JPH0538307Y2 - - Google Patents
Info
- Publication number
- JPH0538307Y2 JPH0538307Y2 JP1987117517U JP11751787U JPH0538307Y2 JP H0538307 Y2 JPH0538307 Y2 JP H0538307Y2 JP 1987117517 U JP1987117517 U JP 1987117517U JP 11751787 U JP11751787 U JP 11751787U JP H0538307 Y2 JPH0538307 Y2 JP H0538307Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas flow
- flow path
- valve
- vapor growth
- carrier gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 59
- 239000012159 carrier gas Substances 0.000 claims description 37
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000010409 thin film Substances 0.000 description 8
- 230000007257 malfunction Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Landscapes
- Details Of Valves (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987117517U JPH0538307Y2 (US20100012521A1-20100121-C00001.png) | 1987-07-31 | 1987-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987117517U JPH0538307Y2 (US20100012521A1-20100121-C00001.png) | 1987-07-31 | 1987-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6421883U JPS6421883U (US20100012521A1-20100121-C00001.png) | 1989-02-03 |
| JPH0538307Y2 true JPH0538307Y2 (US20100012521A1-20100121-C00001.png) | 1993-09-28 |
Family
ID=31361042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987117517U Expired - Lifetime JPH0538307Y2 (US20100012521A1-20100121-C00001.png) | 1987-07-31 | 1987-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0538307Y2 (US20100012521A1-20100121-C00001.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4523071B2 (ja) * | 2009-12-25 | 2010-08-11 | 株式会社日立国際電気 | 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法 |
| JP4459297B1 (ja) * | 2009-12-25 | 2010-04-28 | 株式会社日立国際電気 | 半導体製造装置及び弁装置並びに半導体製造装置を用いたｃｖｄ処理方法及び半導体の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022344U (US20100012521A1-20100121-C00001.png) * | 1973-06-19 | 1975-03-13 |
-
1987
- 1987-07-31 JP JP1987117517U patent/JPH0538307Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022344U (US20100012521A1-20100121-C00001.png) * | 1973-06-19 | 1975-03-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6421883U (US20100012521A1-20100121-C00001.png) | 1989-02-03 |
