KR100326343B1 - Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter - Google Patents

Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter Download PDF

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Publication number
KR100326343B1
KR100326343B1 KR1020000043492A KR20000043492A KR100326343B1 KR 100326343 B1 KR100326343 B1 KR 100326343B1 KR 1020000043492 A KR1020000043492 A KR 1020000043492A KR 20000043492 A KR20000043492 A KR 20000043492A KR 100326343 B1 KR100326343 B1 KR 100326343B1
Authority
KR
South Korea
Prior art keywords
electron beam
substrate
large current
ion
gun
Prior art date
Application number
KR1020000043492A
Other languages
Korean (ko)
Inventor
Sang Moo Cho
Yong Woon Seo
Original Assignee
Itm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Itm Inc filed Critical Itm Inc
Priority to KR1020000043492A priority Critical patent/KR100326343B1/en
Application granted granted Critical
Publication of KR100326343B1 publication Critical patent/KR100326343B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: A method for cleaning a substrate and coating a thin film is provided to maximize a cleaning effect by increasing an ionization degree, and to obtain a high adhesion intensity by decreasing the quantity of impurities implanted into a coating target material. CONSTITUTION: A discharge is performed between a gun(2) generating a large current electron beam and a crucible(4) containing a deposition material. A negative voltage is applied to the substrate(6). A shutter(5) whose rotation is capable of being controlled is interposed between the gun and the crucible. Argon ions emitted together with the electron beam from the electron beam generating gun collide with electrons in the electron beam and are changed to argon cations. The argon cations are accelerated by a negative voltage applied to the substrate and collide with the surface of the substrate to clean the surface of the substrate.
KR1020000043492A 2000-07-27 2000-07-27 Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter KR100326343B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020000043492A KR100326343B1 (en) 2000-07-27 2000-07-27 Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020000043492A KR100326343B1 (en) 2000-07-27 2000-07-27 Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter

Publications (1)

Publication Number Publication Date
KR100326343B1 true KR100326343B1 (en) 2002-02-28

Family

ID=37478304

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000043492A KR100326343B1 (en) 2000-07-27 2000-07-27 Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter

Country Status (1)

Country Link
KR (1) KR100326343B1 (en)

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