JPH0529954B2 - - Google Patents

Info

Publication number
JPH0529954B2
JPH0529954B2 JP8238485A JP8238485A JPH0529954B2 JP H0529954 B2 JPH0529954 B2 JP H0529954B2 JP 8238485 A JP8238485 A JP 8238485A JP 8238485 A JP8238485 A JP 8238485A JP H0529954 B2 JPH0529954 B2 JP H0529954B2
Authority
JP
Japan
Prior art keywords
pattern
patterns
rectangular
arc
circular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8238485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61241996A (ja
Inventor
Mineo Nomoto
Toshimitsu Hamada
Keiichi Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60082384A priority Critical patent/JPS61241996A/ja
Priority to KR1019850007653A priority patent/KR900001976B1/ko
Priority to US06/793,219 priority patent/US4744047A/en
Publication of JPS61241996A publication Critical patent/JPS61241996A/ja
Publication of JPH0529954B2 publication Critical patent/JPH0529954B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60082384A 1984-11-01 1985-04-19 パタ−ン発生方法 Granted JPS61241996A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60082384A JPS61241996A (ja) 1985-04-19 1985-04-19 パタ−ン発生方法
KR1019850007653A KR900001976B1 (ko) 1984-11-01 1985-10-17 다수 개의 패턴 발생기를 포함하는 패턴 검사 장치
US06/793,219 US4744047A (en) 1984-11-01 1985-10-31 Pattern test apparatus including a plurality of pattern generators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60082384A JPS61241996A (ja) 1985-04-19 1985-04-19 パタ−ン発生方法

Publications (2)

Publication Number Publication Date
JPS61241996A JPS61241996A (ja) 1986-10-28
JPH0529954B2 true JPH0529954B2 (enExample) 1993-05-06

Family

ID=13773085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60082384A Granted JPS61241996A (ja) 1984-11-01 1985-04-19 パタ−ン発生方法

Country Status (1)

Country Link
JP (1) JPS61241996A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2747105B2 (ja) * 1990-11-05 1998-05-06 富士通株式会社 画像データ検証方法及び装置
US7000207B2 (en) * 2003-04-10 2006-02-14 Sioptical, Inc. Method of using a Manhattan layout to realize non-Manhattan shaped optical structures

Also Published As

Publication number Publication date
JPS61241996A (ja) 1986-10-28

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