JPH0519328Y2 - - Google Patents

Info

Publication number
JPH0519328Y2
JPH0519328Y2 JP1986086822U JP8682286U JPH0519328Y2 JP H0519328 Y2 JPH0519328 Y2 JP H0519328Y2 JP 1986086822 U JP1986086822 U JP 1986086822U JP 8682286 U JP8682286 U JP 8682286U JP H0519328 Y2 JPH0519328 Y2 JP H0519328Y2
Authority
JP
Japan
Prior art keywords
evaporation
deposited
evaporated
vacuum chamber
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986086822U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62198268U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986086822U priority Critical patent/JPH0519328Y2/ja
Publication of JPS62198268U publication Critical patent/JPS62198268U/ja
Application granted granted Critical
Publication of JPH0519328Y2 publication Critical patent/JPH0519328Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1986086822U 1986-06-06 1986-06-06 Expired - Lifetime JPH0519328Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986086822U JPH0519328Y2 (enrdf_load_stackoverflow) 1986-06-06 1986-06-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986086822U JPH0519328Y2 (enrdf_load_stackoverflow) 1986-06-06 1986-06-06

Publications (2)

Publication Number Publication Date
JPS62198268U JPS62198268U (enrdf_load_stackoverflow) 1987-12-17
JPH0519328Y2 true JPH0519328Y2 (enrdf_load_stackoverflow) 1993-05-21

Family

ID=30943480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986086822U Expired - Lifetime JPH0519328Y2 (enrdf_load_stackoverflow) 1986-06-06 1986-06-06

Country Status (1)

Country Link
JP (1) JPH0519328Y2 (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100675A (ja) * 1981-12-11 1983-06-15 Mitsubishi Heavy Ind Ltd 連続蒸着方法及びその装置
JPS6134173A (ja) * 1984-07-24 1986-02-18 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法

Also Published As

Publication number Publication date
JPS62198268U (enrdf_load_stackoverflow) 1987-12-17

Similar Documents

Publication Publication Date Title
KR100279344B1 (ko) 기재의 미세공을 충전하기 위한 박막형성장치
WO2000008226A3 (en) Vapor deposition system
US6352627B2 (en) Method and device for PVD coating
JPS6483656A (en) Method and vacuum painting machine for applying film to base layer
US6337005B2 (en) Depositing device employing a depositing zone and reaction zone
US4474827A (en) Ion induced thin surface coating
JPH0533304B2 (enrdf_load_stackoverflow)
JPH0519328Y2 (enrdf_load_stackoverflow)
JPH04191364A (ja) イオンプレーティング方法および装置
JP2572279B2 (ja) 長尺物用イオンプレーティング装置
JPH04198474A (ja) イオンプレーティング方法および装置
JPS6324068A (ja) 連続真空蒸着メツキ装置
JPS5842771A (ja) イオンプレ−テイング装置
JPS63255366A (ja) 絶縁性基体への導電性膜の被覆方法
JPH0784650B2 (ja) 真空蒸着方法及び真空蒸着装置
Morimoto et al. Ion Plating Apparatus
JPS60255972A (ja) 薄膜蒸着装置
JPS6227564A (ja) イオンプレ−テイング装置
JP3291088B2 (ja) 被膜形成方法
JPH03191054A (ja) 薄膜作成方法
JPS63458A (ja) 真空ア−ク蒸着装置
JPS6140767Y2 (enrdf_load_stackoverflow)
JPH0635653B2 (ja) イオン蒸着薄膜形成装置
JPH07122131B2 (ja) ア−ク式蒸発源
KR930018051A (ko) 이온 도금법 및 그 방법을 위한 장치