JPS61241996A - パタ−ン発生方法 - Google Patents

パタ−ン発生方法

Info

Publication number
JPS61241996A
JPS61241996A JP60082384A JP8238485A JPS61241996A JP S61241996 A JPS61241996 A JP S61241996A JP 60082384 A JP60082384 A JP 60082384A JP 8238485 A JP8238485 A JP 8238485A JP S61241996 A JPS61241996 A JP S61241996A
Authority
JP
Japan
Prior art keywords
pattern
patterns
circular
arc
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60082384A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0529954B2 (enExample
Inventor
峰生 野本
浜田　利満
啓一 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60082384A priority Critical patent/JPS61241996A/ja
Priority to KR1019850007653A priority patent/KR900001976B1/ko
Priority to US06/793,219 priority patent/US4744047A/en
Publication of JPS61241996A publication Critical patent/JPS61241996A/ja
Publication of JPH0529954B2 publication Critical patent/JPH0529954B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60082384A 1984-11-01 1985-04-19 パタ−ン発生方法 Granted JPS61241996A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60082384A JPS61241996A (ja) 1985-04-19 1985-04-19 パタ−ン発生方法
KR1019850007653A KR900001976B1 (ko) 1984-11-01 1985-10-17 다수 개의 패턴 발생기를 포함하는 패턴 검사 장치
US06/793,219 US4744047A (en) 1984-11-01 1985-10-31 Pattern test apparatus including a plurality of pattern generators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60082384A JPS61241996A (ja) 1985-04-19 1985-04-19 パタ−ン発生方法

Publications (2)

Publication Number Publication Date
JPS61241996A true JPS61241996A (ja) 1986-10-28
JPH0529954B2 JPH0529954B2 (enExample) 1993-05-06

Family

ID=13773085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60082384A Granted JPS61241996A (ja) 1984-11-01 1985-04-19 パタ−ン発生方法

Country Status (1)

Country Link
JP (1) JPS61241996A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5850467A (en) * 1990-11-05 1998-12-15 Fujitsu Limited Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared
JP2006522958A (ja) * 2003-04-10 2006-10-05 シオプティカル インコーポレーテッド 非マンハッタン形状光学構造を実現するためにマンハッタン・レイアウトを使用する方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5850467A (en) * 1990-11-05 1998-12-15 Fujitsu Limited Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared
JP2006522958A (ja) * 2003-04-10 2006-10-05 シオプティカル インコーポレーテッド 非マンハッタン形状光学構造を実現するためにマンハッタン・レイアウトを使用する方法

Also Published As

Publication number Publication date
JPH0529954B2 (enExample) 1993-05-06

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