541703 B2 JP H0541703B2 JP 62265103 A JP62265103 A JP 62265103A JP 26510387 A JP26510387 A JP 26510387A JP H0541703 B2 JPH0541703 B2 JP H0541703B2
Authority
JP
Japan
Prior art keywords
sample
thin film
electrode
counter electrode
power supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62265103A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01108371A (ja
Inventor
Takeshi Arisawa
Yasushi Sakakibara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP26510387A priority Critical patent/JPH01108371A/ja
Publication of JPH01108371A publication Critical patent/JPH01108371A/ja
Publication of JPH0541703B2 publication Critical patent/JPH0541703B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP26510387A 1987-10-20 1987-10-20 薄膜形成装置 Granted JPH01108371A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26510387A JPH01108371A (ja) 1987-10-20 1987-10-20 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26510387A JPH01108371A (ja) 1987-10-20 1987-10-20 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPH01108371A JPH01108371A (ja) 1989-04-25
JPH0541703B2 true JPH0541703B2 (esLanguage) 1993-06-24

Family

ID=17412647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26510387A Granted JPH01108371A (ja) 1987-10-20 1987-10-20 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPH01108371A (esLanguage)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52122284A (en) * 1976-04-07 1977-10-14 Hitachi Ltd Sputtering device having bias electrode
JPS6326361A (ja) * 1986-07-18 1988-02-03 Hitachi Ltd 薄膜形成方法および装置

Also Published As

Publication number Publication date
JPH01108371A (ja) 1989-04-25

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