JPH0539561Y2 - - Google Patents
Info
- Publication number
- JPH0539561Y2 JPH0539561Y2 JP1986105147U JP10514786U JPH0539561Y2 JP H0539561 Y2 JPH0539561 Y2 JP H0539561Y2 JP 1986105147 U JP1986105147 U JP 1986105147U JP 10514786 U JP10514786 U JP 10514786U JP H0539561 Y2 JPH0539561 Y2 JP H0539561Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- etching
- analysis
- chamber
- ion gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986105147U JPH0539561Y2 (enrdf_load_html_response) | 1986-07-08 | 1986-07-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986105147U JPH0539561Y2 (enrdf_load_html_response) | 1986-07-08 | 1986-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6312153U JPS6312153U (enrdf_load_html_response) | 1988-01-26 |
| JPH0539561Y2 true JPH0539561Y2 (enrdf_load_html_response) | 1993-10-07 |
Family
ID=30979301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986105147U Expired - Lifetime JPH0539561Y2 (enrdf_load_html_response) | 1986-07-08 | 1986-07-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0539561Y2 (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2764600B2 (ja) * | 1989-02-16 | 1998-06-11 | 宣夫 御子柴 | 反射電子線回折装置 |
| JP2987417B2 (ja) * | 1993-03-04 | 1999-12-06 | 科学技術庁金属材料技術研究所長 | 透過型電子顕微鏡用の薄膜試料のその場作製および観察方法並びにその装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0314775Y2 (enrdf_load_html_response) * | 1985-02-14 | 1991-04-02 |
-
1986
- 1986-07-08 JP JP1986105147U patent/JPH0539561Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6312153U (enrdf_load_html_response) | 1988-01-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3166638B2 (ja) | 蛍光x線分析装置 | |
| JP3820964B2 (ja) | 電子線を用いた試料観察装置および方法 | |
| JP2010002371A (ja) | 液体試料中の元素成分の分析方法 | |
| JP2001153760A (ja) | 搬送用試料容器 | |
| JPH0539561Y2 (enrdf_load_html_response) | ||
| US6507029B1 (en) | Sample processing apparatus and method for removing charge on sample through light irradiation | |
| JPH10335399A (ja) | 試料処理装置および方法 | |
| JP2507484B2 (ja) | 偏光全反射蛍光x線構造解析装置 | |
| JP2002365182A5 (enrdf_load_html_response) | ||
| JP6708298B2 (ja) | 質量分析装置 | |
| JP2986129B2 (ja) | イオンビーム分析装置 | |
| JPH0541397Y2 (enrdf_load_html_response) | ||
| JPH0574182B2 (enrdf_load_html_response) | ||
| JPH0314775Y2 (enrdf_load_html_response) | ||
| JPS6345467B2 (enrdf_load_html_response) | ||
| JP2000162161A (ja) | 蛍光x線分析装置 | |
| JPH05258701A (ja) | 電子線装置 | |
| JP2000149844A (ja) | 電子ビーム検査装置 | |
| JP2604009B2 (ja) | 同位体分離装置 | |
| FI3911472T3 (fi) | Menetelmä ja laite saastuneen työkappaleen käsittelemiseksi | |
| JP2670394B2 (ja) | 表面分析方法および表面分析装置 | |
| JPH0548357Y2 (enrdf_load_html_response) | ||
| JPH01118757A (ja) | 表面分析装置のマスク | |
| JPH06331574A (ja) | 分析装置 | |
| JPH11168126A (ja) | 電子デバイスの製造方法及びその異物分析装置 |