JPH0533304B2 - - Google Patents
Info
- Publication number
- JPH0533304B2 JPH0533304B2 JP61132417A JP13241786A JPH0533304B2 JP H0533304 B2 JPH0533304 B2 JP H0533304B2 JP 61132417 A JP61132417 A JP 61132417A JP 13241786 A JP13241786 A JP 13241786A JP H0533304 B2 JPH0533304 B2 JP H0533304B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- evaporated
- deposited
- source
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13241786A JPS62287068A (ja) | 1986-06-06 | 1986-06-06 | イオンビ−ム蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13241786A JPS62287068A (ja) | 1986-06-06 | 1986-06-06 | イオンビ−ム蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62287068A JPS62287068A (ja) | 1987-12-12 |
| JPH0533304B2 true JPH0533304B2 (enrdf_load_stackoverflow) | 1993-05-19 |
Family
ID=15080886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13241786A Granted JPS62287068A (ja) | 1986-06-06 | 1986-06-06 | イオンビ−ム蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62287068A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3031551B2 (ja) * | 1988-08-12 | 2000-04-10 | 凸版印刷株式会社 | ガスバリアー性蒸着フィルムの製造方法 |
| KR19990047679A (ko) * | 1997-12-05 | 1999-07-05 | 박호군 | 이온 빔을 이용한 재료의 표면 처리 장치 |
| US20120160165A1 (en) * | 2009-08-06 | 2012-06-28 | Fuji Electric Co., Ltd | Apparatus for manufacturing a thin film laminate |
| JP6306437B2 (ja) * | 2014-05-31 | 2018-04-04 | 国立大学法人山梨大学 | 縦型成膜装置 |
| JP6567119B1 (ja) * | 2018-03-27 | 2019-08-28 | キヤノントッキ株式会社 | 基板処理装置及びその制御方法、成膜装置、電子部品の製造方法 |
| CN109957752B (zh) * | 2017-12-26 | 2022-10-28 | 佳能特机株式会社 | 基板处理装置及其控制方法、成膜装置、电子零件的制造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58100675A (ja) * | 1981-12-11 | 1983-06-15 | Mitsubishi Heavy Ind Ltd | 連続蒸着方法及びその装置 |
| JPS6134173A (ja) * | 1984-07-24 | 1986-02-18 | Agency Of Ind Science & Technol | 高硬度窒化ホウ素膜の製造方法 |
-
1986
- 1986-06-06 JP JP13241786A patent/JPS62287068A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62287068A (ja) | 1987-12-12 |
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