JPH0532467B2 - - Google Patents
Info
- Publication number
- JPH0532467B2 JPH0532467B2 JP30842787A JP30842787A JPH0532467B2 JP H0532467 B2 JPH0532467 B2 JP H0532467B2 JP 30842787 A JP30842787 A JP 30842787A JP 30842787 A JP30842787 A JP 30842787A JP H0532467 B2 JPH0532467 B2 JP H0532467B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vapor deposition
- ejection
- container
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000126 substance Substances 0.000 claims description 24
- 238000007740 vapor deposition Methods 0.000 claims description 23
- 238000007738 vacuum evaporation Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 15
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 description 21
- 230000008018 melting Effects 0.000 description 12
- 238000002844 melting Methods 0.000 description 12
- 239000012535 impurity Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 238000000151 deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 239000003708 ampul Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30842787A JPH0266162A (ja) | 1987-12-04 | 1987-12-04 | 真空蒸着装置 |
| US07/280,152 US5007372A (en) | 1987-12-04 | 1988-12-05 | Vacuum depositing apparatus |
| EP88311500A EP0319347B1 (en) | 1987-12-04 | 1988-12-05 | Vacuum depositing apparatus |
| DE3850941T DE3850941T2 (de) | 1987-12-04 | 1988-12-05 | Vakuumbeschichtungsanlage. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30842787A JPH0266162A (ja) | 1987-12-04 | 1987-12-04 | 真空蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0266162A JPH0266162A (ja) | 1990-03-06 |
| JPH0532467B2 true JPH0532467B2 (en:Method) | 1993-05-17 |
Family
ID=17980922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30842787A Granted JPH0266162A (ja) | 1987-12-04 | 1987-12-04 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0266162A (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4583200B2 (ja) * | 2005-02-17 | 2010-11-17 | 日立造船株式会社 | 蒸着装置 |
| JP4676387B2 (ja) * | 2006-06-07 | 2011-04-27 | 株式会社ティー アンド ケー | 真空蒸着用原料ユニット、真空蒸着用蒸発源および真空蒸着装置 |
-
1987
- 1987-12-04 JP JP30842787A patent/JPH0266162A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0266162A (ja) | 1990-03-06 |
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