JPS62287068A - イオンビ−ム蒸着装置 - Google Patents

イオンビ−ム蒸着装置

Info

Publication number
JPS62287068A
JPS62287068A JP13241786A JP13241786A JPS62287068A JP S62287068 A JPS62287068 A JP S62287068A JP 13241786 A JP13241786 A JP 13241786A JP 13241786 A JP13241786 A JP 13241786A JP S62287068 A JPS62287068 A JP S62287068A
Authority
JP
Japan
Prior art keywords
evaporated
vapor deposition
evaporation
ion
sources
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13241786A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0533304B2 (enrdf_load_stackoverflow
Inventor
Masayasu Tanjiyou
正安 丹上
Yasuo Suzuki
泰雄 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP13241786A priority Critical patent/JPS62287068A/ja
Publication of JPS62287068A publication Critical patent/JPS62287068A/ja
Publication of JPH0533304B2 publication Critical patent/JPH0533304B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP13241786A 1986-06-06 1986-06-06 イオンビ−ム蒸着装置 Granted JPS62287068A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13241786A JPS62287068A (ja) 1986-06-06 1986-06-06 イオンビ−ム蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13241786A JPS62287068A (ja) 1986-06-06 1986-06-06 イオンビ−ム蒸着装置

Publications (2)

Publication Number Publication Date
JPS62287068A true JPS62287068A (ja) 1987-12-12
JPH0533304B2 JPH0533304B2 (enrdf_load_stackoverflow) 1993-05-19

Family

ID=15080886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13241786A Granted JPS62287068A (ja) 1986-06-06 1986-06-06 イオンビ−ム蒸着装置

Country Status (1)

Country Link
JP (1) JPS62287068A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0250950A (ja) * 1988-08-12 1990-02-20 Toppan Printing Co Ltd 蒸着フィルムの製造方法
US6841789B2 (en) 1997-12-05 2005-01-11 Korea Institute Of Science And Technology Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
WO2011016471A1 (ja) * 2009-08-06 2011-02-10 富士電機ホールディングス株式会社 薄膜積層体の製造装置
JP2015227488A (ja) * 2014-05-31 2015-12-17 国立大学法人山梨大学 縦型成膜装置
CN109957752A (zh) * 2017-12-26 2019-07-02 佳能特机株式会社 基板处理装置及其控制方法、成膜装置、电子零件的制造方法
JP2019173066A (ja) * 2018-03-27 2019-10-10 キヤノントッキ株式会社 基板処理装置及びその制御方法、成膜装置、電子部品の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100675A (ja) * 1981-12-11 1983-06-15 Mitsubishi Heavy Ind Ltd 連続蒸着方法及びその装置
JPS6134173A (ja) * 1984-07-24 1986-02-18 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100675A (ja) * 1981-12-11 1983-06-15 Mitsubishi Heavy Ind Ltd 連続蒸着方法及びその装置
JPS6134173A (ja) * 1984-07-24 1986-02-18 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0250950A (ja) * 1988-08-12 1990-02-20 Toppan Printing Co Ltd 蒸着フィルムの製造方法
US6841789B2 (en) 1997-12-05 2005-01-11 Korea Institute Of Science And Technology Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
EP1296353A3 (en) * 1997-12-05 2008-05-07 Korea Institute Of Science And Technology Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
WO2011016471A1 (ja) * 2009-08-06 2011-02-10 富士電機ホールディングス株式会社 薄膜積層体の製造装置
CN102471881A (zh) * 2009-08-06 2012-05-23 富士电机株式会社 制造薄膜层叠片的方法
JPWO2011016471A1 (ja) * 2009-08-06 2013-01-10 富士電機株式会社 薄膜積層体の製造装置
JP2015227488A (ja) * 2014-05-31 2015-12-17 国立大学法人山梨大学 縦型成膜装置
CN109957752A (zh) * 2017-12-26 2019-07-02 佳能特机株式会社 基板处理装置及其控制方法、成膜装置、电子零件的制造方法
CN109957752B (zh) * 2017-12-26 2022-10-28 佳能特机株式会社 基板处理装置及其控制方法、成膜装置、电子零件的制造方法
JP2019173066A (ja) * 2018-03-27 2019-10-10 キヤノントッキ株式会社 基板処理装置及びその制御方法、成膜装置、電子部品の製造方法

Also Published As

Publication number Publication date
JPH0533304B2 (enrdf_load_stackoverflow) 1993-05-19

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